Embedded wire grid polarizer with high reflectivity on both sides
US-10139536-B2 · Nov 27, 2018 · US
US11809035B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11809035-B2 |
| Application number | US-202117298267-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jan 11, 2021 |
| Priority date | Jan 17, 2020 |
| Publication date | Nov 7, 2023 |
| Grant date | Nov 7, 2023 |
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A color filter substrate, a display panel and a display device are provided. The color filter substrate includes: a base substrate; a color conversion layer on the base substrate; a covering layer on a side of the color conversion layer away from the base substrate; and a polarizing layer on a side of the covering layer away from the base substrate. The polarizing layer includes a wire grid polarizer. The covering layer includes a first covering sub-layer and a second covering sub-layer, the first covering sub-layer is located on the side of the color conversion layer away from the base substrate, the second covering sub-layer is located on a side of the first covering sub-layer away from the base substrate, and a material of the first covering sub-layer is different from a material of the second covering sub-layer.
Opening claim text (preview).
What is claimed is: 1. A color filter substrate, comprising: a base substrate; a color conversion layer on the base substrate; a covering layer on a side of the color conversion layer away from the base substrate; and a polarizing layer on a side of the covering layer away from the base substrate, wherein the polarizing layer comprises a wire grid polarizer; wherein the covering layer comprises a first covering sub-layer and a second covering sub-layer, the first covering sub-layer is located on the side of the color conversion layer away from the base substrate, the second covering sub-layer is located on a side of the first covering sub-layer away from the base substrate, and a material of the first covering sub-layer is different from a material of the second covering sub-layer; and wherein the second covering sub-layer at least comprises a photoinitiator, and a difference in height of the second covering sub-layer is less than or equal to 100 nanometers. 2. The color filter substrate of claim 1 , further comprising a buffer layer between the covering layer and the polarizing layer, wherein the buffer layer comprises a first buffer sub-layer and a second buffer sub-layer, the first buffer sub-layer is arranged on a side of the wire grid polarizer close to the base substrate, the second buffer sub-layer is arranged on a side of the first buffer sub-layer close to the base substrate, and a refractive index of a material of the first buffer sub-layer is smaller than a refractive index of a material of the second buffer sub-layer. 3. The color filter substrate of claim 2 , further comprising a protective layer on a side of the polarizing layer away from the base substrate, wherein the protective layer comprises a first protective sub-layer and a second protective sub-layer, the first protective sub-layer is arranged on a side of the wire grid polarizer away from the base substrate, the second protection sub-layer is arranged on a side of the first protection sub-layer away from the base substrate, and a refractive index of a material of the first protective sub-layer is smaller than a refractive index of a material of the second protective sub-layer. 4. The color filter substrate of claim 1 , further comprising a filter layer on a side of the color conversion layer close to the base substrate, wherein the filter layer comprises a first filter structure, a second filter structure, and a third filter structure, the first filter structure is configured to filter light within a first wavelength range, the second filter structure is configured to filter light within a second wavelength range, the third filter structure is configured to filter light within a third wavelength range, and the first wavelength range, the second wavelength range, and the third wavelength range are different from one another. 5. The color filter substrate of claim 4 , wherein the color conversion layer comprises a first quantum dot structure and a second quantum dot structure, the first quantum dot structure is configured to convert the light within the third wavelength range into the light within the first wavelength range, the second quantum dot structure is configured to convert the light within the third wavelength range into the light within the second wavelength range; and wherein the color filter substrate comprises a plurality of pixels, each pixel comprises at least a first sub-pixel, a second sub-pixel and a third sub-pixel, the first sub-pixel comprises the first quantum dot structure and the first filter structure, the second sub-pixel comprises the second quantum dot structure and the second filter structure, and the third sub-pixel comprises the third filter structure. 6. The color filter substrate of claim 5 , wherein the third sub-pixel further comprises a transparent structure, the transparent structure is configured to allow the light within the third wavelength range, that is incident thereon, to pass therethrough, and the transparent structure is located on a side of the third filter structure away from the base substrate. 7. The color filter substrate of claim 5 , wherein an orthographic projection of the first quantum dot structure on the base substrate falls within an orthographic projection of the first filter structure on the base substrate, and an orthographic projection of the second quantum dot structure on the base substrate falls within an orthographic projection of the second filter structure on the base substrate. 8. The color filter substrate of claim 6 , wherein an orthographic projection of the transparent structure on the base substrate falls within an orthographic projection of the third filter structure on the base substrate, a thickness of the first filter structure, a thickness of the second filter structure, and a thickness of the third filter structure are equal to one another, a thickness of the first quantum dot structure, a thickness of the second quantum dot structure and a thickness of the transparent structure are equal to one another, and the thickness of the first filter structure is smaller than the thickness of the first quantum dot structure. 9. The color filter substrate of claim 5 , wherein a thickness of the first filter structure is equal to a thickness of the second filter structure, a thickness of the first quantum dot structure is equal to a thickness of the second quantum dot structure, a thickness of the third filter structure is equal to a sum of thicknesses of the first filter structure and the first quantum dot structure, and the thickness of the first filter structure is smaller than the thickness of the first quantum dot structure. 10. The color filter substrate of claim 1 , wherein a thickness of the first covering sub-layer is greater than a thickness of the second covering sub-layer. 11. The color filter substrate of claim 3 , wherein a pitch of the wire grid polarizer is within a range of 100˜140 nm; and/or, a duty ratio of the wire grid polarizer is equal to 0.5; and/or, a thickness of the wire grid polarizer is within a range of 150˜200 nm. 12. The color filter substrate of claim 11 , wherein a thickness of the first buffer sub-layer is within a range of 275.5˜304.5 nm, and a thickness of the second buffer sub-layer is within a range of 95˜105 nm; and/or, a thickness of the first protective sub-layer is within a range of 427.5˜472.5 nm, and a thickness of the second protective sub-layer is within a range of 47.5˜52.5 nm; and/or, the refractive indices of the first buffer sub-layer and the first protective sub-layer are both within a range of 1.35˜1.65; and/or, the refractive indices of the second buffer sub-layer and the second protection sub-layer are both within a range of 1.6˜2.0. 13. The color filter substrate of claim 5 , wherein the color filter substrate further comprises a black matrix and an isolation bank, the black matrix is located on a side of the filter layer close to the base substrate, and the isolation bank is located on a side of the black matrix away from the base substrate, so that a plurality of grooves are formed on a side of the filter layer away from the base substrate; and the plurality of grooves comprise a first groove in the first sub-pixel and a second groove in the second sub-pixel, the first quantum dot structure is located in the first groove, and the second quantum dot structure is located in the second groove. 14. The color filter substrate of claim 5 , wherein the color filter substrate further comprises a black matrix, an isolation bank and a planarization layer, the black matrix is located on a side of the filter layer close to the base substrat
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