Moisture governed growth method of atomic layer ribbons and nanoribbons of transition metal dichalcogenides

US11981996B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11981996-B2
Application numberUS-202218051962-A
CountryUS
Kind codeB2
Filing dateNov 2, 2022
Priority dateApr 16, 2020
Publication dateMay 14, 2024
Grant dateMay 14, 2024

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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Abstract

Official abstract text for this publication.

A method of making an atomic layer nanoribbon that includes forming a double atomic layer ribbon having a first monolayer and a second monolayer on a surface of the first monolayer, wherein the first monolayer and the second monolayer each contains a transition metal dichalcogenide material, oxidizing at least a portion of the first monolayer to provide an oxidized portion, and removing the oxidized portion to provide an atomic layer nanoribbon of the transition metal dichalcogenide material. Also provided are double atomic layer ribbons, double atomic layer nanoribbons, and single atomic layer nanoribbons prepared according to the method.

First claim

Opening claim text (preview).

The invention claimed is: 1. A double atomic layer ribbon comprising a first monolayer, a second monolayer on a surface of the first monolayer, and a metal-containing nanoparticle at an end of the second monolayer, wherein the double atomic layer ribbon is formed by subjecting two or more precursor powders to a moisturized gas flow at a temperature sufficient to deposit the double atomic layer ribbon on a substrate via chemical vapor deposition, wherein the first monolayer has a first average width and the second monolayer has a second average width that is less than the first average width, and wherein the first monolayer comprises a first transition metal dichalcogenide material having a first transition metal and a first dichalcogenide, and the second monolayer comprises a second transition metal dichalcogenide material having a second transition metal and a second dichalcogenide. 2. The double atomic layer ribbon according to claim 1 , wherein the first average width is between about 0.1 and about 100 μm. 3. The double atomic layer ribbon according to claim 1 , wherein the second average width is between about 5 and 100 nm. 4. The double atomic layer ribbon according to claim 1 , wherein the metal-containing nanoparticle comprises Ni or Fe. 5. The double atomic layer ribbon according to claim 4 , wherein the metal-containing nanoparticle further comprises Mo, S, or a combination thereof. 6. The double atomic layer ribbon according to claim 5 , wherein the metal-containing nanoparticle is a Ni—Mo—S nanoparticle or an Fe—Mo—S nanoparticle. 7. The double atomic layer ribbon according to claim 4 , wherein at least one of the first transition metal dichalcogenide material and the second transition metal dichalcogenide material comprises molybdenum disulfide. 8. The double atomic layer ribbon according to claim 1 , wherein the metal-containing nanoparticle comprises a metal that is different from the second transition metal. 9. A double atomic layer ribbon comprising a first monolayer, a second monolayer on a surface of the first monolayer, and a metal-containing nanoparticle at an end of the second monolayer, and wherein the first monolayer comprises a first transition metal dichalcogenide material having a first transition metal and a first dichalcogenide, and the second monolayer comprises a second transition metal dichalcogenide material having a second transition metal and a second dichalcogenide. 10. The double atomic layer ribbon of claim 9 , wherein the metal-containing nanoparticle comprises nickel, iron, or a combination thereof. 11. The double atomic layer ribbon according to claim 9 , wherein at least one of the first transition metal dichalcogenide material and the second transition metal dichalcogenide material comprises molybdenum disulfide. 12. The double atomic layer ribbon according to claim 9 , wherein the first monolayer has a first average width and the second monolayer has a second average width. 13. The double atomic layer ribbon according to claim 12 , wherein the first average width is the same as the second average width. 14. The double atomic layer ribbon according to claim 12 , wherein the first average width is different from the second average width. 15. The double atomic layer ribbon according to claim 12 , wherein the metal-containing nanoparticle comprises a metal that is different from the second transition metal.

Assignees

Inventors

Classifications

  • Anisotropic liquid etching (H10P50/61 takes precedence) · CPC title

  • using chemical vapour deposition [CVD] · CPC title

  • being chalcogenide semiconductor materials not being oxides, e.g. ternary compounds · CPC title

  • being insulating materials · CPC title

  • consisting of two layers · CPC title

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What does patent US11981996B2 cover?
A method of making an atomic layer nanoribbon that includes forming a double atomic layer ribbon having a first monolayer and a second monolayer on a surface of the first monolayer, wherein the first monolayer and the second monolayer each contains a transition metal dichalcogenide material, oxidizing at least a portion of the first monolayer to provide an oxidized portion, and removing the oxi…
Who is the assignee on this patent?
Honda Motor Co Ltd
What technology area does this patent fall under?
Primary CPC classification C23C16/45529. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue May 14 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 12 related publications on this page (citations in our corpus or others sharing the same primary CPC).