Systems and methods for compensating for RF power loss

Patent metadata

Field	Value
Publication number	US-12002653-B2
Application number	US-202017618414-A
Country	US
Kind code	B2
Filing date	May 27, 2020
Priority date	Jun 20, 2019
Publication date	Jun 4, 2024
Grant date	Jun 4, 2024

Abstract

Systems and methods for compensating for radio frequency (RF) power loss are described. One of the methods includes conducting a no plasma test to determine a resistance associated with an output of an impedance matching circuit. After conducting the no plasma test, a substrate is processed in a plasma chamber. During processing of the substrate, power loss associated with the output of the impedance matching circuit is determined. The power loss is used to determine an amount of power to be delivered by an RF generator. The amount of power delivered is adjusted until the power loss is stabilized. The stabilization of the power loss facilitates uniform process of the substrate and additional substrates in the plasma chamber.

First claim

The invention claimed is:

1. A method for compensating for loss of radio frequency (RF) power, comprising:
obtaining a plurality of measurements of a plurality of parameters associated with a component of a plasma system;
determining from the plurality of measurements of the plurality of parameters a resistance associated with the component of the plasma system;
obtaining a first value of one of the plurality of parameters associated with the component of the plasma system;
determining a first amount of loss of RF power associated with the component of the plasma system from the resistance and the first value of the one of the plurality of parameters;
adjusting a set point of operation of an RF generator based on the first amount of loss of RF power, wherein said adjusting the set point of operation of the RF generator based on the first amount of loss of RF power is performed to control the RF generator to operate at a second set point;
obtaining a second value of the one of the plurality of parameters associated with the component of the plasma system;
determining a second amount of loss of RF power from the resistance and the second value of the one of the plurality of parameters; and
adjusting the set point of operation of the RF generator based on the second amount of loss of RF power, wherein said adjusting the set point of operation of the RF generator based on the second amount of loss of RF power is performed to control the RF generator to operate at a third set point,
wherein the set point of operation is adjusted based on the first and second amounts of loss of RF power to compensate for loss of RF power.

2. The method of claim 1 , wherein the set point is adjusted to compensate for loss of RF power when multiple amounts of loss of RF power are within a pre-determined range from each other.

3. The method of claim 1 , wherein said obtaining the plurality of measurements and determining the resistance are performed during or after a no-plasma test.

4. The method of claim 1 , wherein said obtaining the first value, said determining the first amount of loss of RF power, said adjusting the set point based on the first amount of loss of RF power, said obtaining the second value, said determining the second amount of loss of RF power, and said adjusting the second point based on the second amount of loss of RF power are performed during processing of a substrate.

5. The method of claim 1 , wherein the component of the plasma system is an impedance matching circuit.

6. The method of claim 1 , wherein said determining the first amount of loss of RF power comprises multiplying the resistance with a square of the first value of the one of the plurality of parameters.

7. The method of claim 1 , wherein said adjusting the set point based on the first amount of loss of RF power includes adding the first amount of loss of RF power to the set point.

8. A controller for compensation for loss of radio frequency (RF) power, comprising:
a processor configured to:
obtain a plurality of measurements of a plurality of parameters associated with a component of a plasma system;
determine from the plurality of measurements of the plurality of parameters a resistance associated with the component of the plasma system;
obtain a first value of one of the plurality of parameters associated with the component of the plasma system;
determine a first amount of loss of RF power associated with the component of the plasma system from the resistance and the first value of the one of the plurality of parameters;
adjust a set point of operation of an RF generator based on the first amount of loss of RF power, wherein the set point of operation of the RF generator is adjusted based on the first amount of loss of RF power to control the RF generator to operate at a second set point;
obtain a second value of the one of the plurality of parameters associated with the component of the plasma system;
determine a second amount of loss of RF power from the resistance and the second value of the one of the plurality of parameters; and
adjust the set point of operation of the RF generator based on the second amount of loss of RF power, wherein the set point of operation is adjusted based on the second amount of loss of RF power to control the RF generator to operate at a third set point, wherein the set point of operation is adjusted based on the first and second amounts of loss of RF power to compensate for loss of RF power; and

a memory device coupled to the processor for storing the plurality of measurements of the plurality of parameters.

9. The controller of claim 8 , wherein the processor determines that set point is adjusted to compensate for loss of RF power when multiple amounts of loss of RF power are within a pre-determined range from each other.

10. The controller of claim 8 , wherein the processor obtains the plurality of measurements and determines the resistance during or after a no-plasma test.

11. The controller of claim 8 , wherein the processor obtains the first value of the one of the plurality of parameters, determines the first amount of loss of RF power, adjusts the set point based on the first amount of loss of RF power, obtains the second value, determines the second amount of loss of RF power, and adjusts the second point based on the second amount of loss of RF power during processing of a substrate.

12. The controller of claim 8 , wherein the component of the plasma system is an impedance matching circuit.

13. The controller of claim 8 , wherein to determine the first amount of loss of RF power, the processor is configured to multiply the resistance with a square of the first value of the one of the parameters.

14. The controller of claim 8 , wherein to adjust the set point based on the first amount of loss of RF power, the processor is configured to sum the amount of first loss of RF power and the set point.

15. A plasma system for compensation for loss of radio frequency (RF) power, comprising:
a radio frequency (RF) generator configured to generate an RF signal;
an impedance matching circuit coupled to the RF generator for receiving the RF signal; and
a computer coupled to the RF generator, wherein the computer is configured to:
obtain a plurality of measurements of a plurality of parameters associated with a component of the plasma system;
determine from the plurality of measurements of the plurality of parameters a resistance associated with the component of the plasma system;
obtain a first value of one of the plurality of parameters associated with the component of the plasma system;
determine a first amount of loss of RF power associated with the component of the plasma system from the resistance and the first value of the one of the plurality of parameters;
adjust a set point of operation of the RF generator based on the first amount of loss of RF power, wherein the set point of operation of the RF generator is adjusted based on the first amount of loss of RF power to control the RF generator to operate at a second set point;
obtain a second value of the one of the plurality of parameters associated with the component of the plasma system;
determine a second amount of loss of RF power from the resistance and the second value of the one of the plurality of parameters; and
adjust the set point of operation of the RF generator based on the second amount of loss of RF power, wherein the set point of operation is adjusted based on the second amount of loss of RF power to control the RF generator to operate at a third set point,
wherein the set point of operation is adjusted based on the firs

Assignees

• Lam Res Corp

Inventors

• Evans Mathew Dennis
• Flowers Cristofer Addison
• Drewery John

Classifications

• H10P72/0604

  Process monitoring, e.g. flow or thickness monitoring · CPC title

• H10P50/242 Primary

  of Group IV materials · CPC title

• H01J37/32183 Primary

  Matching circuits · CPC title

• H01J37/32926

  Software, data control or modelling · CPC title

• H01J37/32935 Primary

  Monitoring and controlling tubes by information coming from the object and/or discharge · CPC title