Group VI precursor compounds

Patent metadata

Field	Value
Publication number	US-11807653-B2
Application number	US-202217736855-A
Country	US
Kind code	B2
Filing date	May 4, 2022
Priority date	Feb 27, 2019
Publication date	Nov 7, 2023
Grant date	Nov 7, 2023

Abstract

The invention provides a facile process for preparing various Group VI precursor compounds useful in the vapor deposition of such Group VI metals onto solid substrates, especially microelectronic semiconductor device substrates. The process provides an effective means to obtain such volatile materials, which can then be sources of molybdenum, chromium, or tungsten-containing materials to be deposited on such substrates. Additionally, the invention provides a method for vapor deposition of such compounds onto microelectronic device substrates.

First claim

What is claimed is:

1. A process for preparing compounds of the Formula (I)

wherein M is chosen from tungsten and chromium, X is chosen from fluoro, chloro, bromo, and iodo, and each L 1 and L 2 are the same or different and constitute:
(i) a monodentate hydrocarbyl ligand coordinated with M, or
(ii) are taken together to form a bidentate hydrocarbyl ligand coordinated with M;

which comprises:
(A) contacting a compound of the formula

with (a) water containing about 0.1% (w/w) to about 48% (w/w) of a compound of the formula HX, and (b) a compound of the formula L 1 and/or L 2 ; followed by
(B) extraction of the compound of Formula(I) with a non-coordinating, water immiscible solvent, and isolation of the compound of Formula (I) as a solid or liquid.

2. The process of claim 1 , wherein X is fluoro.

3. The process of claim 1 , wherein X is chloro.

4. The process of claim 1 , wherein X is bromo.

5. The process of claim 1 , wherein X is iodo.

6. The process of claim 1 , wherein L 1 and L 2 are dimethoxyethane.

7. The process of claim 1 , wherein the non-coordinating, water-immiscible solvent is dichloromethane, ethyl acetate, diethyl ether, toluene, benzene, or pentane.

8. The process of claim 6 , wherein the non-coordinating, water-immiscible solvent is dichloromethane.

9. The process of claim 1 , wherein M is tungsten.

10. The process of claim 1 , wherein M is chromium.

Assignees

• Entegris Inc

Inventors

• Ermert David M
• Baum Thomas H
• Wright Jr Robert

Classifications

• H10P14/69396

  the material containing at least one rare earth metal element, e.g. oxides of lanthanides, scandium or yttrium · CPC title

• H10P14/412

  Deposition of metallic or metal-silicide materials · CPC title

• H10P14/6339

  deposition by cyclic CVD, e.g. ALD, ALE or pulsed CVD · CPC title

• H10P14/668

  the materials being characterised by the deposition precursor materials · CPC title

• H10P14/6939

  characterised by the metal · CPC title