Lids and lid assembly kits for atomic layer deposition chambers

Patent metadata

Field	Value
Publication number	US-11932939-B2
Application number	US-202117242898-A
Country	US
Kind code	B2
Filing date	Apr 28, 2021
Priority date	Apr 22, 2015
Publication date	Mar 19, 2024
Grant date	Mar 19, 2024

Abstract

Apparatus for processing a substrate are provided herein. In some embodiments, a lid for a substrate processing chamber includes: a lid plate comprising an upper surface and a contoured bottom surface, the upper surface having a central opening and the contoured bottom surface having a first portion that extends downwardly and outwardly from the central opening to a peripheral portion of the lid plate and a second portion that extends radially outward along the peripheral portion of the lid plate; an upper flange extending radially outward from the lid plate; and one or more channels formed through the lid plate from the upper surface of the lid plate to the second portion of the contoured bottom surface.

First claim

We claim:

1. A lid for a substrate processing chamber, comprising:
a lid plate comprising an upper surface and a contoured bottom surface, the upper surface having a central opening and the contoured bottom surface having a first portion that extends downwardly and outwardly from the central opening to a peripheral portion of the lid plate and a second portion that extends radially outward along the peripheral portion of the lid plate;
an upper flange extending radially outward from the lid plate; and
one or more channels formed through the lid plate from the upper surface of the lid plate to the second portion of the contoured bottom surface.

2. The lid of claim 1 , wherein the upper surface of the lid plate is planar.

3. The lid of claim 1 , wherein the upper surface of the lid plate and the second portion of the contoured bottom surface are parallel.

4. The lid of claim 1 , further comprising:
an o-ring groove disposed in the upper surface of the lid plate surrounding the central opening.

5. The lid of claim 1 , wherein the contoured bottom surface has a mirror polished surface.

6. The lid of claim 1 , wherein the lid plate is fabricated from metal.

7. The lid of claim 1 , wherein the lid plate is fabricated from aluminum, an aluminum alloy, steel, or stainless steel.

8. The lid of claim 1 , further comprising:
a gas distribution plate configured to be coupled to the lid plate such that the contoured bottom surface of the lid plate extends to and contacts the gas distribution plate, wherein the gas distribution plate has a plurality of apertures disposed therethrough such that the only pathway from the central opening to a region beneath the gas distribution plate is through the plurality of apertures when the gas distribution plate is coupled to the lid plate.

9. The lid of claim 8 , wherein the gas distribution plate is formed of a non-corrosive ceramic material.

10. The lid of claim 8 , wherein the gas distribution plate is formed of aluminum oxide or aluminum nitride.

11. The lid of claim 8 , wherein each of the plurality of apertures have an equivalent fluid conductance.

12. The lid of claim 8 , wherein each aperture of the plurality of apertures is a through hole having an upper portion having a countersunk hole, a cylindrical center portion extending perpendicularly to the upper surface of the gas distribution plate, and a lower portion that tapers outwardly from the center of the aperture.

13. The lid of claim 8 , wherein the gas distribution plate includes a central portion containing the plurality of apertures, and a first stepped portion surrounding the plurality of apertures and configured to interface with the second portion of the contoured bottom surface of the lid plate.

14. The lid of claim 13 , wherein the gas distribution plate further includes a second stepped portion surrounding the first stepped portion and configured to interface with the upper flange of the lid plate.

15. A lid assembly kit for a substrate processing chamber, comprising:
a lid plate comprising an upper surface and a contoured bottom surface, the upper surface having a central opening and the contoured bottom surface having a first portion that extends downwardly and outwardly from the central opening to a peripheral portion of the lid plate and a second portion that extends radially outward along the peripheral portion of the lid plate, the lid plate having an upper flange extending radially outward from the lid plate and one or more channels formed through the lid plate from the upper surface of the lid plate to the second portion of the contoured bottom surface; and
a gas distribution plate configured to be coupled to the lid plate such that the contoured bottom surface of the lid plate extends to and contacts the gas distribution plate, wherein the gas distribution plate has a plurality of apertures disposed therethrough such that the only pathway from the central opening to a region beneath the gas distribution plate is through the plurality of apertures when the gas distribution plate is coupled to the lid plate, wherein the gas distribution plate includes a central portion containing the plurality of apertures, a first stepped portion surrounding the central portion and configured to interface with the second portion of the contoured bottom surface of the lid plate, and a second stepped portion surrounding the first stepped portion and configured to interface with the upper flange of the lid plate.

16. The lid assembly kit of claim 15 , wherein each of the plurality of apertures have an equivalent fluid conductance.

17. The lid assembly kit of claim 15 , wherein the gas distribution plate is formed of a non-corrosive ceramic material.

18. The lid assembly kit of claim 15 , wherein the gas distribution plate is formed of aluminum oxide or aluminum nitride.

19. The lid assembly kit of claim 15 , wherein the lid plate is fabricated from metal.

20. The lid assembly kit of claim 15 , wherein the lid plate is fabricated from aluminum, an aluminum alloy, steel, or stainless steel.

Assignees

• Applied Materials Inc

Inventors

• Rasheed Muhammad M
• Gandikota Srinivas
• SANCHEZ Mario Dan
• Jian Guoqiang
• Yang Yixiong
• Jadhav Deepak
• Agarwal Ashutosh

Classifications

• C23C16/45582

  Expansion of gas before it reaches the substrate · CPC title

• C23C16/45561

  Gas plumbing upstream of the reaction chamber · CPC title

• C23C16/4554

  Plasma being used non-continuously in between ALD reactions (C23C16/56 takes precedence) · CPC title

• C23C16/45544 Primary

  characterized by the apparatus · CPC title

• C23C16/4405

  Cleaning of reactor or parts inside the reactor by using reactive gases · CPC title