Method of producing high quality silicon carbide crystal in a seeded growth system
US-9790619-B2 · Oct 17, 2017 · US
Manufacturing method of silicon carbide ingot
US11859306B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11859306-B2 |
| Application number | US-202117385935-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jul 27, 2021 |
| Priority date | Jul 27, 2020 |
| Publication date | Jan 2, 2024 |
| Grant date | Jan 2, 2024 |
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Abstract
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A manufacturing method of a silicon carbide ingot includes the following. A raw material containing carbon and silicon and a seed located above the raw material are provided in a reactor. A first surface of the seed faces the raw material. The reactor and the raw material are heated, where part of the raw material is vaporized and transferred to the first surface of the seed and a sidewall of the seed and forms a silicon carbide material on the seed, to form a growing body containing the seed and the silicon carbide material. The growing body grows along a radial direction of the seed, and the growing body grows along a direction perpendicular to the first surface of the seed. The reactor and the raw material are cooled to obtain a silicon carbide ingot. A diameter of the silicon carbide ingot is greater than a diameter of the seed.
First claim
Opening claim text (preview).
What is claimed is: 1. A manufacturing method of a silicon carbide ingot, comprising: grinding a sidewall of a seed; providing a raw material containing carbon and silicon and the seed located above the raw material in a reactor, wherein a first surface of the seed faces the raw material, wherein a lateral distance between the sidewall of the seed and an inner wall of the reactor is 50 mm to 150 mm; heating the reactor and the raw material, wherein part of the raw material is vaporized and transferred to the first surface of the seed and the sidewall of the seed and forms a silicon carbide material on the seed, to form a growing body containing the seed and the silicon carbide material, wherein the growing body grows along a radial direction of the seed, and the growing body grows along a direction perpendicular to the first surface of the seed; and cooling the reactor and the raw material to obtain the growing body that has completed growth, wherein the growing body that has completed growth is the silicon carbide ingot, and a diameter of the silicon carbide ingot is greater than a diameter of the seed. 2. The manufacturing method as described in claim 1 , wherein the diameter of the seed is D1, the diameter of the silicon carbide ingot is D2, and D1:D2 is 1:8 to 7.5:8. 3. The manufacturing method as described in claim 1 , wherein during a growing process of the growing body, the growing body has a temperature gradient of 1° C/cm to 30° C/cm in a radial direction of the growing body. 4. The manufacturing method as described in claim 1 , wherein during a growing process of the growing body, the growing body has a temperature gradient of 3° C/cm to 5° C/cm in a radial direction of the growing body. 5. The manufacturing method as described in claim 1 , wherein a thickness of the seed is greater than 0.2 millimeter. 6. The manufacturing method as described in claim 1 , wherein the diameter of the seed is 25 millimeters to 250 millimeters. 7. The manufacturing method as described in claim 1 , wherein the first surface of the seed is a basal plane (0001) of silicon carbide. 8. The manufacturing method as described in claim 1 , wherein a through screw dislocation of the silicon carbide ingot has a density of less than 100 pcs/cm 2 .
Assignees
Inventors
Classifications
- C30B23/066Primary
Heating of the material to be evaporated · CPC title
Carbides · CPC title
Vacuum evaporation · CPC title
- C30B29/36Primary
Carbides · CPC title
- C30B23/025Primary
characterised by the substrate · CPC title
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- What does patent US11859306B2 cover?
- A manufacturing method of a silicon carbide ingot includes the following. A raw material containing carbon and silicon and a seed located above the raw material are provided in a reactor. A first surface of the seed faces the raw material. The reactor and the raw material are heated, where part of the raw material is vaporized and transferred to the first surface of the seed and a sidewall of t…
- Who is the assignee on this patent?
- Globalwafers Co Ltd
- What technology area does this patent fall under?
- Primary CPC classification C30B23/066. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Jan 02 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).