Monoalkyl tin compounds with low polyalkyl contamination, their compositions and methods

US11897906B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11897906-B2
Application numberUS-202117198669-A
CountryUS
Kind codeB2
Filing dateMar 11, 2021
Priority dateApr 11, 2018
Publication dateFeb 13, 2024
Grant dateFeb 13, 2024

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  1. Title

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  5. First independent claim

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Abstract

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A pure composition comprises a monoalkyltin trialkoxide compound represented by the chemical formula RSn(OR′) 3 or a monoalkyl tin triamide compound represented by the chemical formula RSn(NR′ 2 ) 3 and no more than 4 mole % dialkyltin compounds relative to the total tin amount, where R is a hydrocarbyl group with 1-31 carbon atoms, and wherein R′ is a hydrocarbyl group with 1-10 carbon atoms. Methods are described for the formation of the pure compositions. A solid composition comprises a monoalkyl triamido tin compound represented by the chemical formula RSn—(NR′COR″) 3 , where R is a hydrocarbyl group with 1-31 carbon atoms, and where R′ and R″ are independently a hydrocarbyl group with 1-10 carbon atoms. The compositions are suitable for the formation of resist compositions suitable for EUV patterning in which the compositions have a high EUV absorption.

First claim

Opening claim text (preview).

What is claimed is: 1. A high purity liquid composition comprising a mixture of a compound represented by the formula (CH 2 ) 5 CHSn(N(CH 3 ) 2 ) 3 and no more than 4 mole % dialkyltin compounds as an impurity relative to the total tin amount. 2. The composition according to claim 1 further comprising one or more alkyl-tin compounds with a different alkyl ligand relative to the cyclohexyl compound and no more than 4 mole % dialkyltin compounds as an impurity relative to the total tin amount. 3. The composition of claim 2 wherein the different alkyl ligand is methyl, ethyl, tert-butyl, tert-amyl, or a combination thereof. 4. A solution comprising an organic solvent and the high purity liquid composition according to claim 1 . 5. The solution of claim 4 having a concentration of the compound represented by the formula (CH 2 ) 5 CHSn(N(CH 3 ) 2 ) 3 of from about 0.01M to about 2M. 6. The solution of claim 4 wherein the organic solvent comprises an alkane, an aromatic hydrocarbon, an ether, an alcohol, or a mixture thereof. 7. The solution of claim 4 further comprising RSnO (3/2-x/2) (OH) x (0<x<3), where R is an alkyl, cycloalkyl, branched alkyl, or substituted alkyl moiety having from 1 to 31 carbon atoms. 8. A method to selectively form a monoalkyltin trialkoxide compound with low dialkyl tin contamination, the method comprising, reacting a (CH 2 ) 5 CHSn(N(CH 3 ) 2 ) 3 compound with an alcohol represented by the formula HOR″ in an organic solvent to form (CH 2 ) 5 CHSn(OR″) 3 , wherein the (CH 2 ) 5 CHSn(N(CH 3 ) 2 ) 3 reagent comprises the high purity liquid composition according to claim 1 , wherein R″ is a hydrocarbyl group with 1-10 carbon atoms. 9. The method of claim 8 wherein the reaction is performed with a tetradentate chelating agent in an amount from about 0.5 mole % to about 15 mole % relative to the tin molar quantity. 10. A solution comprising an organic solvent and the (CH 2 ) 5 CHSn(OR″) 3 prepared according to the method of claim 8 . 11. The solution of claim 10 having a concentration of from about 0.01M to about 2M and wherein the solvent comprises an alcohol.

Assignees

Inventors

Classifications

  • C07F7/2284Primary

    Compounds with one or more Sn-N linkages · CPC title

  • Compounds having one or more tin-oxygen linkages · CPC title

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What does patent US11897906B2 cover?
A pure composition comprises a monoalkyltin trialkoxide compound represented by the chemical formula RSn(OR′) 3 or a monoalkyl tin triamide compound represented by the chemical formula RSn(NR′ 2 ) 3 and no more than 4 mole % dialkyltin compounds relative to the total tin amount, where R is a hydrocarbyl group with 1-31 carbon atoms, and wherein R′ is a hydrocarbyl group with 1-10 carbon atoms…
Who is the assignee on this patent?
Inpria Corp
What technology area does this patent fall under?
Primary CPC classification C07F7/2284. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Feb 13 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 12 related publications on this page (citations in our corpus or others sharing the same primary CPC).