Solid material container and solid material product with solid material filled in solid material container
US-2020208263-A1 · Jul 2, 2020 · US
Oxyhalide precursors
US11919780B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11919780-B2 |
| Application number | US-202016923899-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jul 8, 2020 |
| Priority date | Jul 9, 2019 |
| Publication date | Mar 5, 2024 |
| Grant date | Mar 5, 2024 |
How to read this patent
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
- Title
What the patent document calls the invention.
- Abstract
A short plain-language summary of the technical disclosure.
- Assignees and inventors
Who owns or filed the patent and who is credited as inventor.
- Key dates
Filing, priority, publication, and grant dates set the timeline.
- First independent claim
The legal scope of protection — read this for what is actually claimed.
- CPC / IPC classifications
Technology tags used to group this patent with similar filings.
- Citations and related patents
Prior art links and similar publications in this corpus.
Abstract
Official abstract text for this publication.
The invention provides a process for preparing molybdenum and tungsten oxyhalide compounds which are useful in the deposition of molybdenum and tungsten containing films on various surfaces of microelectronic devices. In the process of the invention, a molybdenum or tungsten trioxide is heated in either a solid state medium or in a melt-phase reaction comprising a eutectic blend comprising alkaline and/or alkaline earth metal salts. The molybdenum or tungsten oxyhalides thus formed may be isolated as a vapor and crystallized to provide highly pure precursor compounds such as MoO 2 Cl 2 .
First claim
Opening claim text (preview).
The invention claimed is: 1. A compound having a formula MoO 2 Cl 2 in crystalline form and orthorhombic crystal system and unit cell dimensions of about a=13.552 Å α=90° b=5.456 Å β=90° c=5.508 Å γ=90°. 2. The compound of claim 1 , which exhibits a powder X-ray diffraction (XRD) pattern with one or more peaks at 12.94, 23.64, 26.10, 39.50, and/or 40.28±0.04 degrees 2-theta. 3. The compound of claim 1 , which has a powder X-ray diffraction (XRD) pattern comprises peak at about 6.776Å and about 3.7268Å.
Assignees
Inventors
Classifications
Patent family
Related publications grouped by family.
External sources
Frequently asked questions
Answers are generated from the same data shown on this page.
- What does patent US11919780B2 cover?
- The invention provides a process for preparing molybdenum and tungsten oxyhalide compounds which are useful in the deposition of molybdenum and tungsten containing films on various surfaces of microelectronic devices. In the process of the invention, a molybdenum or tungsten trioxide is heated in either a solid state medium or in a melt-phase reaction comprising a eutectic blend comprising alka…
- Who is the assignee on this patent?
- Entegris Inc
- What technology area does this patent fall under?
- Primary CPC classification C23C16/08. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Mar 05 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).