Hafnium oxide corrosion inhibitor

Patent metadata

Field	Value
Publication number	US-11946148-B2
Application number	US-202017416328-A
Country	US
Kind code	B2
Filing date	Jan 10, 2020
Priority date	Jan 11, 2019
Publication date	Apr 2, 2024
Grant date	Apr 2, 2024

Abstract

Described herein is an etching solution suitable for the selective removal of TiSiN over hafnium oxide from a microelectronic device, which consists essentially of: water; at least one alkaline ammonium compound selected from the group consisting of ammonium hydroxide, a quaternary ammonium hydroxide, ammonium fluoride, and a quaternary ammonium fluoride; at least one peroxide compound; a water-miscible organic solvent; at least one nitrogen containing compound selected from the group consisting of a C 4-12 alkylamine, a polyalkylenimine, and a polyamine; and optionally at least one chelating agent.

First claim

The invention claimed is:

1. An etching solution suitable for the selective removal of TiSiN over hafnium oxide from a microelectronic device, consisting of:
water;
from about 3.7 to about 4.5 wt. % neat of at least one alkaline ammonium compound selected from the group consisting of ammonium hydroxide;
from about 3.9 to about 4.5 wt. % neat of at least one peroxide compound;
a water-miscible organic solvent; and
at least one nitrogen containing compound selected from the group consisting of a C 4-12 alkylamine, a polyalkylenimine, and a polyamine; and
optionally a surfactant.

2. The etching solution of claim 1 wherein the at least one alkaline ammonium compound comprises ammonium hydroxide and ammonium fluoride.

3. The etching solution of claim 2 wherein the water-miscible organic solvent is selected from the group consisting of sulfolane, dimethylsulfoxide (DMSO), and propylene glycol; and the at least one peroxide compound is hydrogen peroxide.

4. The etching solution of claim 3 wherein the at least one nitrogen containing compound is selected from pentamethyldiethylenetriamine (PMDETA), triethylenediamine (TEDA), triethylenetetramine (TETA), tetramethylethylenediamine (TMEDA), and diethylenetriamine (DETA).

5. The etching solution of claim 3 wherein the at least one nitrogen containing compound is octylamine.

6. The etching solution of claim 3 wherein the at least one nitrogen containing compound is the polyalkylenimine.

7. The etching solution of claim 6 wherein the polyalkylenimine is polyethylenimine.

8. The etching solution of claim 3 wherein the at least one nitrogen containing compound is pentamethyldiethylenetriamine (PMDETA).

9. A method for selectively enhancing the etch rate of TiSiN relative to hafnium oxide in a composite semiconductor device comprising TiSiN and hafnium oxide, the method comprising the steps of:
contacting the composite semiconductor device comprising TiSiN and hafnium oxide with an etching solution as set forth in claim 1 ; and
rinsing the composite semiconductor device after the TiSiN is at least partially removed, wherein the selectivity of the etch for TiSiN over hafnium oxide is greater than 30.

10. The method of claim 9 further comprising the step of drying the semiconductor device.

11. The method of claim 9 wherein the selectivity of the etch for TiSiN over hafnium oxide is greater than 500.

12. The method of claim 9 wherein the selectivity of the etch for TiSiN over hafnium oxide is greater than 1,000.

13. The method of claim 9 wherein the contacting step is performed at a temperature of about 60° C. or greater.

14. An etching solution suitable for the selective removal of TiSiN over hafnium oxide from a microelectronic device, consisting of:
from about 3.7 to about 4.5 wt. % neat of at least one alkaline ammonium compound selected from the group consisting of ammonium hydroxide;
from about 3.9 to about 4.5 wt. % neat of at least one peroxide compound;
from about 10 to about 15 wt. % of a water-miscible organic solvent;
from about 0.4 to about 1 wt. % of at least one nitrogen containing compound selected from the group consisting of a C 4-12 alkylamine, a polyalkylenimine, and a polyamine; and
water.

15. The etching solution of claim 14 , wherein
the at least one alkaline ammonium compound is ammonium hydroxide;
the at least one peroxide compound is hydrogen peroxide;
the water-miscible organic solvent is selected from the group consisting of sulfolane, propylene glycol, and dimethylsulfoxide (DMSO); and
the at least one nitrogen containing compound is selected from the group consisting of octylamine, pentamethyldiethylenetriamine (PMDETA), and polyethylenimine.

16. An etching solution suitable for the selective removal of TiSiN over hafnium oxide from a microelectronic device, consisting of:
about 4.2 wt. % of ammonium hydroxide (neat);
about 4.3% of hydrogen peroxide (neat);
from about 0.4 to about 1.2 wt. % of ammonium fluoride (neat);
about 10% of a water-miscible organic solvent;
from about 0.30 to about 1% of at least one nitrogen containing compound selected from the group consisting of a C 4-12 alkylamine, a polyalkylenimine, and a polyamine; and
water.

17. The etching solution of claim 16 , wherein
the water-miscible organic solvent is selected from the group consisting of sulfolane, propylene glycol, and dimethylsulfoxide (DMSO); and
the at least one nitrogen containing compound is selected from the group consisting of octylamine, pentamethyldiethylenetriamine (PMDETA), and polyethylenimine.

Assignees

• Versum Mat Us Llc

Inventors

• Liu Wen Dar
• Lee Yi-Chia

Classifications

• H10P70/27

  during, before or after processing of conductive materials, e.g. polysilicon or amorphous silicon layers · CPC title

• H10P50/667 Primary

  by liquid etching only · CPC title

• C23F11/06 Primary

  in markedly alkaline liquids · CPC title

• C23F1/32

  Alkaline compositions (C23F1/42 takes precedence) · CPC title

• H01L21/02068

  Electricity · mapped topic