Vaporized feed device

Patent metadata

Field	Value
Publication number	US-11976356-B2
Application number	US-202017639288-A
Country	US
Kind code	B2
Filing date	Sep 3, 2020
Priority date	Sep 19, 2019
Publication date	May 7, 2024
Grant date	May 7, 2024

Abstract

A vaporization supply apparatus 1 includes a preheating section 2 for preheating a liquid raw material L, a vaporization section 3 provided on top of the preheating section 2 for heating and vaporizing the preheated liquid raw material L sent from the preheating section 2 , a flow rate control device 4 provided on top of the vaporization section 3 for controlling the flow rate of a gas G sent from the vaporization section 3 , and heaters 5 for heating the preheating section 2 , the vaporization section 3 and the flow rate control device 4.

First claim

What is claimed is:

1. A vaporization supply apparatus comprising:
a preheating section for preheating a liquid raw material;
a vaporization section provided on top of the preheating section for heating and vaporizing a preheated liquid raw material sent from the preheating section;
a flow rate control device provided on top of the vaporization section for controlling a flow rate of a gas sent from the vaporization section; and
heaters for heating the preheating section, the vaporization section, and the flow rate control device,
wherein a first heat insulating member is provided between the preheating section and the vaporization section and a second heat insulating member is provided between the vaporization section and the flow rate control device.

2. The vaporization supply apparatus according to claim 1 , wherein the heaters include a first heater for heating the preheating section, a second heater for heating the vaporization section, and a third heater for heating the flow rate control device, and the heaters are configured to independently heat each of the preheating section, the vaporization section, and the flow rate control device respectively.

3. The vaporization supply apparatus according to claim 2 , wherein the first heater comprises a first side heater for heating a side surface of the preheating section; the second heater comprises a second side heater for heating a side surface of the vaporization section, and the third heater comprises a third side heater for heating a side surface of a portion of the flow rate control device where the gas flows.

4. The vaporization supply apparatus according to claim 3 , wherein the second heater further comprises a second bottom heater for heating a bottom surface of the vaporization section, and the third heater further comprises a third bottom heater for heating a bottom surface of the portion of the flow rate control device where the gas flows.

5. The vaporization supply apparatus according to claim 4 , wherein the first heat insulating member is provided between the second bottom heater and the preheating section, and the second heat insulating member is provided between the third bottom heater and the vaporization section respectively.

6. The vaporization supply apparatus according to claim 1 , wherein the preheating section and the vaporization section communicate with each other via a liquid filling on-off valve and a three-way valve, the liquid filling on-off valve and the three-way valve being provided on top of the preheating section and the vaporization section.

7. A vaporization supply apparatus comprising:
a preheating section for preheating a liquid raw material;
a vaporization section provided on top of the preheating section for heating and vaporizing a preheated liquid raw material sent from the preheating section;
a flow rate control device provided on top of the vaporization section for controlling a flow rate of a gas sent from the vaporization section; and
heaters for heating the preheating section, the vaporization section, and the flow rate control device,
wherein the preheating section and the vaporization section communicate with each other via a liquid filling on-off valve and a three-way valve, the liquid filling on-off valve and the three-way valve being provided on top of the preheating section and the vaporization section.

Assignees

• Fujikin Kk

Inventors

• Nakatani Takatoshi
• Hidaka Atsushi
• Tokuda Ichiro
• NAKATSUJI Keisuke

Classifications

• C23C16/448 Primary

  characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials · CPC title

• C23C16/52

  Controlling or regulating the coating process {(C23C16/45557, C23C16/279 take precedence)} · CPC title

• C23C16/4485 Primary

  by evaporation without using carrier gas in contact with the source material (C23C16/4486 takes precedence) · CPC title

• B01B1/005

  Evaporation for physical or chemical purposes; Evaporation apparatus therefor, e.g. evaporation of liquids for gas phase reactions · CPC title

• C23C16/45561

  Gas plumbing upstream of the reaction chamber · CPC title