Laterally diffused MOSFET with low Rsp*Qg product

Patent metadata

Field	Value
Publication number	US-11973139-B2
Application number	US-202117302060-A
Country	US
Kind code	B2
Filing date	Apr 22, 2021
Priority date	Sep 13, 2018
Publication date	Apr 30, 2024
Grant date	Apr 30, 2024

Abstract

An improved laterally diffused MOSFET (LDMOS) device enables an ability to tune some device parameters independently of other device parameters and/or provides a device architecture with component dimensions that significantly improve device performance. The LDMOS device includes a stepped gate having a first portion with a thin gate insulator over a body region and a second portion with a thick gate insulator over part of a drift region. In some embodiments, a gate shield is disposed over another part of the drift region to reduce a gate-drain capacitance of the LDMOS device. In some embodiments, the LDMOS device has a specific resistance (Rsp) of about 5-8 mOhm*mm 2 , a gate charge (Qg) of about 1.9-2.0 nC/mm 2 , and an Rsp*Qg product figure of merit of about 10-15 mOhm*nC.

First claim

What is claimed is:

1. A laterally diffused MOSFET device comprising:
a source region in an active layer;
a drain region in the active layer;
a body region in the active layer between the source region and the drain region;
a drift region in the active layer between the body region and the drain region, wherein the drift region is in direct physical contact with the body region without an element between them and extends to a top surface of the active layer for an entire lateral extent between the body region and the drain region without a shallow trench isolation region or a local oxidation of silicon isolation region between the body region and the drain region;
a stepped gate having a first portion disposed over the body region and a second portion disposed over a first portion of the drift region;
a first gate insulator region between the first portion of the stepped gate and the body region;
a second gate insulator region between the second portion of the stepped gate and the first portion of the drift region;
a gate shield, a first portion of which is disposed over a second portion of the drift region between the stepped gate and the drain region to reduce a gate-drain capacitance of the laterally diffused MOSFET device; and
a shield insulator region between the first portion of the gate shield and the second portion of the drift region, the shield insulator region having a thickness of about 900-1100 Å;
wherein the gate shield laterally extends about 0.3-0.7 μm from above an edge of the stepped gate in a direction toward the drain region.

2. The laterally diffused MOSFET device of claim 1 , wherein:
the first and second portions of the stepped gate are continuous with each other.

3. The laterally diffused MOSFET device of claim 1 , wherein:
the first gate insulator region has a first thickness; and
the second gate insulator region has a second thickness greater than the first thickness.

4. The laterally diffused MOSFET device of claim 1 , further comprising:
a source contact electrically connected to the source region and to the gate shield.

5. The laterally diffused MOSFET device of claim 1 , wherein:
a second portion of the gate shield is disposed over the stepped gate.

6. A laterally diffused MOSFET device comprising:
a source region in an active layer;
a drain region in the active layer;
a body region in the active layer between the source region and the drain region;
a drift region in the active layer between the body region and the drain region, wherein the drift region is in direct physical contact with the body region without an element between them and extends to a top surface of the active layer for an entire lateral extent between the body region and the drain region without a shallow trench isolation region or a local oxidation of silicon isolation region between the body region and the drain region;
a stepped gate having a first portion disposed over the body region and a second portion disposed over a first portion of the drift region;
a first gate insulator region between the first portion of the stepped gate and the body region; and
a second gate insulator region between the second portion of the stepped gate and the first portion of the drift region;
wherein:
the laterally diffused MOSFET device has a specific resistance (Rsp) of about 5-8 mOhm*mm 2 and a gate charge (Qg) of about 1.5-3.0 nC/mm 2 .

7. A laterally diffused MOSFET device comprising:
a source region in an active layer;
a drain region in the active layer;
a body region in the active layer between the source region and the drain region;
a drift region in the active layer between the body region and the drain region, wherein the drift region is in direct physical contact with the body region without an element between them and extends to a top surface of the active layer for an entire lateral extent between the body region and the drain region without a shallow trench isolation region or a local oxidation of silicon isolation region between the body region and the drain region;
a stepped gate having a first portion disposed over the body region and a second portion disposed over a first portion of the drift region;
a first gate insulator region between the first portion of the stepped gate and the body region; and
a second gate insulator region between the second portion of the stepped gate and the first portion of the drift region;
wherein:
the laterally diffused MOSFET device has an Rsp*Qg product figure of merit of about 10-15 mOhm*nC.

8. A laterally diffused MOSFET device comprising:
a source region in an active layer;
a drain region in the active layer;
a body region in the active layer between the source region and the drain region;
a drift region in the active layer between the body region and the drain region, wherein the drift region is in direct physical contact with the body region without an element between them and extends to a top surface of the active layer for an entire lateral extent between the body region and the drain region without a shallow trench isolation region or a local oxidation of silicon isolation region between the body region and the drain region;
a stepped gate having a first portion disposed over the body region and a second portion disposed over a first portion of the drift region;
a first gate insulator region between the first portion of the stepped gate and the body region; and
a second gate insulator region between the second portion of the stepped gate and the first portion of the drift region;
wherein:
the first portion of the stepped gate has a first length of about 0.1-0.4 μm;
the second portion of the stepped gate has a second length of about 0.1-0.6 μm;
the first gate insulator region has a first thickness of about 30-62 Å; and
the second gate insulator region has a second thickness of about 300-500 Å.

9. A laterally diffused MOSFET device comprising:
a source region in an active layer;
a drain region in the active layer;
a body region in the active layer between the source region and the drain region;
a drift region in the active layer between the body region and the drain region, wherein the drift region is in direct physical contact with the body region without an element between them and extends to a top surface of the active layer for an entire lateral extent between the body region and the drain region without a shallow trench isolation region or a local oxidation of silicon isolation region between the body region and the drain region;
a stepped gate having a first portion disposed over the body region and a second portion disposed over a first portion of the drift region;
a first gate insulator region between the first portion of the stepped gate and the body region; and
a second gate insulator region between the second portion of the stepped gate and the first portion of the drift region;
wherein:
the laterally diffused MOSFET device is configured to form a channel region within the body region, a length of the channel region being about the same as a length of the first portion of the stepped gate; and
the laterally diffused MOSFET device is configured to form an accumulation region within the first portion of the drift region due to an electric field from the second portion of the stepped gate.

10. The laterally diffused MOSFET device of claim 9 , wherein:
the channel region is aligned with the first portion of the stepped gate.

11. An electronic circuit comprising:
a laterally diffused MOSFET device comprising:
a source region in an active layer;
a drain region in the active layer;
a body region in the active layer between the source region and the drain region;
a

Assignees

• Silanna Asia Pte Ltd

Inventors

• Snyder David

Classifications

• H10D30/0281

  of lateral DMOS [LDMOS] FETs · CPC title

• H10D64/514

  characterised by the insulating layers · CPC title

• H10D84/0144

  Manufacturing their gate insulating layers · CPC title

• H10D84/0147

  Manufacturing their gate sidewall spacers · CPC title

• H10D30/65 Primary

  Lateral DMOS [LDMOS] FETs · CPC title