Activated gas generation apparatus

Patent metadata

Field	Value
Publication number	US-12004285-B2
Application number	US-201917281263-A
Country	US
Kind code	B2
Filing date	Aug 22, 2019
Priority date	Aug 22, 2019
Publication date	Jun 4, 2024
Grant date	Jun 4, 2024

Abstract

In the present invention, a high-voltage side electrode constituent part includes a dielectric electrode and metal electrodes formed on the upper surface of the dielectric electrode. The dielectric electrode has a structure in which a film thickness is continuously changed along an X direction. That is, the film thickness of the right end of the dielectric electrode is set to a thickness dA1; and the film thickness of the left end is set to a thickness dB1 (>dA1), and is continuously increased from the right end to the left end along the X direction.

First claim

The invention claimed is:

1. An activated gas generation apparatus comprising:
a first electrode constituent part;
a second electrode constituent part provided below said first electrode constituent part; and
an alternating current (AC) power supply part applying an AC voltage to said first and second electrode constituent parts,
said AC power supply part applying said AC voltage to form a discharge space between said first and second electrode constituent parts, and to generate an activated gas obtained by activating a source gas supplied to said discharge space,
wherein:
said first electrode constituent part includes a first dielectric electrode and a first metal electrode selectively formed on an upper surface of said first dielectric electrode;
said second electrode constituent part includes a second dielectric electrode and a second metal electrode selectively formed on a bottom surface of said second dielectric electrode;
where said first and second dielectric electrodes face each other in a dielectric space, and where said first and second metal electrodes overlap each other in plan view is defined as said discharge space in a region;
said first and second metal electrodes are formed so as to extend in an electrode formation direction, a gas supply direction of said source gas crosses to said electrode formation direction:
said second dielectric electrode includes a plurality of gas spray holes for spraying said activated gas to an outside;
said activated gas contains a plurality of partial activated gases sprayed from said plurality of gas spray holes;
said plurality of gas spray holes are formed along said electrode formation direction;
said discharge space is classified into a plurality of partial discharge spaces corresponding to positions of said plurality of gas spray holes in said electrode formation direction; and
one dielectric electrode being one of said first and second dielectric electrodes has a parameter changing structure in which a discharge voltage contribution parameter is changed along said electrode formation direction so that a plurality of partial discharge voltages generated in said plurality of partial discharge spaces have values different from each other when said AC voltage is applied.

2. The activated gas generation apparatus according to claim 1 , wherein:
said discharge voltage contribution parameter includes a film thickness of said one dielectric electrode; and
said parameter changing structure includes a film thickness changing structure in which the film thickness of said one dielectric electrode is changed along said electrode formation direction.

3. The activated gas generation apparatus according to claim 2 ,
wherein said film thickness changing structure is a structure in which the film thickness of said one dielectric electrode is continuously changed along said electrode formation direction.

4. The activated gas generation apparatus according to claim 2 , wherein:
said one dielectric electrode is classified into a plurality of dielectric partial regions based on positions where said plurality of gas spray holes are provided in said electrode formation direction; and
said film thickness changing structure is a structure in which the film thickness is changed between said plurality of dielectric partial regions.

5. The activated gas generation apparatus according to claim 2 ,
wherein:
said one dielectric electrode includes a first lamination partial dielectric electrode and a second lamination partial dielectric electrode;
said first and second lamination partial dielectric electrodes are laminated;
said first lamination partial dielectric electrode has a uniform film thickness; and
said second lamination partial dielectric electrode has said film thickness changing structure.

6. The activated gas generation apparatus according to claim 1 ,
wherein:
said discharge voltage contribution parameter includes a dielectric constant of said one dielectric electrode; and
said parameter changing structure includes a dielectric constant changing structure in which the dielectric constant of said one dielectric electrode is changed along said electrode formation direction.

7. The activated gas generation apparatus according to claim 6 ,
wherein:
said one dielectric electrode includes a first lamination partial dielectric electrode and a second lamination partial dielectric electrode;
said first and second lamination partial dielectric electrodes are laminated;
said first lamination partial dielectric electrode has a uniform dielectric constant; and
said second lamination partial dielectric electrode has said dielectric constant changing structure.

8. The activated gas generation apparatus according to claim 1 ,
wherein:
said second metal electrode includes a pair of second partial metal electrodes formed so as to face each other with a central region of said second dielectric electrode interposed therebetween in plan view;
said pair of second partial metal electrodes are formed along said electrode formation direction, and have a direction intersecting with said electrode formation direction as an electrode facing direction in which said pair of second partial metal electrodes face each other:
said first metal electrode includes a pair of first partial metal electrodes including a region overlapping with said pair of second partial metal electrodes in plan view; and
said plurality of gas spray holes are formed in said central region.

9. The activated gas generation apparatus according to claim 1 ,
wherein:
said one dielectric electrode includes a first lamination partial dielectric electrode and a second lamination partial dielectric electrode;
said first and second lamination partial dielectric electrodes are laminated;
said first lamination partial dielectric electrode has a uniform dielectric constant; and
said second lamination partial dielectric electrode has parameter changing structure in which a dielectric constant of said second lamination partial dielectric electrode is changed along said electrode formation direction, as said parameter changing structure.

10. The activated gas generation apparatus according to claim 9 ,
wherein said second lamination partial dielectric electrode includes plurality of partial dielectric regions being composed of constituent materials having different dielectric constants from each other, and said plurality of partial dielectric regions being placed in line along said electrode formation direction, in which said dielectric constants of said plurality of partial dielectric regions increasing in said electrode formation direction.

11. The activated gas generation apparatus according to claim 10 ,
wherein said first lamination partial dielectric electrode and said second lamination partial dielectric electrode has a uniform film thickness.

Assignees

• Toshiba Mitsubishi Electric Industrial Systems Corp
• Toshiba Mitsubishi—Electric Ind Systems Corporation

Inventors

• Watanabe Kensuke
• Arita Ren

Classifications

• H05H1/2418 Primary

  the electrodes being embedded in the dielectric · CPC title

• C23C16/452

  by activating reactive gas streams before {their} introduction into the reaction chamber, e.g. by {ionisation} or addition of reactive species · CPC title

• H05H1/2406 Primary

  using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes · CPC title

• C23C16/448

  characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials · CPC title

• H05H1/2437

  Multilayer systems · CPC title