Mask and method for manufacturing mask

Patent metadata

Field	Value
Publication number	US-11807932-B2
Application number	US-202117197300-A
Country	US
Kind code	B2
Filing date	Mar 10, 2021
Priority date	Jul 23, 2020
Publication date	Nov 7, 2023
Grant date	Nov 7, 2023

Abstract

A method for manufacturing a mask includes providing, on a stage, a mask frame in which a plurality of cell openings is defined; providing each of the cell openings with a cell mask material in which a second area and a plurality of first areas are defined, where the second area is disposed around each of the first areas; emitting a laser beam to the second area to harden the second area; and removing the first areas, thereby forming a plurality of cell masks disposed in the cell openings, respectively.

First claim

What is claimed is:

1. A method for manufacturing a mask, the method comprising:
providing, on a stage, a mask frame in which a plurality of cell openings is defined;
providing each of the cell openings with a cell mask material in which a second area and a plurality of first areas are defined, the second area being disposed around each of the first areas;
emitting a laser beam to the second area to harden the second area; and
removing the first areas, thereby forming a plurality of cell masks disposed in the cell openings, respectively,
wherein each of the cell masks of the plurality of cell masks includes a plurality of deposition holes defined by the removing the first areas,
the plurality of deposition holes for each cell mask of the plurality of cell masks are arranged in a first direction and a second direction orthogonal to the first direction, and each of the deposition holes is spaced apart from each other in the first direction and the second direction,
wherein the providing of the cell mask material comprises:
providing the cell openings with a first cell mask material; and
providing, on the first cell mask material, a second cell mask material which comprises a material different from the first cell mask material, and
wherein a second cell mask layer including the second cell mask material is disposed on a first cell mask layer including the first cell mask material.

2. The method of claim 1 , wherein the cell mask material is attached to inner walls of the mask frame in which each of the cell openings is defined.

3. The method of claim 2 , wherein deposition holes of the cell masks are defined by removing the first areas,
wherein each of the deposition holes comprises:
a first portion which defines an upper portion of the deposition hole; and
a second portion which defines a lower portion of the deposition hole,

wherein, in a plan view with reference to a thickness direction of the main frame, an area of the first portion is greater than an area of the second portion.

4. The method of claim 1 , wherein, when in a cross-sectional view, a top surface of each of the plurality of cell masks is disposed coplanar with a top surface of the mask frame, and a bottom surface of each of the plurality of cell masks is disposed coplanar with a bottom surface of the mask frame, and an inner sidewall of the mask frame has a same height an outer sidewall of each of the plurality of cell masks abutting the inner sidewall of the mask frame.

5. The method of claim 1 , wherein the providing of the mask frame comprises:
providing a mask frame material on the stage; and
hardening the mask frame material.

6. The method of claim 1 , wherein the cell openings comprise:
a first cell opening; and
a second cell opening having an area different from an area of the first cell opening in a plan view with reference to a thickness direction of the main frame.

Assignees

• Samsung Display Co Ltd

Inventors

• Jo Junho
• Park Youngho
• Song Seungyong
• Lee Youngchul
• Choi Youngsuck

Classifications

• C23C14/042 Primary

  using masks · CPC title

• H10K71/166 Primary

  using selective deposition, e.g. using a mask · CPC title

• C23C16/042

  using masks · CPC title

• H10K71/00

  Manufacture or treatment specially adapted for the organic devices covered by this subclass · CPC title