Vapor deposition mask, manufacturing method for vapor deposition mask, and manufacturing method for display device

Patent metadata

Field	Value
Publication number	US-11877499-B2
Application number	US-202016840260-A
Country	US
Kind code	B2
Filing date	Apr 3, 2020
Priority date	Oct 13, 2017
Publication date	Jan 16, 2024
Grant date	Jan 16, 2024

Abstract

A vapor deposition mask includes a front surface, a back surface opposite to the front surface, and inner surfaces defining the respective mask holes. Each mask hole extends between the front surface and the back surface. In a plan view of the front surface, each mask hole includes a large opening, which is located at the front surface, and a small opening, which is located inside the large opening. At least a section of each mask hole has a shape of an inverted frustum extending between the large opening and the small opening. Each inner surface includes a stepped surface spreading from the small opening toward the large opening.

First claim

The invention claimed is:

1. A vapor deposition mask including a metal plate and a plurality of mask holes in the metal plate, the vapor deposition mask comprising:
a front surface;
a back surface opposite to the front surface; and
inner surfaces defining respective ones of the plurality of mask holes, wherein
each of the plurality of mask holes extends between the front surface and the back surface,
in a plan view of the front surface, each of the plurality of mask holes includes a first opening, which is located at the front surface, and a second, smaller opening, which is located inside the first opening,
at least a section of each of the plurality of mask holes has a shape of an inverted frustum extending between the first opening and the second, smaller opening, and
each of the inner surfaces includes an arcuate stepped surface comprising a plurality of steps spreading from the second, smaller opening toward the first opening as viewed in a cross-section orthogonal to the front surface,
the arcuate stepped surface has two steps,
as viewed in a cross-section orthogonal to the front surface, the arcuate stepped surface has an arcuate section having two arcuate steps,
the arcuate section includes a first arc and a second arc that is located closer to the mask back surface than the first arc,
the first arc has a first curvature radius and the second arc has a second, larger curvature radius,
as viewed in the cross-section the second arc has a center of curvature, the center of curvature is outside the first opening in the thickness direction of the metal plate.

2. The vapor deposition mask according to claim 1 , wherein
each of the first openings has an edge that includes a first section, which is an edge of the arcuate stepped surface, and a second section, which is a section other than the first section,
the second section of the edge of each of the first openings includes a boundary that coincides with the second section of one of the first openings that is adjacent to the first opening, and
the boundary is recessed from the front surface.

3. The vapor deposition mask according to claim 2 , wherein in a plan view of the front surface, each boundary includes a section around a corresponding one of the plurality of second openings where a distance between the corresponding second opening and an adjacent one of the second openings is smallest.

4. The vapor deposition mask according to claim 1 , wherein
each of the first openings has an edge that includes a first section, which is an edge of the arcuate stepped surface, and a second section, which is a section other than the first section,
the first section of the edge of each of the first openings includes a boundary that coincides with the first section of another of the first openings that is adjacent to the first opening, and
the boundary is recessed from the front surface.

5. The vapor deposition mask according to claim 1 , wherein each of the second, smaller openings is located at the back surface.

6. The vapor deposition mask according to claim 1 , wherein a distance between the second, smaller opening and the back surface is less than or equal to 3 μm.

7. A method for manufacturing a vapor deposition mask according to claim 1 including a metal plate and a plurality of mask holes in the metal plate, the method comprising:
forming a vapor deposition mask by forming the plurality of mask holes in the metal plate, wherein
the vapor deposition mask includes:
a front surface;
a back surface opposite to the front surface; and
inner surfaces defining respective ones of the plurality of mask holes,

each of the plurality of mask holes extends between the front surface and the back surface,
in a plan view of the front surface, each of the plurality of mask holes includes a first opening, which is located at the front surface, and a second, smaller opening, which is located inside the first opening,
at least a section of each of the plurality of mask holes has a shape of an inverted frustum extending between the first opening and the second, smaller opening, and
each inner surface includes an arcuate stepped surface spreading from the second, smaller opening toward the first opening as viewed in a cross-section orthogonal to the front surface,
the arcuate stepped surface has two steps,
as viewed in a cross-section orthogonal to the front surface, the arcuate stepped surface has an arcuate section having two arcuate steps,
the arcuate section includes a first arc and a second arc that is located closer to the mask back surface than the first arc,
the first arc has a first curvature radius and the second arc has a second, larger curvature radius,
as viewed in the cross-section the second arc has a center of curvature, the center of curvature is outside the first opening in the thickness direction of the metal plate,
forming a vapor deposition mask includes forming a resist mask on the metal plate and forming the stepped surface by etching once using the resist mask,
the resist mask includes a resist front surface that is a surface of the resist mask opposite to the surface in contact with the metal plate, a first pattern to form the second arc and a second pattern to form the first arc,
the first pattern and the second pattern extend through the resist mask in the thickness direction of the resist mask,
as viewed in a plan view of the resist front surface, two of the second patterns are located on the opposite sides of the first pattern.

8. The vapor deposition mask according to claim 7 , wherein a distance between the second, smaller opening and the back surface is less than or equal to 3 μm.

Assignees

• Toppan Printing Co Ltd

Inventors

• Nishi Takehiro

Classifications

• H10K71/166 Primary

  using selective deposition, e.g. using a mask · CPC title

• H05B33/10 Primary

  Apparatus or processes specially adapted to the manufacture of electroluminescent light sources · CPC title

• C23C14/042 Primary

  using masks · CPC title

• C23C14/24

  Vacuum evaporation · CPC title

• H10K71/00

  Manufacture or treatment specially adapted for the organic devices covered by this subclass · CPC title