Polymer and positive resist composition
US-2018024430-A1 · Jan 25, 2018 · US
Polymer and positive resist composition
US10241405B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10241405-B2 |
| Application number | US-201615549764-A |
| Country | US |
| Kind code | B2 |
| Filing date | Feb 15, 2016 |
| Priority date | Feb 20, 2015 |
| Publication date | Mar 26, 2019 |
| Grant date | Mar 26, 2019 |
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- Title
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Abstract
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Provided are a polymer that can be favorably used as a positive resist having a low film reduction rate under low irradiation, a high γ value, and high sensitivity, and a positive resist composition that can efficiently form a high-resolution pattern. The polymer includes an α-methylstyrene unit and a methyl α-chloroacrylate unit, and has a molecular weight distribution (Mw/Mn) of less than 1.48. In the polymer, the proportion of components having a molecular weight of less than 6,000 is no greater than 0.5% and the proportion of components having a molecular weight of greater than 80,000 is no greater than 6.0%. The positive resist composition contains the aforementioned polymer and a solvent.
First claim
Opening claim text (preview).
The invention claimed is: 1. A polymer comprising an α-methylstyrene unit and a methyl α-chloroacrylate unit, wherein the polymer has a molecular weight distribution (Mw/Mn) of less than 1.48, a proportion of components having a molecular weight of less than 6,000 is no greater than 0.5%, a proportion of components having a molecular weight of greater than 80,000 is no greater than 6.0%, and a proportion of components having a molecular weight of greater than 100,000 is at least 0.5%. 2. The polymer according to claim 1 , wherein a proportion of components having a molecular weight of less than 10,000 is no greater than 0.8%. 3. The polymer according to claim 1 having a weight average molecular weight (Mw) of at least 30,000. 4. A positive resist composition comprising the polymer according to claim 1 and a solvent.
Assignees
Inventors
Classifications
- G03F7/039Primary
Macromolecular compounds which are photodegradable, e.g. positive electron resists (G03F7/075 takes precedence; macromolecular quinonediazides G03F7/023) · CPC title
with unsaturated esters · CPC title
Esters containing halogen · CPC title
Monomers containing a branched unsaturated aliphatic radical or a ring substituted by an alkyl radical · CPC title
Narrow molecular weight distribution, i.e. Mw/Mn < 3 · CPC title
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- What does patent US10241405B2 cover?
- Provided are a polymer that can be favorably used as a positive resist having a low film reduction rate under low irradiation, a high γ value, and high sensitivity, and a positive resist composition that can efficiently form a high-resolution pattern. The polymer includes an α-methylstyrene unit and a methyl α-chloroacrylate unit, and has a molecular weight distribution (Mw/Mn) of less than 1.4…
- Who is the assignee on this patent?
- Zeon Corp
- What technology area does this patent fall under?
- Primary CPC classification G03F7/039. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Mar 26 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).