Method for producing 3d-structured thin films
US-2016006016-A1 · Jan 7, 2016 · US
US11973229B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11973229-B2 |
| Application number | US-202117355982-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jun 23, 2021 |
| Priority date | Feb 28, 2020 |
| Publication date | Apr 30, 2024 |
| Grant date | Apr 30, 2024 |
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The present disclosure relates to an anode for a lithium-metal battery, a manufacturing method of the same, and a lithium-metal battery including the anode. The anode for a lithium-metal battery includes a complex hierarchical structure current collector which includes an inverted pyramid-shaped micro hole pattern and nanostructures provided within the inverted pyramid-shaped micro hole pattern; and a lithium metal which is electrodeposited on the nanostructure of the current collector. As a result, it is possible to increase the life stability of the battery and increase the coulombic efficiency.
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What is claimed is: 1. A method for manufacturing an anode for a lithium-metal battery, the method comprising: manufacturing a copper electrode comprising an inverted pyramid-shaped micro hole pattern, wherein the manufacturing the copper electrode comprising the inverted pyramid-shaped micro hole pattern comprises: applying an oxygen plasma treated Si x N y wafer on a silicon substrate, coating a photo resistor pattern on the Si x N y wafer, removing the Si x N y wafer in a region where there is no photo resistor pattern, by performing photolithography etching, removing the photo resistor pattern, forming the inverted pyramid-shaped micro hole pattern by etching the silicon substrate of a region where there is no Si x N y wafer, depositing a composite of chromium and copper, forming a nickel mold by performing nickel plating through an electrocast, and forming the copper electrode comprising the inverted pyramid-shaped micro hole pattern by performing copper plating on the nickel mold through the electrocast; electrodepositing nanostructures on the inverted pyramid-shaped micro hole pattern; and electrodepositing a lithium metal on the nanostructures. 2. The method of claim 1 , wherein the electrodepositing nanostructures on the inverted pyramid-shaped micro hole pattern comprises: growing the nanostructures on the copper electrode based on an electrodeposition method; removing the nanostructures overgrown outside the inverted pyramid-shaped micro hole pattern of the copper electrode; and performing mechanical polishing in order to remove the nanostructures remaining outside the inverted pyramid-shaped micro hole pattern of the copper electrode. 3. The method of claim 2 , wherein the removing the nanostructures overgrown outside the inverted pyramid-shaped micro hole pattern of the copper electrode comprises removing the nanostructures overgrown outside the inverted pyramid-shaped micro hole pattern of the copper electrode by using a polyimide tape and a rubber roller. 4. The method of claim 2 , wherein the growing the nanostructures on the copper electrode based on an electrodeposition method and the removing the nanostructures overgrown outside the inverted pyramid-shaped micro hole pattern of the copper electrode are performed repeatedly a plurality of number of times. 5. The method of claim 1 , wherein the manufacturing a copper electrode comprising an inverted pyramid-shaped micro hole pattern comprises manufacturing the inverted pyramid-shaped micro hole pattern such that a plurality of inverted pyramid-shaped micro holes are disposed at regular intervals, and wherein the inverted pyramid-shaped micro hole has a quadrangular lower surface and a quadrangular upper surface wider than the lower surface, and has a side surface having an inclined structure. 6. The method of claim 5 , wherein the manufacturing a copper electrode comprising an inverted pyramid-shaped micro hole pattern comprises: manufacturing such that center-to-center spacing between two adjacent inverted pyramid-shaped micro holes is 100 μm; and manufacturing such that a length of one side of the upper surface of the inverted pyramid-shaped micro hole is between 40 μm to 50 μm, and a depth of the inverted pyramid-shaped micro hole is 20 μm. 7. The method of claim 6 , wherein the manufacturing a copper electrode comprising an inverted pyramid-shaped micro hole pattern comprises manufacturing such that the side surface of the inverted pyramid-shaped micro hole has an inclined structure of between 50 degrees and 60 degrees.
Porous plates, e.g. sintered carriers · CPC title
Electrochemical coating; Electrochemical impregnation · CPC title
Electrodes based on metals, Si or alloys · CPC title
Lithium (H01M4/405 takes precedence) · CPC title
Metal or alloys, e.g. alloy coatings (H01M4/669 take precedence) · CPC title
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