Design method of metal mask and manufacturing method of metal mask
US-2021187576-A1 · Jun 24, 2021 · US
Mask, mask assembly, and apparatus for manufacturing display apparatus
US11871644B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11871644-B2 |
| Application number | US-202217661031-A |
| Country | US |
| Kind code | B2 |
| Filing date | Apr 27, 2022 |
| Priority date | May 25, 2021 |
| Publication date | Jan 9, 2024 |
| Grant date | Jan 9, 2024 |
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- Title
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- Abstract
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Abstract
Official abstract text for this publication.
A mask including: a deposition pattern portion including a plurality of deposition holes that are configured to have deposition material pass therethrough; and a dummy pattern portion outside the deposition pattern portion, wherein the dummy pattern portion includes an auxetic structure having a negative Poisson's ratio.
First claim
Opening claim text (preview).
What is claimed is: 1. A mask comprising: a plurality of deposition pattern portions arranged along a first direction and each including a plurality of deposition holes that are configured to have deposition material pass therethrough; and a dummy pattern portion outside and between the deposition pattern portions, wherein the dummy pattern portion includes an auxetic structure having a negative Poisson's ratio such that the dummy pattern portion is configured to stretch in a direction perpendicular to the first direction in response to a tensile force applied in the first direction, wherein the deposition pattern portions include a first deposition hole and a second deposition hole having different planar shapes from each other, and the second deposition hole is adjacent to one of the plurality of dummy holes of the dummy pattern portion in the first direction, and wherein the second deposition hole has a shape corresponding to a shape of one of the plurality of dummy holes such that a width between the second deposition hole and the one of the plurality of dummy holes is constant in a plan view. 2. The mask of claim 1 , wherein the dummy pattern portion includes a plurality of dummy holes having shapes different from those of the plurality of deposition holes of the deposition pattern portions in a plan view. 3. The mask of claim 1 , wherein the dummy pattern portions entirely surrounds the deposition pattern portion in a plan view. 4. The mask of claim 1 , wherein the dummy pattern portion partially surrounds the deposition pattern portion in a plan view. 5. The mask of claim 4 , wherein the dummy pattern portion is between the deposition pattern portions that are adjacent to each other in a plan view. 6. The mask of claim 4 , wherein the dummy pattern portion is between an end crossing a longitudinal direction of the mask and a deposition pattern portion from among the deposition pattern portions in a plan view.
Assignees
Inventors
Classifications
- H10K71/00Primary
Manufacture or treatment specially adapted for the organic devices covered by this subclass · CPC title
Dummy elements, i.e. elements having non-functional features · CPC title
- C23C14/042Primary
using masks · CPC title
Masking devices (stencils B05C17/06; masking devices for which the means for applying liquids or other fluent material is spraying or is not important B05B12/20) · CPC title
using selective deposition, e.g. using a mask · CPC title
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Frequently asked questions
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- What does patent US11871644B2 cover?
- A mask including: a deposition pattern portion including a plurality of deposition holes that are configured to have deposition material pass therethrough; and a dummy pattern portion outside the deposition pattern portion, wherein the dummy pattern portion includes an auxetic structure having a negative Poisson's ratio.
- Who is the assignee on this patent?
- Samsung Display Co Ltd
- What technology area does this patent fall under?
- Primary CPC classification H10K71/00. Mapped technology areas include Electricity.
- When was this patent published?
- Publication date Tue Jan 09 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 5 related publications on this page (citations in our corpus or others sharing the same primary CPC).