Photosensitive resin composition, method for producing cured product of fluororesin, fluororesin, fluororesin film, bank and display element

Patent metadata

Field	Value
Publication number	US-11939459-B2
Application number	US-201917296459-A
Country	US
Kind code	B2
Filing date	Nov 18, 2019
Priority date	Nov 26, 2018
Publication date	Mar 26, 2024
Grant date	Mar 26, 2024

Abstract

An object of the present invention is to provide a photosensitive resin composition having good liquid repellency. The photosensitive resin composition of the present invention at least contains a fluororesin having a crosslinking site, a solvent, and a photopolymerization initiator, and the fluororesin contains a repeating unit derived from a hydrocarbon having a fluorine atom.

First claim

The invention claimed is:

1. A fluororesin comprising:
a repeating unit represented by a formula (3-1) and a repeating unit represented by a formula (3-2):

wherein R 3-1 represents a hydrogen atom, a fluorine atom, or a methyl group; R 3-2 represents a hydrogen atom or a C1-C6 linear, C3-C6 branched, or C3-C6 cyclic alkyl group; R 3-3 and R 3-4 each independently represent a fluorine atom, a C1-C10 linear, C3-C10 branched, or C3-C10 cyclic alkyl group, or a C1-C10 linear, C3-C10 branched, or C3-C10 cyclic fluoroalkyl group; and one or more of R 3-1 , R 3-3 , and R 3-4 are fluorine atoms or the fluoroalkyl groups,

wherein R 3-5 and R 3-6 each independently represent a hydrogen atom or a methyl group; W 3 is a divalent linking group and represents —O—, —O—C(═O)—, —C(═O)—O—, —O—C(═O)—NH—, —C(═O)—O—C(═O)—NH—, or —C(═O)—NH—; A 3-1 and A 3-2 are divalent linking groups and each independently represent a C1-C10 linear, C3-C10 branched, or C3-C10 cyclic alkylene group in which one or more hydrogen atoms in the alkylene group may be substituted by hydroxy groups or —O—C(═O)—CH 3 ; Y 3-1 and Y 3-2 are divalent linking groups and each independently represent —O— or —NH—; n represents an integer of 1 to 3; and r represents 0 or 1.

2. The fluororesin according to claim 1 ,
wherein R 3-3 and R 3-4 each independently represent a fluorine atom, a trifluoromethyl group, a difluoromethyl group, a pentafluoroethyl group, a 2,2,2-trifluoroethyl group, an n-heptafluoropropyl group, a 2,2,3,3,3-pentafluoropropyl group, a 3,3,3-trifluoropropyl group, or a hexafluoroisopropyl group.

3. The fluororesin according to claim 1 , further comprising a repeating unit represented by a formula (3-3):

wherein R 3-7 represents a hydrogen atom or a methyl group; R 3-8 represents a C1-C15 linear, C3-C15 branched, or C3-C15 cyclic alkyl group in which one or more hydrogen atoms in the alkyl group are substituted by fluorine atoms; and the repeating unit has a fluorine content of 30 mass % or more.

4. The fluororesin according to claim 1 , further comprising a repeating unit represented by a formula (3-4):

wherein R 3-5 , Y 3-1 , A 3-1 , and r are the same as R 3-5 , Y 3-1 , A 3-1 , and r in the formula (3-2), respectively; E 3-1 represents a hydroxy group, a carboxy group, or an oxirane group; and s represents 0 or 1.

5. The fluororesin according to claim 1 , further comprising a repeating unit represented by a formula (3-6):

wherein R 3-6 and Y 3-1 are the same as R 3-6 and Y 3-1 in the formula (3-2), respectively.

6. The fluororesin according to claim 1 , further comprising a repeating unit represented by a formula (3-5):

wherein R 3-9 represents a hydrogen atom or a methyl group; each B 3 independently represents a hydroxy group, a carboxy group, —C(═O)—O—R 3-10 wherein R 3-10 represents a C1-C15 linear, C3-C15 branched, or C3-C15 cyclic alkyl group in which one or more hydrogen atoms in the alkyl group are substituted by fluorine atoms, and R 3-10 has a fluorine content of 30 mass % or more, or —O—C(═O)—R 3-11 wherein R 3-11 represents a C1-C6 linear, C3-C6 branched, or C3-C6 cyclic alkyl group; and m represents an integer of 0 to 3.

7. A photosensitive resin composition at least comprising:
the fluororesin according to claim 1 ;
a solvent; and
a photopolymerization initiator.

