Electronic device display vias
US-9832868-B1 · Nov 28, 2017 · US
US11950371B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11950371-B2 |
| Application number | US-201916966118-A |
| Country | US |
| Kind code | B2 |
| Filing date | Aug 22, 2019 |
| Priority date | Aug 22, 2019 |
| Publication date | Apr 2, 2024 |
| Grant date | Apr 2, 2024 |
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A method for manufacturing a transparent circuit board includes the following steps. A composite substrate including a conductive layer and a transparent insulating layer on the conductive layer is provided. A wiring groove is formed on the transparent insulating layer by laser ablation and a carbon black layer is formed on an inner wall of the wiring groove. The wiring groove penetrates the transparent insulating layer, the wiring groove extends toward the conductive layer to pass through a part of the conductive layer. A conductive wiring corresponding to the wiring groove is formed and fully fills the wiring groove. A black oxide treatment is performed on a surface of the conductive wiring facing away from the conductive layer to form a blackened layer. A transparent cover film is pressed on a side of the transparent insulating layer facing away from the conductive layer. The conductive layer is removed.
Opening claim text (preview).
What is claimed is: 1. A method for manufacturing a transparent circuit board, comprising: providing a composite substrate, the composite substrate comprising a conductive layer and a transparent insulating layer on the conductive layer; forming a wiring groove on the transparent insulating layer by laser ablation, and forming a carbon black layer on an inner wall of the wiring groove, wherein the wiring groove penetrates the transparent insulating layer, the wiring groove extends toward the conductive layer to pass through a part of the conductive layer; forming a conductive wiring corresponding to the wiring groove, the conductive wiring fully filling the wiring groove; performing a black oxide treatment on a surface of the conductive wiring facing away from the conductive layer to form a blackened layer; pressing a transparent cover film on a side of the transparent insulating layer facing away from the conductive layer; and removing the conductive layer. 2. The method for manufacturing the transparent circuit board of claim 1 , wherein the conductive layer is a nickel plate. 3. The method for manufacturing the transparent circuit board of claim 1 , wherein a surface roughness of the blackened layer is greater than a surface roughness of the carbon black layer. 4. The method for manufacturing the transparent circuit board of claim 1 , wherein the composite substrate comprises two transparent insulating layers on opposite surfaces of the conductive layer. 5. The method for manufacturing the transparent circuit board of claim 1 , wherein a line width of the conductive wiring is less than 8 μm, and a thickness of the conductive wiring is greater than 10 μm.
Optical details, e.g. printed circuits comprising integral optical means (H05K1/0269 takes precedence; coupling light guides with opto-electronic components G02B6/42) · CPC title
Processing two or more printed circuits simultaneously, e.g. made from a common substrate, or temporarily stacked circuit boards (H05K3/0052 takes precedence) · CPC title
by laser ablation · CPC title
by applying an insulating layer having channels for the next circuit layer · CPC title
by filling grooves in the support with conductive material (H05K3/045, H05K3/101, H05K3/1258 and H05K3/465 take precedence) · CPC title
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