Polymer and positive resist composition
US-10241405-B2 · Mar 26, 2019 · US
Resist composition and resist film
US11960207B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11960207-B2 |
| Application number | US-201916963831-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jan 17, 2019 |
| Priority date | Feb 5, 2018 |
| Publication date | Apr 16, 2024 |
| Grant date | Apr 16, 2024 |
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- Title
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Abstract
Official abstract text for this publication.
Provided are a resist composition that can improve coatability (coating film formability) with respect to a substrate in spin coating and close adherence of a resist film and that can form a good pattern, and a resist film in which a good pattern is formed. The resist composition contains a polymer, a solvent, and an aromatic vinyl monomer, and has a content of the aromatic vinyl monomer relative to the polymer of not less than 10 mass ppm and not more than 30,000 mass ppm.
First claim
Opening claim text (preview).
The invention claimed is: 1. A resist composition comprising a polymer, a solvent, and an aromatic vinyl monomer, wherein content of the aromatic vinyl monomer relative to the polymer is not less than 10 mass ppm and less than 7,561 mass ppm. 2. The resist composition according to claim 1 , wherein the aromatic vinyl monomer is an α-methylstyrene derivative. 3. The resist composition according to claim 1 , further comprising an α-halogeno(meth)acrylic acid ester monomer, wherein content of the α-halogeno(meth)acrylic acid ester monomer relative to the polymer is not less than 5 mass ppm and not more than 2,000 mass ppm. 4. The resist composition according to claim 1 , wherein the polymer includes an α-methylstyrene monomer unit and a methyl α-chloroacrylate monomer unit. 5. A resist film formed on a substrate using the resist composition according to claim 1 .
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Classifications
the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers · CPC title
- G03F7/039Primary
Macromolecular compounds which are photodegradable, e.g. positive electron resists (G03F7/075 takes precedence; macromolecular quinonediazides G03F7/023) · CPC title
- G03F7/027Primary
Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds (G03F7/075 takes precedence) · CPC title
Styrene · CPC title
Esters containing halogen · CPC title
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- What does patent US11960207B2 cover?
- Provided are a resist composition that can improve coatability (coating film formability) with respect to a substrate in spin coating and close adherence of a resist film and that can form a good pattern, and a resist film in which a good pattern is formed. The resist composition contains a polymer, a solvent, and an aromatic vinyl monomer, and has a content of the aromatic vinyl monomer relati…
- Who is the assignee on this patent?
- Zeon Corp
- What technology area does this patent fall under?
- Primary CPC classification G03F7/039. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Apr 16 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).