8. The photosensitive resin composition according to claim 7 ,
wherein the solvent is at least one selected from the group consisting of methyl ethyl ketone, cyclohexanone, methyl isoamyl ketone, 2-heptanone, ethylene glycol, ethylene glycol dimethyl ether, ethylene glycol monoacetate, diethylene glycol, diethylene glycol monoacetate, diethylene glycol dimethyl ether, propylene glycol, propylene glycol monoacetate, propylene glycol monomethyl ether (PGME), propylene glycol monomethyl ether acetate (PGMEA), dipropylene glycol, dipropylene glycol monoacetate monomethyl ether, dipropylene glycol monoacetate monoethyl ether, dipropylene glycol monoacetate monopropyl ether, dipropylene glycol monoacetate monobutyl ether, dipropylene glycol monoacetate monophenyl ether, 1,4-dioxane, methyl lactate, ethyl lactate, methyl acetate, ethyl acetate, butyl acetate, methyl methoxypropionate, ethyl ethoxypropionate, γ-butyrolactone, and hexafluoroisopropyl alcohol.

9. The photosensitive resin composition according to claim 7 , further comprising a crosslinking agent and an alkali-soluble resin.

10. A fluororesin film comprising:
a repeating unit represented by a formula (3-1) and a repeating unit represented by a formula (3-2A):

wherein R 3-1 represents a hydrogen atom, a fluorine atom, or a methyl group; R 3-2 represents a hydrogen atom or a C1-C6 linear, C3-C6 branched, or C3-C6 cyclic alkyl group; R 3-3 and R 3-4 each independently represent a fluorine atom, a C1-C10 linear, C3-C10 branched, or C3-C10 cyclic alkyl group, or a C1-C10 linear, C3-C10 branched, or C3-C10 cyclic fluoroalkyl group; and one or more of R 3-1 , R 3-3 , and R 3-4 are fluorine atoms or the fluoroalkyl groups,

wherein R 3-5 and R 3-6 each independently represent a hydrogen atom or a methyl group; W 3 is a divalent linking group and represents —O—, —O—C(═O)—, —C(═O)—O—, —O—C(═O)—NH—, —C(═O)—O—C(═O)—NH—, or —C(═O)—NH—; A 3-1 and A 3-2 are divalent linking groups and each independently represent a C1-C10 linear, C3-C10 branched, or C3-C10 cyclic alkylene group in which one or more hydrogen atoms in the alkylene group may be substituted by hydroxy groups or —O—C(═O)—CH 3 ; Y 3-1 and Y 3-2 are divalent linking groups and each independently represent —O— or —NH—; n represents an integer of 1 to 3; and r represents 0 or 1.

11. A bank comprising:
a repeating unit represented by a formula (3-1) and a repeating unit represented by a formula (3-2A):

wherein R 3-1 represents a hydrogen atom, a fluorine atom, or a methyl group; R 3-2 represents a hydrogen atom or a C1-C6 linear, C3-C6 branched, or C3-C6 cyclic alkyl group; R 3-3 and R 3-4 each independently represent a fluorine atom, a C1-C10 linear, C3-C10 branched, or C3-C10 cyclic alkyl group, or a C1-C10 linear, C3-C10 branched, or C3-C10 cyclic fluoroalkyl group; and one or more of R 3-1 , R 3-3 , and R 3-4 are fluorine atoms or the fluoroalkyl groups,

wherein R 3-5 and R 3-6 each independently represent a hydrogen atom or a methyl group; W 3 is a divalent linking group and represents —O—, —O—C(═O)—, —C(═O)—O—, —O—C(═O)—NH—, —C(═O)—O—C(═O)—NH—, or —C(═O)—NH—; A 3-1 and A 3-2 are divalent linking groups and each independently represent a C1-C10 linear, C3-C10 branched, or C3-C10 cyclic alkylene group in which one o

Assignees

• Central Glass Co Ltd

Inventors

• Kaneko Yuzuru
• Miyazawa Satoru
• Sasaki Keiko
• Sano Asuka
• Nomura Yusuke

Classifications

• C08L27/12 Primary

  containing fluorine atoms · CPC title

• C08F220/22 Primary

  Esters containing halogen · CPC title

• C08F2/50

  with sensitising agents · CPC title

• C08F2/54

  by X-rays or electrons · CPC title

• C08F14/18

  Monomers containing fluorine · CPC title