Method for manufacturing electroless plating substrate and method for forming metal layer on surface of substrate

US11865518B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11865518-B2
Application numberUS-202017075130-A
CountryUS
Kind codeB2
Filing dateOct 20, 2020
Priority dateOct 20, 2017
Publication dateJan 9, 2024
Grant dateJan 9, 2024

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The instant disclosure provides a method for manufacturing an electroless plating substrate and a method for forming a metal layer on a surface of a substrate. The method for preparing the electroless plating substrate includes: providing a substrate; attaching a self-adsorbed catalyst composition to a surface of the substrate; and performing an electroless metal deposition for forming an electroless metal layer on the surface of the substrate. The self-adsorbed catalyst composition includes a colloidal nanoparticle and a silane compound. The colloidal nanoparticle includes a palladium nanoparticle and a capping agent enclosing the palladium nanoparticle. The silane compound has at least one amino group to interact with the colloidal nanoparticle. A covalent bond between the silane compound and the surface of the substrate is formed through the at least one silane group of the silane compound. The colloid nanoparticle has a particle size ranging from 5 to 10 nanometers.

First claim

Opening claim text (preview).

What is claimed is: 1. A method for manufacturing an electroless plating substrate, including: providing a substrate; attaching a self-adsorbed catalyst composition to a surface of the substrate, wherein the self-adsorbed catalyst composition includes a colloidal nanoparticle and a silane compound, the colloidal nanoparticle includes a palladium nanoparticle and a capping agent enclosing the palladium nanoparticle, and the silane compound has at least one amino group to interact with the colloidal nanoparticle, a covalent bond between the silane compound and the surface of the substrate is formed through a silane group of the silane compound, and the colloid nanoparticle has a particle size ranging from 5 to 10 nanometers; and performing an electroless metal deposition for forming an electroless metal layer on the surface of the substrate. 2. The method according to claim 1 , wherein, the step of attaching the self-adsorbed catalyst composition to the surface of the substrate further includes: immersing the substrate into a solution containing the self-adsorbed catalyst composition. 3. The method according to claim 2 , wherein the method further includes: the substrate is pre-treated by sulfuric acid and then immersed into the solution containing the self-adsorbed catalyst composition. 4. The method according to claim 1 , wherein the capping agent is selected from the group consisting of polyethamine capped by trimethoxysilyl, polyvinyl alcohol, polyvinylpyrrolidone, polyacrylic acid, and any combination thereof. 5. The method according to claim 1 , wherein the silane compound is selected from the group consisting of: (3-aminopropyl)triethoxysilane, N-aminoethyl-3-(3-aminopropyl)triethoxysilane, N-(6-aminohexyl) aminomethyltriethoxysilane, 3-[2-(2-aminoethylamino)ethylamino]propyl-trimethoxysilane, N-(2-aminoethyl-3-aminopropyl)trimethoxysilane and any combination thereof. 6. The method according to claim 1 , wherein the silane compound has 1 to 3 amino groups. 7. The method according to claim 1 , wherein the self-adsorbed catalyst composition is prepared by steps of: providing a colloidal nanoparticle solution including the colloidal nanoparticle and a solvent; mixing the colloidal nanoparticle solution with the silane compound for forming the self-adsorbed catalyst composition. 8. The method according to claim 7 , wherein the colloidal nanoparticle solution is prepared by a wet process, and the wet process includes steps of: dissolving a metal precursor in the solvent to form a solution; adding the capping agent into the solution for enabling the capping agent enclosing the metal precursor; and reducing the metal precursor by a reducing agent to obtain the colloidal nanoparticle solution. 9. The method according to claim 8 , wherein a weight ratio between the metal precursor and the capping agent ranges from about 1:1 to 1:5. 10. The method according to claim 7 , wherein the colloidal nanoparticle is presented in the colloidal nanoparticle solution in an amount of from 50 to 200 ppm. 11. The method according to claim 7 , wherein the silane compound is presented in an amount of from 0.5 to 5 vol. % based on the total volume of the colloidal nanoparticle solution and the silane compound. 12. The method according to claim 7 , wherein the step of mixing the colloidal nanoparticle solution with the silane compound further includes stirring the colloidal nanoparticle solution and the silane compound for a time ranging from 1.5 to 4.5 hours. 13. The method according to claim 1 , wherein the electroless metal layer is a nickel metal layer. 14. A method for manufacturing an electroless plating substrate, including: providing a substrate; attaching a self-adsorbed catalyst composition to a surface of the substrate, wherein the self-adsorbed catalyst composition includes a colloidal nanoparticle and a silane compound, the colloidal nanoparticle includes a palladium nanoparticle and a capping agent enclosing the palladium nanoparticle, and the silane compound has at least one amino group, and the colloid nanoparticle has a particle size ranging from 5 to 10 nanometers; and performing an electroless metal deposition for forming an electroless metal layer on the surface of the substrate. 15. The method according to claim 14 , wherein the method further includes: the substrate is pre-treated by sulfuric acid and then immersed into a solution containing the self-adsorbed catalyst composition; wherein the self-adsorbed catalyst composition is formed by mixing a colloidal nanoparticle solution and the silane compound. 16. The method according to claim 15 , wherein the silane compound is presented in an amount of from 0.5 to 5 vol. % based on the total volume of the colloidal nanoparticle solution and the silane compound. 17. A method for forming a metal layer on a surface of a substrate, including: attaching a self-adsorbed catalyst composition to the surface of the substrate, wherein the self-adsorbed catalyst composition includes a colloidal nanoparticle and a silane compound, the colloidal nanoparticle includes a palladium nanoparticle and a capping agent enclosing the palladium nanoparticle, and the silane compound has at least one amino group, and the colloid nanoparticle has a particle size ranging from 5 to 10 nanometers; and performing an electroless metal deposition for forming the metal layer on the surface of the substrate. 18. The method according to claim 17 , wherein the method further includes: pre-treating the substrate with sulfuric acid and immersing the substrate into a solution containing the self-adsorbed catalyst composition. 19. The method according to claim 17 , wherein the self-adsorbed catalyst composition is prepared by steps of: providing a colloidal nanoparticle solution including the colloidal nanoparticle and a solvent; mixing the colloidal nanoparticle solution with the silane compound for forming the self-adsorbed catalyst composition. 20. The method according to claim 19 , wherein the silane compound is presented in an amount of from 0.5 to 5 vol. % based on the total volume of the colloidal nanoparticle solution and the silane compound.

Assignees

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Classifications

  • Nanoparticles · CPC title

  • Indexing scheme associated with group B01J35/00, related to the analysis techniques used to determine the catalysts form or properties · CPC title

  • Scanning electron microscopy; Transmission electron microscopy · CPC title

  • in a colloidal state · CPC title

  • Metal or metal oxide crystallite size · CPC title

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What does patent US11865518B2 cover?
The instant disclosure provides a method for manufacturing an electroless plating substrate and a method for forming a metal layer on a surface of a substrate. The method for preparing the electroless plating substrate includes: providing a substrate; attaching a self-adsorbed catalyst composition to a surface of the substrate; and performing an electroless metal deposition for forming an elect…
Who is the assignee on this patent?
Univ Nat Tsing Hua
What technology area does this patent fall under?
Primary CPC classification B01J23/44. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Jan 09 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).