Compositions for extreme ultraviolet lithography and related methods
US-2024092810-A1 · Mar 21, 2024 · US
Compounds having one or more tin-oxygen linkages
Compounds having one or more tin-oxygen linkages · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C07F7/2224 |
| Official title | {Compounds having one or more tin-oxygen linkages} |
| Display label | Compounds having one or more tin-oxygen linkages |
| Total patents | 196 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is rapidly growing.
| Year | Patents |
|---|---|
| 2015 | 4 |
| 2016 | 6 |
| 2017 | 5 |
| 2018 | 4 |
| 2019 | 8 |
| 2020 | 12 |
| 2021 | 19 |
| 2022 | 13 |
| 2023 | 18 |
| 2024 | 46 |
| 2025 | 52 |
| 2026 | 9 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Methods to produce organotin compositions with convenient ligand providing reactants
US-2022064192-A1 · Mar 3, 2022 · US
Photoresist compositions
US-2021380612-A1 · Dec 9, 2021 · US
Semiconductor photoresist composition and method of forming patterns using the composition
US-2021356861-A1 · Nov 18, 2021 · US
Organotin clusters, solutions of organotin clusters, and application to high resolution patterning
US-2021347791-A1 · Nov 11, 2021 · US
Semiconductor resist composition, and method of forming patterns using the composition
US-2021333708-A1 · Oct 28, 2021 · US
Semiconductor resist composition, and method of forming patterns using the composition
US-2021325781-A1 · Oct 21, 2021 · US
New dialkyl tin oxide composition and process for producing 2-dimethylaminoethyl (meth)acrylate
US-2021309605-A1 · Oct 7, 2021 · US
Semiconductor photoresist composition and method of forming patterns using the composition
US-2021311387-A1 · Oct 7, 2021 · US
Organotin clusters, solutions of organotin clusters, and application to high resolution patterning
US-11098070-B2 · Aug 24, 2021 · US
Hydroximic acid-metal hydroxide coordination complex and preparation and application thereof
US-2021253620-A1 · Aug 19, 2021 · US
Semiconductor resist composition, and method of forming patterns using the composition
US-11092890-B2 · Aug 17, 2021 · US
Semiconductor resist composition, and method of forming patterns using the composition
US-11092889-B2 · Aug 17, 2021 · US
Transition metal organic framework having antibacterial properties
US-2021244030-A1 · Aug 12, 2021 · US
Semiconductor resist composition, and method of forming patterns using the composition
US-11073761-B2 · Jul 27, 2021 · US
Monoalkyl tin compounds with low polyalkyl contamination, their compositions and methods
US-2021198293-A1 · Jul 1, 2021 · US
Two-dimensional perovskite compositions and devices therefrom
US-2021175439-A1 · Jun 10, 2021 · US
Semiconductor photoresist composition, and method of forming patterns using the composition
US-2021109442-A1 · Apr 15, 2021 · US
Monoalkyl tin compounds with low polyalkyl contamination, their compositions and methods
US-10975109-B2 · Apr 13, 2021 · US
Organometallic cluster photoresists for euv lithography
US-2021087210-A1 · Mar 25, 2021 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C07F7/2224?
- CPC C07F7/2224 is the Cooperative Patent Classification code for “Compounds having one or more tin-oxygen linkages.”
- How many patents are filed under CPC C07F7/2224 (Compounds having one or more tin-oxygen linkages)?
- Our database includes 196 publications tagged with this CPC code.
- Is patent activity under CPC C07F7/2224 growing?
- Publication counts under this code: 46 in 2024 vs 52 in 2025 (latest complete years).