Composite substrate for electro-optic element and method for manufacturing the same

Patent metadata

Field	Value
Publication number	US-11815751-B2
Application number	US-202218060289-A
Country	US
Kind code	B2
Filing date	Nov 30, 2022
Priority date	May 22, 2018
Publication date	Nov 14, 2023
Grant date	Nov 14, 2023

Abstract

A composite substrate for an electro-optic element includes: an electro-optic crystal substrate having an electro-optic effect; a support substrate bonded to the electro-optic crystal substrate at least via an amorphous layer; and a low-refractive-index layer located between the electro-optic crystal substrate and the amorphous layer and having a lower refractive index than the electro-optical crystal substrate. The amorphous layer is constituted of one or more elements that constitute a layer or a substrate contacting the amorphous layer from one side and one or more elements that constitute a layer or a substrate contacting the amorphous layer from another side.

First claim

The invention claimed is:

1. A composite substrate for an electro-optic element, the composite substrate comprising:
an electro-optic crystal substrate having an electro-optic effect;
a support substrate bonded to the electro-optic crystal substrate at least via an amorphous layer; and
a low-refractive-index layer located between the electro-optic crystal substrate and the amorphous layer and having a lower refractive index than the electro-optical crystal substrate,
wherein the amorphous layer contains one or more elements that are present in a layer or a substrate that contacts the amorphous layer from one side and one or more elements that are present in a layer or a substrate that contacts the amorphous layer from another side, and
a thickness of the amorphous layer is at least 0.1 nanometer and at most 100 nanometers.

2. The composite substrate according to claim 1 , wherein the low-refractive-index layer is constituted of at least one member selected from a group consisting of silicon oxide, tantalum oxide, aluminum oxide, magnesium fluoride, and calcium fluoride.

3. The composite substrate according to claim 1 , wherein the support substrate is a substrate of silicon, glass, sialon, mullite, aluminum nitride, silicon nitride, magnesium oxide, sapphire, quartz, crystal, gallium nitride, silicon carbide, or gallium oxide.

4. The composite substrate according to claim 1 , wherein the layer or substrate contacting the amorphous layer from the one side is the low-refractive-index layer.

5. The composite substrate according to claim 1 , further comprising a first conductive layer located between the low-refractive-index layer and the amorphous layer,
wherein the layer or substrate contacting the amorphous layer from the one side is the first conductive layer.

6. The composite substrate according to claim 5 , wherein the first conductive layer comprises a layer of gold, silver, copper, aluminum, platinum, or an alloy containing at least two of gold, silver, copper, aluminum and platinum.

7. The composite substrate according to claim 1 , further comprising a first bonding layer located between the low-refractive-index layer and the amorphous layer,
wherein the layer or substrate contacting the amorphous layer from the one side is the first bonding layer.

8. The composite substrate according to claim 7 , wherein the first bonding layer is constituted of at least one member selected from a group consisting of tantalum oxide, niobium oxide, silicon, aluminum oxide, and titanium oxide.

9. The composite substrate according to claim 8 , further comprising a first conductive layer located between the low-refractive-index layer and the first bonding layer.

10. The composite substrate according to claim 1 , wherein the layer or substrate contacting the amorphous layer from the other side is the support substrate.

11. The composite substrate according to claim 1 , further comprising a second bonding layer located between the amorphous layer and the support substrate,
wherein the layer or substrate contacting the amorphous layer from the other side is the second bonding layer.

12. The composite substrate according to claim 11 wherein the second bonding layer is constituted of at least one member selected from a group consisting of tantalum oxide, niobium oxide, silicon, aluminum oxide, and titanium oxide.

13. The composite substrate according to claim 11 , further comprising a second low-refractive-index layer located between the second bonding layer and the support substrate and having a lower refractive index than the electro-optic crystal substrate.

14. The composite substrate according to claim 13 , further comprising a second conductive layer located between the second low-refractive-index layer and the support substrate.

15. The composite substrate according to claim 1 , further comprising a second conductive layer located between the amorphous layer and the support substrate,
wherein the layer or substrate contacting the amorphous layer from the other side is the second conductive layer.

16. The composite substrate according to claim 15 , wherein the second conductive layer is constituted of at least one member selected from a group consisting of gold, silver, copper, aluminum, and platinum.

17. The composite substrate according to claim 1 , further comprising a second low-refractive-index layer located between the amorphous layer and the support substrate and having a lower refractive index than the electro-optic crystal substrate,
wherein the layer or substrate contacting the amorphous layer from the other side is the second low-refractive-index layer.

18. The composite substrate according to claim 17 , further comprising a second conductive layer located between the second low-refractive-index layer and the support substrate.

19. The composite substrate according to claim 1 , wherein a ridge portion is defined on a surface of the electro-optic crystal substrate.

20. The composite substrate according to claim 19 , wherein
a c-axis of the electro-optic crystal substrate is parallel to the electro-optical crystal substrate, and
the composite substrate further comprises a first electrode located on one side surface of the ridge portion and a second electrode located on another side surface of the ridge portion and opposing the first electrode across the ridge portion.

21. The composite substrate according to claim 19 , wherein
a c-axis of the electro-optic crystal substrate is perpendicular to the electro-optic crystal substrate, and
the composite substrate further comprises a first electrode located on a top surface of the ridge portion and a second electrode located in a region within the surface of the electro-optic crystal substrate and excluding the ridge portion.

22. The composite substrate according to claim 19 , wherein an optical waveguide region containing impurities is defined within the ridge portion along a longitudinal direction of the ridge portion.

Assignees

• Ngk Insulators Ltd

Inventors

• Tai Tomoyoshi
• Kondo Jungo

Classifications

• G02F1/035 Primary

  in an optical waveguide structure · CPC title

• G02B6/13

  Integrated optical circuits characterised by the manufacturing method · CPC title