Silicon carbide (SiC)-loaded graphene photocatalyst for hydrogen production under visible light irradiation and preparation thereof

US11969716B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11969716-B2
Application numberUS-202318339190-A
CountryUS
Kind codeB2
Filing dateJun 21, 2023
Priority dateJun 23, 2022
Publication dateApr 30, 2024
Grant dateApr 30, 2024

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Abstract

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This application discloses a silicon carbide (SiC)-loaded graphene photocatalyst for hydrogen production under visible light irradiation and a preparation method thereof. Pure SiC and pure black carbon are respectively prepared and mixed to obtain a mixture with a resistance less than 100Ω. Then the mixture was vacuumized and processed with a current pulse with an increasing voltage until a breakdown occurs, and subjected to ultrasonic stirring, centrifugal washing and vacuum drying in turn to obtain the SiC-loaded graphene photocatalyst. By means of the current pulse, a heterojunction is formed between SiC and graphene to improve the catalytic activity of the photocatalyst; and the photocatalytic hydrogen production rate of SiC nanoparticles can be enhanced after loaded on the graphene.

First claim

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What is claimed is: 1. A method for preparing a silicon carbide (SiC)-loaded graphene photocatalyst for hydrogen production under visible light irradiation, comprising: step (A) preparing a pure SiC; step (B) preparing a pure black carbon; step (C) mixing the pure SiC and the pure black carbon to obtain a mixture, wherein the mixture has a resistance less than 100 Ω; step (D) feeding the mixture to a current pulse processing equipment; and vacuumizing the current pulse processing equipment, and processing the mixture with a current pulse with an increasing voltage until a breakdown of the mixture occurs, wherein the current pulse has a capacitance of 70-80 mF and a voltage of 120-180 V; and step (E) subjecting the mixture to ultrasonic stirring, centrifugal washing and vacuum drying in turn to obtain the SiC-loaded graphene photocatalyst. 2. The method of claim 1 , wherein step (A) comprises: step (A1) calcining SiC powder followed by natural cooling to room temperature; step (A2) immersing the SiC powder obtained in step (A1) with a HF (Hydrogen Fluoride) solution under a sealed and light-proof condition; and step (A3) filtering an immersion system obtained in step (A2) to collect a filter residue; and subjecting the filter residue to washing with deionized water and vacuum drying to obtain the pure SiC. 3. The method of claim 2 , wherein in step (A1), the SiC powder is calcined at 600-900° C. for 3-4 h; in step (A2), the HF solution has a HF content of 1-5% by weight; and in step (A3), the vacuum drying is performed at 50-90° C. for 3-4 h. 4. The method of claim 1 , wherein step (B) comprises: calcining black carbon powder followed by natural cooling to room temperature to obtain the pure black carbon. 5. The method of claim 4 , wherein the black carbon powder is calcined at 200-300° C. for 3-4 h. 6. The method of claim 1 , wherein in step (E), the ultrasonic stirring is performed at 40-60° C. for 20-60 min. 7. The method of claim 1 , wherein in step (E), the centrifugal washing is performed at 500-800 r/min for 30-40 min. 8. The method of claim 1 , wherein in step (E), the vacuum drying is performed at 60-80° C. for 3-4 h. 9. A SiC-loaded graphene photocatalyst prepared by the method of claim 1 for hydrogen production under visible light irradiation.

Assignees

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Classifications

  • X-ray diffraction · CPC title

  • Indexing scheme associated with group B01J35/00, related to the analysis techniques used to determine the catalysts form or properties · CPC title

  • B01J27/224Primary

    Silicon carbide · CPC title

  • Calcining · CPC title

  • Carbon · CPC title

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What does patent US11969716B2 cover?
This application discloses a silicon carbide (SiC)-loaded graphene photocatalyst for hydrogen production under visible light irradiation and a preparation method thereof. Pure SiC and pure black carbon are respectively prepared and mixed to obtain a mixture with a resistance less than 100Ω. Then the mixture was vacuumized and processed with a current pulse with an increasing voltage until a bre…
Who is the assignee on this patent?
Univ Guangdong Technology
What technology area does this patent fall under?
Primary CPC classification B01J27/224. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Apr 30 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).