Substrate processing apparatus and the method thereof

US12011934B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12011934-B2
Application numberUS-202217870840-A
CountryUS
Kind codeB2
Filing dateJul 22, 2022
Priority dateAug 24, 2021
Publication dateJun 18, 2024
Grant dateJun 18, 2024

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A substrate processing apparatus and a substrate processing method are provided, which can improve the yield by minimizing the occurrence of stains. The substrate processing method includes forming on the substrate a plurality of ink patterns spaced apart from each other by jetting ink onto the substrate by using a plurality of nozzles, calculating the density of each of the plurality of ink patterns, and selecting at least one nozzle for jetting ink into one pixel area based on respectively calculated densities of the plurality of ink patterns.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method of processing a substrate, comprising: forming on the substrate a plurality of ink patterns spaced apart from each other by jetting ink onto the substrate by using a plurality of nozzles; calculating a density of each of the plurality of ink patterns; and selecting at least one nozzle for jetting ink into one pixel area based on respectively calculated densities of the plurality of ink patterns. 2. The method of claim 1 , further comprising: measuring respective volumes of ink jetted from the plurality of nozzles. 3. The method of claim 2 , wherein the measuring of the respective volumes of ink jetted from the plurality of nozzles comprises: imaging an inkjet of the ink when jetted from each of the plurality of nozzles; and calculating the respective volumes of ink jetted from the plurality of nozzles based on volumes of main droplets in imaged inkjets. 4. The method of claim 2 , further comprising: selecting at least one nozzle for jetting ink into one pixel area based on the respectively calculated densities of the plurality of ink patterns and the respective volumes of ink jetted from the plurality of nozzles. 5. The method of claim 1 , wherein the substrate comprises: a flexible substrate provided in a roll-to-roll method.

Assignees

Inventors

Classifications

  • Detection of malfunctioning nozzles (generating single droplets or particles on demand by pressure, e.g. electromechanical transducers B41J2/045, B41J2/05; jet deflection sensors B41J2/125; for cleaning purposes B41J2/16579) · CPC title

  • Print quality control characterised by dot disposition, e.g. for reducing white stripes or banding (methods for local corrections by dot omission, image edge enhancement, or multi-pass mask selection G06K15/102; colour conversion H04N1/40) · CPC title

  • Methods for their manufacture, e.g. printing, electro-deposition or photolithography · CPC title

  • involving calculation of drop size, weight or volume · CPC title

  • detecting drop size, volume or weight · CPC title

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What does patent US12011934B2 cover?
A substrate processing apparatus and a substrate processing method are provided, which can improve the yield by minimizing the occurrence of stains. The substrate processing method includes forming on the substrate a plurality of ink patterns spaced apart from each other by jetting ink onto the substrate by using a plurality of nozzles, calculating the density of each of the plurality of ink pa…
Who is the assignee on this patent?
Semes Co Ltd
What technology area does this patent fall under?
Primary CPC classification B41J2/2054. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Jun 18 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 11 related publications on this page (citations in our corpus or others sharing the same primary CPC).