Hot filament CVD device

Patent metadata

Field	Value
Publication number	US-11846017-B2
Application number	US-201917271433-A
Country	US
Kind code	B2
Filing date	Aug 19, 2019
Priority date	Sep 10, 2018
Publication date	Dec 19, 2023
Grant date	Dec 19, 2023

Abstract

Provided is a hot filament CVD device capable of easily attaching, detaching, and replacing a filament. The hot filament CVD device includes a chamber, a base material support that supports multiple base materials, filament cartridges, and paired holding parts. The filament cartridges each include multiple filaments (60), a first frame, a second frame, and paired connecting members. The paired holding parts guide each of the filament cartridges when it is inserted into the chamber, and hold the filament cartridges in the chamber so that the filament cartridges face the multiple base materials.

First claim

The invention claimed is:

1. A hot filament CVD device that performs coating treatment on multiple base materials, the hot filament CVD device comprising:
a chamber including a chamber body provided with an opening, and a door attached to the chamber body to seal the opening and allow the opening to be openable;
a base material support disposed inside the chamber to support the multiple base materials;
at least one filament cartridge insertable into the chamber through the opening in a predetermined insertion direction,
the at least one filament cartridge including:
multiple filaments that extend in a first direction and are disposed apart from each other in a second direction intersecting the first direction;
a first frame that extends in the second direction and supports one end of each of the multiple filaments in the first direction;
a second frame that extends in the second direction and supports another end of each of the multiple filaments in the first direction; and
two paired connecting members, each extending in the first direction, that connect opposite ends of the first frame in the second direction to corresponding opposite ends of the second frame in the second direction;
a power source that allows a current to flow into the multiple filaments; and
two paired holding parts each having a recess for slidably engaging the at least one filament cartridge for guiding the at least one filament cartridge in the insertion direction, the at least one filament cartridge being inserted into the chamber in the insertion direction through the opening, and for holding the at least one filament cartridge while allowing the multiple filaments to face the corresponding multiple base materials in a third direction intersecting a plane including the first direction and the second direction.

2. The hot filament CVD device according to claim 1 , wherein
the at least one filament cartridge includes multiple filament cartridges, and
the paired holding parts each have a shape guiding each of the multiple filament cartridges to be inserted into the chamber in the insertion direction, and holding the multiple filament cartridges allowing the multiple filaments provided in each of the multiple filament cartridges to be disposed at intervals in the third direction.

3. The hot filament CVD device according to claim 1 , wherein
the paired holding parts each have a shape for holding the first frame and the second frame,
the hot filament CVD device further comprises a holding part moving mechanism that moves at least one of the paired holding parts to change a distance between the first frame and the second frame in the first direction, and
the paired connecting members each have a telescopic portion that is capable of being extended and contracted, allowing a change in distance between the first frame and the second frame.

4. The hot filament CVD device according to claim 1 , further comprising a stage that restricts a position of the base material support in each of the first direction and the second direction in the chamber, and holds the base material support,
wherein the base material support opened with multiple holes into which the respective multiple base materials are allowed to be inserted, and opening positions of the respective multiple holes in the base material support are set to allow the multiple base materials to be disposed between the corresponding multiple filaments of the at least one filament cartridge held by the paired holding parts when viewed from the third direction.

5. The hot filament CVD device according to claim 4 , further comprising a stage moving mechanism that moves the stage in the third direction to move the multiple base materials between a coating treatment position at which the multiple base materials are disposed close to the corresponding multiple filaments and a separation position further apart from the multiple filaments than the coating treatment position in the third direction.

Assignees

• Kobe Steel Ltd
• Kobe Steel Ltd

Inventors

• Takahashi Tetsuya
• Hirota Satoshi
• Cremer Rainer

Classifications

• C23C16/271 Primary

  using hot filaments · CPC title

• C23C16/458

  characterised by the method used for supporting substrates in the reaction chamber · CPC title

• C23C16/448 Primary

  characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials · CPC title

• C23C16/4488

  by in situ generation of reactive gas by chemical or electrochemical reaction · CPC title