Composite substrate for electro-optic element and method for manufacturing the same

Patent metadata

Field	Value
Publication number	US-11281032-B2
Application number	US-202016950306-A
Country	US
Kind code	B2
Filing date	Nov 17, 2020
Priority date	May 22, 2018
Publication date	Mar 22, 2022
Grant date	Mar 22, 2022

Abstract

A composite substrate for an electro-optic element includes: an electro-optic crystal substrate having an electro-optic effect; a support substrate bonded to the electro-optic crystal substrate at least via an amorphous layer; and a low-refractive-index layer located between the electro-optic crystal substrate and the amorphous layer and having a lower refractive index than the electro-optical crystal substrate. The amorphous layer is constituted of one or more elements that constitute a layer or a substrate contacting the amorphous layer from one side and one or more elements that constitute a layer or a substrate contacting the amorphous layer from another side.

First claim

The invention claimed is:

1. A composite substrate for an electro-optic element, the composite substrate comprising:
an electro-optic crystal substrate having an electro-optic effect;
a support substrate bonded to the electro-optic crystal substrate at least via an amorphous layer;
a low-refractive-index layer located between the electro-optic crystal substrate and the amorphous layer, contacting the electro-optic crystal substrate, and having a lower refractive index than the electro-optical crystal substrate; and
a first conductive layer located between the low-refractive-index layer and the amorphous layer,
wherein the amorphous layer contains one or more elements that are present in a layer or a substrate that contacts the amorphous layer from one side and one or more elements that are present in a layer or a substrate that contacts the amorphous layer from another side,
the layer or substrate contacting the amorphous layer from the one side is the first conductive layer, and
the first conductive layer comprises a layer of gold, silver, copper, aluminum, platinum, or an alloy containing at least two of gold, silver, copper, aluminum and platinum.

2. The composite substrate according to claim 1 , wherein the low-refractive-index layer is constituted of at least one member selected from the group consisting of silicon oxide, tantalum oxide, aluminum oxide, magnesium fluoride, and calcium fluoride.

3. The composite substrate according to claim 1 , wherein the support substrate is a substrate of sialon, mullite, silicon nitride, magnesium oxide, gallium nitride, or gallium oxide.

4. The composite substrate according to claim 1 , wherein a surface layer of the first conductive layer contacting the amorphous layer is constituted of platinum.

5. The composite substrate according to claim 1 , wherein the first conductive layer contacts the low-refractive-index layer and comprises a layer of titanium, chromium, nickel, or platinum as a base layer contacting the low-refractive-index layer.

6. The composite substrate according to claim 1 , wherein the layer or substrate contacting the amorphous layer from the other side is the support substrate.

7. The composite substrate according to claim 1 , further comprising a second bonding layer located between the amorphous layer and the support substrate,
wherein the layer or substrate contacting the amorphous layer from the other side is the second bonding layer.

8. The composite substrate according to claim 7 , wherein the second bonding layer is constituted of at least one member selected from the group consisting of tantalum oxide, niobium oxide, silicon, aluminum oxide, and titanium oxide.

9. The composite substrate according to claim 7 , further comprising a second low-refractive-index layer located between the second bonding layer and the support substrate and having a lower refractive index than the electro-optic crystal substrate.

10. The composite substrate according to claim 1 , further comprising a second low-refractive-index layer located between the amorphous layer and the support substrate and having a lower refractive index than the electro-optic crystal substrate,
wherein the layer or substrate contacting the amorphous layer from the other side is the second low-refractive-index layer.

11. The composite substrate according to claim 1 , wherein a ridge portion is defined on a surface of the electro-optic crystal substrate.

12. The composite substrate according to claim 11 , wherein
a c-axis of the electro-optic crystal substrate is parallel to the electro-optical crystal substrate, and
the composite substrate further comprises a first electrode located on one side surface of the ridge portion and a second electrode located on another side surface of the ridge portion and opposing the first electrode across the ridge portion.

13. The composite substrate according to claim 11 , wherein
a c-axis of the electro-optic crystal substrate is perpendicular to the electro-optic crystal substrate, and
the composite substrate further comprises a first electrode located on a top surface of the ridge portion and a second electrode located in a region within the surface of the electro-optic crystal substrate and excluding the ridge portion.

14. The composite substrate according to claim 11 , wherein an optical waveguide region containing impurities is defined within the ridge portion along a longitudinal direction of the ridge portion.

Assignees

• Ngk Insulators Ltd

Inventors

• Tai Tomoyoshi
• Kondo Jungo

Classifications

• G02B6/13

  Integrated optical circuits characterised by the manufacturing method · CPC title

• G02F1/035 Primary

  in an optical waveguide structure · CPC title