Process for the preparation of fluorinated quartz glass

Patent metadata

Field	Value
Publication number	US-11952302-B2
Application number	US-202117395791-A
Country	US
Kind code	B2
Filing date	Aug 6, 2021
Priority date	Aug 6, 2020
Publication date	Apr 9, 2024
Grant date	Apr 9, 2024

Abstract

A process for the production of a fluorinated quartz glass including the steps of generating SiO 2 particles in a synthesis burner; depositing the resulting SiO 2 particles into a body; and vitrifying the resulting body, wherein a fluorinating agent having a boiling point greater than or equal to −10° C. is supplied to the synthesis burner.

First claim

The invention claimed is:

1. A process for the production of fluorinated quartz glass, characterized by:
(a) generating SiO 2 particles in a synthesis burner;
(b) depositing the SiO 2 particles resulting from process (a) on a substrate to form a body; and
(c) vitrifying the body resulting from process (b),
wherein a fluorinating agent having a boiling point of greater than or equal to −10° C. is introduced to the synthesis burner during process (a),

wherein fluorinating agent is selected from a group comprising:
i. oxygen-containing fluorinating agents;
ii. nitrile-containing fluorinating agents;
iii. mixtures of the oxygen-containing and nitrile-containing fluorinating agents, characterized in that the oxygen-containing fluorinating agents are selected from the group consisting of:
i. Perfluoroketones of the general formula (I)
R F1 —CO—R F2   (I),

wherein R F1 is selected from the group consisting of perfluorinated carbon groups having 1 to 7 carbon atoms and fluorine; and R F2 is selected from the group consisting of perfluorinated carbon groups having 1 to 7 carbon atoms;

ii. Perfluoroethers of the general formula (II)
R F1 —C(X 1 )(X 2 )O—R F2   (II),

wherein R F1 is selected from the group consisting of perfluorinated carbon groups having 1 to 7 carbon atoms and fluorine; R F2 is selected from the group consisting of perfluorinated carbon groups having 1 to 7 carbon atoms; and X 1 and X 2 are F or CF 3 ;

iii. Hydrofluoroethers of the general formula (III)
R F1 —C(X 1 )(X 2 )O—R F2   (II),

wherein RF 1 is selected from the group consisting of perfluorinated carbon groups having 1 to 7 carbon atoms and fluorine; R 2 is a non-fluorinated hydrocarbon group having from 1 to 3 carbon atoms; X 1 and X 2 stand for F or CF 3 ;
characterized in that the fluorinating agent is supplied to the synthesis burner in liquid or gaseous form.

2. The process according to claim 1 , characterized in that the nitrile-containing fluorinating agents are selected from the group consisting of
iv. Perfluoronitriles of the general formula (IV)
R F1 —C≡N  (IV),

wherein R F1 is selected from the group consisting of a perfluorinated carbon group having 1 to 7 carbon atoms.

3. The process according to claim 1 , characterized in that the synthesis burner is a flame hydrolysis synthesis burner or a plasma synthesis burner.

4. The process according to claim 1 , characterized in that the deposition of SiO 2 particles to form a body in process (b) is carried out outside of the substrate.

5. The process according to claim 1 , characterized in that the deposition of SiO 2 particles to form a body in process (b) takes place in a substrate tube.

6. The process according to claim 1 , characterized in that the process (b) and (c) are carried out simultaneously.

7. The process according to claim 1 , characterized in that the fluorinating agent is supplied in gaseous form to the synthesis burner and is previously evaporated in an evaporator, or in that the fluorinating agent is supplied in gaseous form to the synthesis burner and is previously subjected to direct evaporation, or in that the fluorinating agent is supplied in gaseous form to the synthesis burner and is previously provided in the carrier gas in a bubbler using a carrier gas.

8. The process according to claim 1 , characterized in that the fluorinating agent is supplied to the synthesis burner as a liquid in atomized form or as an aerosol.

Assignees

• Heraeus Quarzglas

Inventors

• Ochs Stefan
• Kayser Thomas
• Trommer Martin
• Langner Andreas
• Pihan Sascha
• Schuster Kay
• Hünermann Michael

Classifications

• C03B19/143 Primary

  Plasma vapour deposition · CPC title

• C03B19/1423

  Reactant deposition burners · CPC title

• C03B19/1453

  Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering · CPC title

• C03C3/06

  with more than 90% silica by weight, e.g. quartz {(C03C3/045 takes precedence)} · CPC title

• C03B2201/12

  doped with fluorine (C03B2201/14 takes precedence) · CPC title