Electron gun and charged particle beam device equipped with electron gun

Patent metadata

Field	Value
Publication number	US-11978609-B2
Application number	US-201917595599-A
Country	US
Kind code	B2
Filing date	May 21, 2019
Priority date	May 21, 2019
Publication date	May 7, 2024
Grant date	May 7, 2024

Abstract

An electron gun EG in which mixing of secondary electrons is suppressed is provided. The electron gun EG has an electron source 1, an extraction electrode 2 for extracting an electron beam E1 from the electron source 1, and an acceleration electrode for accelerating the extracted electron beam E1. The extraction electrode 2 includes a diaphragm 4 for allowing a part of the electron beam E1 to pass through, a shield 5 positioned above the diaphragm 4 apart from the diaphragm 4, and a shield 6 positioned below the diaphragm 4 apart from the diaphragm 4. The diaphragm 4 has an opening OP4 having an opening diameter D4, the shield 5 has an opening OP5 having an opening diameter D5 which is greater than the opening diameter D4, and the shield 6 has an opening OP6 having an opening diameter D6 which is greater than the opening diameter D4.

First claim

The invention claimed is:

1. An electron gun comprising:
an electron source;
an extraction electrode for extracting an electron beam from the electron source; and
an acceleration electrode for accelerating the extracted electron beam, wherein
the extraction electrode includes a diaphragm for allowing a part of the electron beam to pass through, a first shield positioned above the diaphragm apart from the diaphragm, and a second shield positioned below the diaphragm apart from the diaphragm,
the diaphragm includes a first opening having a first opening diameter,
the first shield includes a second opening having a second opening diameter greater than the first opening diameter, and
the second shield includes a third opening having a third opening diameter greater than the first opening diameter.

2. The electron gun according to claim 1 ,
wherein a same voltage is applied to the extraction electrode, the diaphragm, the first shield, and the second shield.

3. The electron gun according to claim 2 ,
wherein at least an inside of the first opening has no electric field.

4. The electron gun according to claim 1 ,
wherein, in a plan view, the first opening is included in the second opening and the third opening.

5. The electron gun according to claim 1 ,
wherein a first distance between the diaphragm and the first shield is equal to or greater than the second opening diameter.

6. The electron gun according to claim 5 ,
wherein a second distance between the diaphragm and the second shield is equal to or greater than the third opening diameter.

7. The electron gun according to claim 1 ,
wherein, when drawing a line connecting a tip of the electron source and a side of the diaphragm in the first opening, a virtual extension line extending from the line toward the second shield is extended through an inside of the third opening.

8. The electron gun according to claim 7 ,
wherein the second opening diameter is smaller than the third opening diameter.

9. The electron gun according to claim 1 ,
wherein the extraction electrode includes a third shield positioned above the first shield apart from the first shield, and a fourth shield positioned below the second shield apart from the second shield,
the third shield includes a fourth opening having a fourth opening diameter greater than the first opening diameter, and
the fourth shield includes a fifth opening having a fifth opening diameter greater than the first opening diameter.

10. The electron gun according to claim 1 ,
wherein the diaphragm, the first shield, and the second shield are each formed of a conductive material.

11. The electron gun according to claim 10 ,
wherein the conductive material mainly includes molybdenum, tantalum or tungsten.

12. A charged particle beam device including the electron gun according to claim 1 .

13. The charged particle beam device according to claim 12 , further comprising:
a stage on which a sample can be mounted;
an electron lens for focusing the electron beam emitted from the electron gun; and
a deflection coil for scanning the electron beam to a desired position in the sample when the sample is mounted on the stage.

Assignees

• Hitachi High Tech Corp

Inventors

• Kaneda Minoru

Classifications

• H01J37/09 Primary

  Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields · CPC title

• H01J37/073 Primary

  Electron guns using field emission, photo emission, or secondary emission electron sources · CPC title

• H01J37/075

  Electron guns using thermionic emission from cathodes heated by particle bombardment or by irradiation, e.g. by laser · CPC title

• H01J37/28

  with scanning beams {(H01J37/268, H01J37/292, H01J37/2955 take precedence)} · CPC title

• H01J2237/06316

  Schottky emission · CPC title