Microstructured field effect device

US11942878B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11942878-B2
Application numberUS-202016837819-A
CountryUS
Kind codeB2
Filing dateApr 1, 2020
Priority dateApr 1, 2020
Publication dateMar 26, 2024
Grant dateMar 26, 2024

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A microstructured device is disclosed utilizing Coulomb field modification of surface energy and electroadhesion to localize a device surface or to levitate a device surface with respect to a target surface. The surface energy modification can be permanent or reversible depending on whether the charge is externally delivered to the device or derived on the device galvanically. The microstructure aspect of the device induces various hydrophilic/hydrophobic interactions with the target surface. The Coulomb field can be used to enhance or decrease the hydrophilic/hydrophobic interactions. In combination, the disclosed electro-microstructured device provides for localizing implants in a mammalian body, and additionally means for controlling cell interaction with the implant.

First claim

Opening claim text (preview).

What is claimed is: 1. An electro-microstructured device comprising: a substrate having a hierarchical microstructure disposed thereon, the substrate having a thickness; the hierarchical microstructure having a first microfeature, the first microfeature having a surface wherein a plurality of second microfeatures are disposed about the surface of the first microfeature; and a first electrode and a second electrode, the first electrode and second electrode at least partially embedded within the thickness of the substrate and connected to a charge source, wherein the first electrode is configured to provide a positive charge of about +0.5V and the second electrode is configured to provide a negative charge of about −0.5V when powered by the charge source, and wherein charging the first electrode and second electrode generates an electroadhesive state via Wenzel-Cassie wetting domains. 2. The electro-microstructured device of claim 1 , wherein the first electrode is configured to provide a local positive charge generating an electric field on a micrometer scale. 3. The electro-microstructured device of claim 1 , wherein the first and second electrodes are adjacent to each other. 4. The electro-microstructured device of claim 1 wherein the substrate is a dielectric. 5. The electro-microstructured device of claim 3 wherein the space between the adjacent first and second electrodes includes an electric insulator. 6. The electro-microstructured device of claim 1 wherein the first and second electrodes further comprise a plurality of electrodes at least partially embedded within the thickness of the substrate which are arranged in an alternating positive charge and negative charge pattern. 7. The electro-microstructured device of claim 1 wherein the first microfeature has a height of 100 microns or less and a diameter of 20 microns or less. 8. The electro-microstructured device of claim 1 wherein the plurality of second microfeatures have a height of 5 microns or less and a diameter of 2 microns or less. 9. The electro-microstructured device of claim 1 , wherein the substrate further comprises at least a portion that is hydrophobic, and wherein the first and second electrodes are arranged with the hierarchical microstructure to alter the substrate portion that is hydrophobic to a portion that is hydrophilic when the electrodes are charged. 10. The electro-micro structured device of claim 1 , wherein the substrate further comprises at least a portion that is hydrophilic, and wherein the first and second electrodes are arranged with the hierarchical microstructures to alter the substrate portion that is hydrophilic to a portion that is hydrophobic when the electrodes are charged. 11. The electro-microstructured device of claim 1 , wherein at least a portion of the first electrode is disposed within the first microfeature. 12. The electro-microstructured device of claim 1 , wherein at least a portion of the first electrode is disposed within the second microfeature. 13. An electro-microstructured device comprising: a substrate having a thickness, and including a hierarchical microstructure disposed thereon, wherein the hierarchical microstructure includes a layer of metallic particulates disposed thereon, the hierarchical microstructure having a first microfeature, the first microfeature having a surface wherein a plurality of second microfeatures are disposed about the surface of the first microfeature; and a first electrode and a second electrode, the first electrode and second electrode at least partially embedded within the thickness of the substrate and connected to a charge source, wherein the first electrode is configured to provide a positive charge of about +0.5V and the second electrode is configured to provide a negative charge of about −0.5V when powered by the charge source, and wherein charging the first electrode and second electrode generates an electroadhesive state via Wenzel-Cassie wetting domains. 14. The electro-microstructured device of claim 13 wherein the first microfeature has a height of 100 microns or less and a diameter of 20 microns or less. 15. The electro-microstructured device of claim 13 wherein the plurality of second microfeatures have a height of 5 microns or less and a diameter of 2 microns or less. 16. The electro-microstructured device of claim 13 wherein the metallic particulates have a diameter ranging between 0.1 to 1.0 microns. 17. The electro-microstructured device of claim 13 wherein the hierarchical microstructure further includes two distinct microstructure regions, a first region wherein the metallic particulates comprise zinc, and a second region wherein the metallic particulates comprise silver. 18. The electro-microstructured device of claim 13 wherein the hierarchical microstructure further includes two distinct microstructure regions, a first region wherein the metallic particulates comprise zinc, and a second region wherein the metallic particulates comprise gold.

Assignees

Inventors

Classifications

  • H02N13/00Primary

    Clutches or holding devices using electrostatic attraction, e.g. using Johnson-Rahbek effect · CPC title

  • Prostheses implantable into the body · CPC title

  • for preferentially controlling or promoting the growth of specific types of cells or tissues · CPC title

  • Electrical means · CPC title

  • Special surfaces of prostheses, e.g. for improving ingrowth (A61F2/30767 takes precedence) · CPC title

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What does patent US11942878B2 cover?
A microstructured device is disclosed utilizing Coulomb field modification of surface energy and electroadhesion to localize a device surface or to levitate a device surface with respect to a target surface. The surface energy modification can be permanent or reversible depending on whether the charge is externally delivered to the device or derived on the device galvanically. The microstructur…
Who is the assignee on this patent?
Bvw Holding Ag
What technology area does this patent fall under?
Primary CPC classification H02N13/00. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Mar 26 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 6 related publications on this page (citations in our corpus or others sharing the same primary CPC).