Sample support, method for producing sample support, ionization method and mass spectrometry method

Patent metadata

Field	Value
Publication number	US-11929245-B2
Application number	US-202017439431-A
Country	US
Kind code	B2
Filing date	Jan 23, 2020
Priority date	Mar 20, 2019
Publication date	Mar 12, 2024
Grant date	Mar 12, 2024

Abstract

A sample support body for ionization of a sample, including: a substrate having a first surface, a second surface on a side opposite to the first surface, and a plurality of through-holes opening on each of the first surface and the second surface; a conductive layer provided on the first surface; and a matrix crystal layer provided on at least one of the conductive layer and the second surface, in which the matrix crystal layer is formed of a plurality of matrix crystal grains so as to include a gap communicating the plurality of through-holes with an outside.

First claim

The invention claimed is:

1. A sample support body for ionization of a sample, comprising:
a substrate having a first surface, a second surface on a side opposite to the first surface, and a plurality of through-holes opening on each of the first surface and the second surface;
a conductive layer provided on the first surface; and
a matrix crystal layer provided on at least one of the conductive layer and the second surface,
wherein the matrix crystal layer is formed of a plurality of matrix crystal grains so as to include a gap communicating the plurality of through-holes with an outside.

2. The sample support body according to claim 1 ,
wherein a width of each of the plurality of through-holes is 1 to 700 nm, and
wherein a thickness of the substrate is 1 to 50 μm.

3. The sample support body according to claim 1 , wherein the substrate is formed by anodizing a valve metal or silicon.

4. A sample support body for ionization of a sample, comprising:
a conductive substrate having a first surface, a second surface on a side opposite to the first surface, and a plurality of through-holes opening on each of the first surface and the second surface; and
a matrix crystal layer provided on at least one of the first surface and the second surface,
wherein the matrix crystal layer is formed with a plurality of matrix crystal grains so as to include a gap communicating the plurality of through-holes with an outside.

5. A method for manufacturing a sample support body for ionization of a sample, comprising:
a process of preparing a substrate having a first surface, a second surface on a side opposite to the first surface, and a plurality of through-holes opening on each of the first surface and the second surface and being provided with a conductive layer on the first surface; and
a process of providing a matrix crystal layer on at least one of the conductive layer and the second surface by evaporation of a matrix material,
wherein, in the process of providing the matrix crystal layer, the matrix crystal layer is formed with a plurality of matrix crystal grains so as to include a gap communicating the plurality of through-holes with an outside.

6. A method for manufacturing a sample support body for ionization of a sample, comprising:
a process of preparing a conductive substrate having a first surface, a second surface on a side opposite to the first surface, and a plurality of through-holes opening on each of the first surface and the second surface; and
a process of providing a matrix crystal layer on at least one of the first surface and the second surface by evaporation of a matrix material,
wherein, in the process of providing the matrix crystal layer, the matrix crystal layer is formed with a plurality of matrix crystal grains so as to include a gap communicating the plurality of through-holes with an outside.

7. An ionization method, comprising:
a process of preparing a substrate having a first surface, a second surface on a side opposite to the first surface, and a plurality of through-holes opening on each of the first surface and the second surface and being provided with a conductive layer on the first surface;
a process of arranging a sample on a mount portion and arranging the substrate on the sample so that the second surface is in contact with the sample;
a process of providing a matrix crystal layer on the conductive layer by evaporation of a matrix material; and
a process of ionizing components of the sample having moved from the second surface side to the first surface side via the plurality of through-holes together with the matrix by irradiating the first surface with an energy beam while applying a voltage to the conductive layer in a state where the sample is arranged between the mount portion and the substrate,
wherein, in the process of providing the matrix crystal layer, the matrix crystal layer is formed with a plurality of matrix crystal grains so as to include a gap communicating the plurality of through-holes with an outside.

8. An ionization method, comprising:
a process of preparing a conductive substrate having a first surface, a second surface on a side opposite to the first surface, and a plurality of through-holes opening on each of the first surface and the second surface;
a process of arranging a sample on a mount portion and arranging the substrate on the sample so that the second surface is in contact with the sample;
a process of providing a matrix crystal layer on the first surface by evaporation of a matrix material; and
a process of ionizing components of the sample having moved from the second surface side to the first surface side via the plurality of through-holes together with the matrix by irradiating the first surface with an energy beam while applying a voltage to the substrate in a state where the sample is arranged between the mount portion and the substrate,
wherein, in the process of providing the matrix crystal layer, the matrix crystal layer is formed with a plurality of matrix crystal grains so as to include a gap communicating the plurality of through-holes with an outside.

9. A mass spectrometry method comprising:
the processes provided by the ionization method according to claim 7 ; and
a process of detecting the ionized components.

10. A mass spectrometry method comprising:
the processes provided by the ionization method according to claim 8 ; and
a process of detecting the ionized components.

Assignees

• Hamamatsu Photonics Kk

Inventors

• Kotani Masahiro
• Ohmura Takayuki
• Tashiro Akira

Classifications

• H01J49/0418 Primary

  for laser desorption, e.g. matrix-assisted laser desorption/ionisation [MALDI] plates or surface enhanced laser desorption/ionisation [SELDI] plates · CPC title

• G01N27/628

  and a beam of energy, e.g. laser enhanced ionisation · CPC title