Anti-dazzle imaging camera and method
US-2017329202-A1 · Nov 16, 2017 · US
US11953765B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11953765-B2 |
| Application number | US-202318298097-A |
| Country | US |
| Kind code | B2 |
| Filing date | Apr 10, 2023 |
| Priority date | Aug 2, 2019 |
| Publication date | Apr 9, 2024 |
| Grant date | Apr 9, 2024 |
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
What the patent document calls the invention.
A short plain-language summary of the technical disclosure.
Who owns or filed the patent and who is credited as inventor.
Filing, priority, publication, and grant dates set the timeline.
The legal scope of protection — read this for what is actually claimed.
Technology tags used to group this patent with similar filings.
Prior art links and similar publications in this corpus.
Official abstract text for this publication.
A method is provided for operating one or more one solid-state electro-optic device to provide an electrically switching shutter. The method includes forming an alternating stack of first semiconductor layers having a first dopant and second semiconductor layers having a second dopant to form at least one superlattice semiconductor device. The method further includes applying to the at least one superlattice semiconductor device a first voltage to induce a transparent state of the alternating stack such that light is transmitted through the alternating stack, and applying to the at least one superlattice semiconductor device a second voltage different from the first voltage to induce an opaque state of the alternating stack such that light is inhibited from passing through the alternating stack.
Opening claim text (preview).
What is claimed is: 1. A solid-state electro-optic device with an electrically variable aperture, comprising: at least one superlattice semiconductor device including an alternating stack of first semiconductor layers having a first dopant and second semiconductor layers having a second dopant; wherein the alternating stack of the first semiconductor layers includes a patterned portion defining a first transparent transitioning region between a first pair of electrical connectors, and a second transparent transitioning region between a second pair of electrical connectors; wherein the first and second pairs of electrical connectors are configured to receive a first voltage to induce a first optical state of the first and second transparent transitioning regions such that a first amount of light is transmitted through the alternating stack; and wherein the first and second pairs of electrical connectors are configured to receive a second voltage to induce a second optical state to the first transparent transitioning region, while maintaining the first state of the second transparent transitioning region such that a second amount of light different from the first amount is transmitted through the alternating stack. 2. The solid-state electro-optic device of claim 1 , wherein the first optical state is a transparent state and the second optical state is an opaque state such that the second amount of light is less than the first amount of light. 3. The solid-state electro-optic device of claim 1 , wherein the first optical state is an opaque state and the second optical state is a transparent state such that the second amount of light is greater than the first amount of light. 4. The solid-state electro-optic device of claim 1 , wherein the first semiconductor layers comprise a semiconductor material doped with a p-type dopant and the second semiconductor layers comprise a semiconductor material doped with an n-type dopant, and wherein the second pair of electrical connectors includes the second electrical connector and a third electrical connector connected to the first semiconductor layers. 5. The solid-state electro-optic device of claim 1 , wherein the first semiconductor layers comprise a semiconductor material doped with an n-type dopant and the second semiconductor layers comprise a semiconductor material doped with a p-type dopant, and wherein the second pair of electrical connectors includes the second electrical connector and a third electrical connector connected to the first semiconductor layers. 6. The solid-state electro-optic device of claim 1 , wherein the first and second transparent transitioning regions have circular profiles.
Structures with periodic or quasi periodic potential variation, e.g. superlattices, quantum wells · CPC title
involving infrared radiation · CPC title
Optical limiters · CPC title
spatial light modulator · CPC title
Related publications grouped by family.
Answers are generated from the same data shown on this page.