Automatic optimization of an examination recipe

Patent metadata

Field	Value
Publication number	US-12007335-B2
Application number	US-202318196655-A
Country	US
Kind code	B2
Filing date	May 12, 2023
Priority date	Aug 17, 2020
Publication date	Jun 11, 2024
Grant date	Jun 11, 2024

Abstract

A method of automatic optimization of an examination recipe includes obtaining inspection data of a given layer of a semiconductor specimen acquired by an inspection tool during runtime examination, the inspection data including inspection images representative of defect candidates from a defect map of the given layer, extracting inspection features characterizing the inspection images, and using a classifier to classify the defect candidates based on the inspection features, giving rise to a list of defect candidates having a higher probability of being defects of interest (DOIs). The semiconductor specimen includes multiple layers, and the classifier is a general-purpose classifier (GPC) usable for runtime classification of inspection data from any layer of the multiple layers of the semiconductor specimen, the GPC being previously trained using training data including inspection features characterizing training inspection images of various types of DOIs and nuisances collected from the multiple layers and label data associated therewith.

First claim

The invention claimed is:

1. A computerized system of examining a semiconductor specimen, the computerized system comprising a processing and memory circuitry (PMC) configured to:
obtain inspection data of a given layer of a semiconductor specimen acquired by an inspection tool during runtime examination, the inspection data comprising a plurality of inspection images representative of a plurality of defect candidates from a defect map of the given layer;
extract a first set of inspection features characterizing the plurality of inspection images; and
use a classifier to classify the plurality of defect candidates based on the first set of inspection features, giving rise to a list of defect candidates having a higher probability of being defects of interest (DOIs), wherein the semiconductor specimen comprises multiple layers, and the classifier is a general-purpose classifier (GPC) usable for runtime classification of inspection data from any layer of the multiple layers of the semiconductor specimen, the GPC being previously trained using training data comprising a second set of inspection features characterizing training inspection images of various types of DOIs and nuisances collected from the multiple layers and label data associated therewith.

2. The computerized system according to claim 1 , wherein the GPC is usable for performing classification for inspection data from one or more new layers without being re-trained using training data pertaining to the one or more new layers.

3. The computerized system according to claim 1 , wherein the PMC is configured to, for a new layer, use the GPC to perform classification for inspection data of the new layer, and determine, based on performance of the classification, whether to train a layer-specific classifier so as to improve the performance of the classification.

4. The computerized system according to claim 3 , wherein the performance can be measured based on at least one performance measure parameter of: false alarm rate (FAR), capture rate (CR), filter rate, accuracy, purity, and rejection rate.

5. The computerized system according to claim 1 , wherein the second set of inspection features comprises a set of features extracted from the multiple layers by an unsupervised model, the unsupervised model being previously trained using a set of training inspection images for extracting representative features thereof.

6. The computerized system according to claim 1 , wherein the second set of inspection features comprises a set of features extracted from the multiple layers by a supervised model, the supervised model being previously trained using one or more training inspection images with respectively associated label data for determining types of defect candidates thereof.

7. The computerized system according to claim 1 , wherein the training data further comprises a set of features comprising at least one of: one or more tool features, one or more defect features and one or more specimen features, in addition to the inspection features.

8. The computerized system according to claim 1 , wherein the PMC is configured to extract the first set of inspection features using at least one of an unsupervised model or a supervised model.

9. The computerized system according to claim 1 , wherein the GPC is further configured to classify the list of defect candidates into different types of DOIs.

10. The computerized system according to claim 1 , wherein the PMC is further configured to provide the list of defect candidates to a review tool, and wherein the review tool is configured to capture review images at locations of the list of defect candidates, and review the review images for ascertaining whether a defect candidate in the list is a DOI or a nuisance.

11. A computerized method of examining a semiconductor specimen, the method comprising:
obtaining inspection data of a given layer of a semiconductor specimen acquired by an inspection tool during runtime examination, the inspection data comprising a plurality of inspection images representative of a plurality of defect candidates from a defect map of the given layer;
extracting a first set of inspection features characterizing the plurality of inspection images; and
using a classifier to classify the plurality of defect candidates based on the first set of inspection features, giving rise to a list of defect candidates having a higher probability of being defects of interest (DOIs), wherein the semiconductor specimen comprises multiple layers, and the classifier is a general-purpose classifier (GPC) usable for runtime classification of inspection data from any layer of the multiple layers of the semiconductor specimen, the GPC being previously trained using training data comprising a second set of inspection features characterizing training inspection images of various types of DOIs and nuisances collected from the multiple layers and label data associated therewith.

12. The computerized method according to claim 11 , wherein the GPC is usable for performing classification for inspection data from one or more new layers without being re-trained using training data pertaining to the one or more new layers.

13. The computerized method according to claim 11 , further comprising, for a new layer, using the GPC to perform classification for inspection data of the new layer, and determining, based on performance of the classification, whether to train a layer-specific classifier so as to improve the performance of the classification.

14. The computerized method according to claim 13 , wherein the performance can be measured based on at least one performance measure parameter of: false alarm rate (FAR), capture rate (CR), filter rate, accuracy, purity, and rejection rate.

15. The computerized method according to claim 11 , wherein the second set of inspection features comprises a set of features extracted from the multiple layers by an unsupervised model, the unsupervised model being previously trained using a set of training inspection images for extracting representative features thereof.

16. The computerized method according to claim 11 , wherein the second set of inspection features comprises a set of features extracted from the multiple layers by a supervised model, the supervised model being previously trained using one or more training inspection images with respectively associated label data for determining types of defect candidates thereof.

17. The computerized method according to claim 11 , wherein the training data further comprises a set of features comprising at least one of: one or more tool features, one or more defect features and one or more specimen features, in addition to the inspection features.

18. The computerized method according to claim 11 , wherein the inspection features characterizing the plurality of inspection images are extracted using at least one of an unsupervised model or a supervised model.

19. The computerized method according to claim 11 , wherein the GPC is further configured to classify the list of defect candidates into different types of DOIs.

20. A non-transitory computer readable storage medium tangibly embodying a program of instructions that, when executed by a computer, cause the computer to perform a method of examining a semiconductor specimen, the method comprising:
obtaining inspection data of a given layer of a semiconductor specimen acquired by an inspection tool during runtime examination, the inspection data comprising a plurality of inspection images representative of a plurality

Assignees

• Applied Materials Israel Ltd

Inventors

• Bar Amir

Classifications

• G06T7/0004

  Industrial image inspection · CPC title

• G06T2207/30148

  Semiconductor; IC; Wafer · CPC title

• G01N2021/8887

  based on image processing techniques · CPC title

• G01N2021/8883

  involving the calculation of gauges, generating models · CPC title

• G01N2021/8854

  Grading and classifying of flaws · CPC title