Vaporization supply apparatus

US2018071702A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2018071702-A1
Application numberUS-201615565696-A
CountryUS
Kind codeA1
Filing dateApr 11, 2016
Priority dateApr 30, 2015
Publication dateMar 15, 2018
Grant date

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

A vaporization supply apparatus comprises a vaporizer which heats and vaporize a liquid, a flow-rate control device which controls a flow rate of a gas sent out from the vaporizer, a first control valve interposed in a supply channel of a liquid to the vaporizer, a pressure detector for detecting a pressure of a gas vaporized by the vaporizer, a liquid detection part for measuring parameters of a liquid in an amount higher than a predetermined amount in the vaporizer, and a control device which controls the first control valve to supply a predetermined amount of a liquid to the vaporizer based on the pressure value detected by the pressure detector, and to close the first control valve when the liquid detection part detect a liquid in an amount higher than the predetermined amount.

First claim

Opening claim text (preview).

1 . A vaporization supply apparatus comprising: a vaporizer which heats and vaporizes a liquid, a flow-rate control device which controls a flow rate of a gas sent out from the vaporizer, a first control valve interposed in a supply channel of a liquid to the vaporizer, a pressure detector for detecting a pressure of a gas vaporized by the vaporizer and sent to the flow-rate control device, a liquid detection part for measuring parameters of a liquid in an amount higher than a predetermined amount in the vaporizer, and a control device which controls the first control valve to supply a liquid to the vaporizer based on a pressure value detected by the pressure detector, and to close the first control valve when the liquid detection part detects a liquid flowing into the vaporizer in an amount higher than the predetermined amount. 2 . The vaporization supply apparatus according to claim 1 further comprising a second control valve interposed in a gas passage between the vaporizer and the flow-rate control device, wherein the control device, when the liquid detection part detects a liquid flowing into the vaporizer in an amount higher than the predetermined amount, controls to close the first control valve and the second control valve. 3 . A vaporization supply apparatus comprising: a vaporizer which heats and vaporizes a liquid, a flow-rate control device which controls a flow rate of a gas sent out from the vaporizer, a first control valve interposed in a supply channel of a liquid to the vaporizer, a pressure detector for detecting a pressure of a gas vaporized by the vaporizer and sent to the flow-rate control device, a second control valve interposed in a gas passage between the vaporizer and the flow-rate control device, a liquid detection part for measuring parameters of a liquid in an amount higher than a predetermined amount in the vaporizer, and a control device which controls the first control valve to supply a liquid to the vaporizer based on a pressure value detected by the pressure detector, and controls to close the second control valve when the liquid detection part detects a liquid flowing into the vaporizer in an amount higher than the predetermined amount. 4 . The vaporization supply apparatus according to claim 1 , wherein the liquid detection part is a temperature detector. 5 . The vaporization supply apparatus according to claim 1 , wherein the liquid detection part is a level gauge. 6 . The vaporization supply apparatus according to claim 1 , wherein the liquid detection part is a load cell. 7 . The vaporization supply apparatus according to claim 1 , wherein the vaporizer is provided with a vaporizing chamber, and the liquid detection part is disposed in the vaporizing chamber. 8 . The vaporization supply apparatus according to claim 1 , wherein the vaporizer is provided with a vaporizing chamber and a gas heating chamber which is in communication with the vaporizing chamber, and the liquid detection part is disposed in the gas heating chamber. 9 . The vaporization supply apparatus according to claim 3 , wherein the liquid detection part is a temperature detector. 10 . The vaporization supply apparatus according to claim 3 , wherein the liquid detection part is a level gauge. 11 . The vaporization supply apparatus according to claim 3 , wherein the liquid detection part is a load cell. 12 . The vaporization supply apparatus according to claim 3 , wherein the vaporizer is provided with a vaporizing chamber, and the liquid detection part is disposed in the vaporizing chamber. 13 . The vaporization supply apparatus according to claim 3 , wherein the vaporizer is provided with a vaporizing chamber and a gas heating chamber which is in communication with the vaporizing chamber, and the liquid detection part is disposed in the gas heating chamber.

Assignees

Inventors

Classifications

  • using mainly spraying means, e.g. nozzles · CPC title

  • by vapour etching only · CPC title

  • of insulating materials · CPC title

  • B01J7/02Primary

    by wet methods · CPC title

  • characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US2018071702A1 cover?
A vaporization supply apparatus comprises a vaporizer which heats and vaporize a liquid, a flow-rate control device which controls a flow rate of a gas sent out from the vaporizer, a first control valve interposed in a supply channel of a liquid to the vaporizer, a pressure detector for detecting a pressure of a gas vaporized by the vaporizer, a liquid detection part for measuring parameters of…
Who is the assignee on this patent?
Fujikin Kk
What technology area does this patent fall under?
Primary CPC classification B01J7/02. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Thu Mar 15 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).