Crystal line growing state detection method, apparatus and device for silicon rod

US12002234B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12002234-B2
Application numberUS-201917256494-A
CountryUS
Kind codeB2
Filing dateNov 11, 2019
Priority dateNov 26, 2018
Publication dateJun 4, 2024
Grant dateJun 4, 2024

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

A method, apparatus and device for detecting a growth state of a crystalline line of a silicon rod, relating to the technical field of monocrystalline silicon, including in a process of constant-diameter growth of the silicon rod, acquiring a sample image of the silicon rod providing a detection area in the sample image, wherein the detection area overlaps with a crystalline-line growth line of the silicon rod generating a grayscale-value curve of the detection area, and according to the grayscale-value curve of the detection area, determining the growth state of the crystalline line of the silicon rod on the crystalline-line growth line. The method alleviates the affection on the detection of crystalline lines by the fluctuation of the diameter of the silicon rod and the unclarity of the features of the crystalline lines, thereby improving the accuracy and the efficiency of the detection on the crystalline lines.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method for detecting a growth state of a crystalline line of a silicon rod, wherein the method comprises: in a process of constant-diameter growth of the silicon rod, acquiring a sample image of the silicon rod; providing a detection area in the sample image, wherein the detection area overlaps with a crystalline-line growth line of the silicon rod, and in the process of the constant-diameter growth of the silicon rod, the crystalline line of the silicon rod grows along the crystalline-line growth line; generating a grayscale-value curve of the detection area; and according to the grayscale-value curve, determining the growth state of the crystalline line of the silicon rod on the crystalline-line growth line, wherein the detection area comprises: a line segment perpendicular to an axial direction of the silicon rod, or a rectangular area perpendicular to an axial direction of the silicon rod, wherein a plane of the rectangular area is perpendicular to the axial direction of the silicon rod. 2. The method according to claim 1 , wherein if the detection area is the line segment perpendicular to the axial direction of the silicon rod, the step of generating the grayscale-value curve of the detection area comprises: by starting from one end of the line segment, generating a grayscale-value curve corresponding to the line segment. 3. The method according to claim 1 , wherein if the detection area is the rectangular area perpendicular to the axial direction of the silicon rod, the step of generating the grayscale-value curve of the detection area comprises: by starting from one end of the rectangular area, dividing the rectangular area into a plurality of identical sub-areas; calculating an average grayscale value of each of the sub-areas; and according to the average grayscale values of all of the sub-areas, generating a grayscale-value curve corresponding to the rectangular area. 4. The method according to claim 1 , wherein the step of, according to the grayscale-value curve, determining the growth state of the crystalline line of the silicon rod on the crystalline-line growth line comprises: according to the grayscale-value curve, calculating a variance value of the grayscale values in the grayscale-value curve; if the variance value of the grayscale values is greater than or equal to a variance-value threshold, determining the growth state to be a continued state; and if the variance value of the grayscale values is less than the variance-value threshold, determining the growth state to be a line-breaking state. 5. The method according to claim 1 , wherein the step of, according to the grayscale-value curve, determining the growth state of the crystalline line of the silicon rod on the crystalline-line growth line comprises: if the grayscale-value curve has a crystalline-line characteristic peak, determining the growth state to be a continued state; and if the grayscale-value curve does not have the crystalline-line characteristic peak, determining the growth state to be a line-breaking state. 6. The method according to claim 1 , wherein after the step of acquiring the sample image of the silicon rod, the method further comprises: according to a predetermined image-enhancement algorithm, performing image-enhancement processing to the sample image.

Assignees

Inventors

Classifications

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US12002234B2 cover?
A method, apparatus and device for detecting a growth state of a crystalline line of a silicon rod, relating to the technical field of monocrystalline silicon, including in a process of constant-diameter growth of the silicon rod, acquiring a sample image of the silicon rod providing a detection area in the sample image, wherein the detection area overlaps with a crystalline-line growth line of…
Who is the assignee on this patent?
Longi Green Energy Technology Co Ltd
What technology area does this patent fall under?
Primary CPC classification G06T7/62. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Jun 04 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).