Micromechanical pressure sensor device including a diaphragm system and corresponding manufacturing method

US11788912B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11788912-B2
Application numberUS-201916972588-A
CountryUS
Kind codeB2
Filing dateJun 28, 2019
Priority dateJul 10, 2018
Publication dateOct 17, 2023
Grant dateOct 17, 2023

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A micromechanical pressure sensor device and a corresponding manufacturing method. The micromechanical pressure sensor device is equipped with a sensor substrate; a diaphragm system that is anchored in the sensor substrate and that includes a first diaphragm and a second diaphragm situated spaced apart therefrom, which are circumferentially connected to one another in an edge area and enclose a reference pressure in an interior space formed in between; and a plate-shaped electrode that is suspended in the interior space and that is situated spaced apart from the first diaphragm and from the second diaphragm and forms a first capacitor with the first diaphragm and forms a second capacitor with the second diaphragm. The first diaphragm and the second diaphragm are designed in such a way that they are deformable toward one another when acted on by an external pressure.

First claim

Opening claim text (preview).

What is claimed is: 1. A micromechanical pressure sensor device, comprising: a sensor substrate; a diaphragm system that is anchored in the sensor substrate and that includes a first diaphragm and a second diaphragm situated spaced apart therefrom, which are circumferentially connected to one another in an edge area, and enclose a reference pressure in an interior space formed in between the first and second diaphragm; and a plate-shaped central electrode that is suspended in the interior space and that is situated spaced apart from the first diaphragm and from the second diaphragm and that forms a first capacitor with the first diaphragm and forms a second capacitor with the second diaphragm; wherein the first diaphragm and the second diaphragm are configured in such a way that they are deformable toward one another when acted on by an external pressure, wherein the diaphragm system is situated in a cantilever manner. 2. The micromechanical pressure sensor device as recited in claim 1 , wherein the diaphragm system at the edge area is clamped in the sensor substrate via at least one elastic spring device. 3. The micromechanical pressure sensor device as recited in claim 1 , wherein the first diaphragm and the second diaphragm are electroconductively connected to one another via the edge area. 4. The micromechanical pressure sensor device as recited in claim 1 , wherein the first diaphragm and the second diaphragm are electrically insulatingly connected to one another via the edge area. 5. The micromechanical pressure sensor device as recited in claim 1 , wherein the first diaphragm is exposed to outside toward a first side or toward a second side of the sensor substrate via a cavity, and the second diaphragm is exposed to the outside toward the second side of the sensor substrate. 6. The micromechanical pressure sensor device as recited in claim 1 , wherein the first diaphragm is connected to the central electrode across electrically insulating connecting areas, so that when the first diaphragm is acted on by the external pressure, the central electrode together with the first diaphragm is deformable, and a reference capacitor is formed. 7. The micromechanical pressure sensor device as recited in claim 1 , wherein a separate reference capacitor is formed in the sensor substrate, laterally spaced apart from the diaphragm system. 8. A micromechanical pressure sensor device, comprising: a sensor substrate; a diaphragm system that is anchored in the sensor substrate and that includes a first diaphragm and a second diaphragm situated spaced apart therefrom, which are circumferentially connected to one another in an edge area, and enclose a reference pressure in an interior space formed in between the first and second diaphragm; and a plate-shaped central electrode that is suspended in the interior space and that is situated spaced apart from the first diaphragm and from the second diaphragm and that forms a first capacitor with the first diaphragm and forms a second capacitor with the second diaphragm; wherein the first diaphragm and the second diaphragm are configured in such a way that they are deformable toward one another when acted on by an external pressure, wherein the diaphragm system is situated in a cantilever manner, and is anchored in the sensor substrate across at least one extension area that extends laterally away from the diaphragm system. 9. The micromechanical pressure sensor device as recited in claim 8 , wherein the diaphragm system has a cylindrical configuration, and a first extension area and a second extension area are provided which extend tangentially and laterally away from the diaphragm system and are situated diametrically opposite one another. 10. The micromechanical pressure sensor device as recited in claim 8 , wherein the central electrode is situated in a cantilever manner and is anchored in the sensor substrate across the at least one extension area. 11. The micromechanical pressure sensor device as recited in claim 8 , wherein the central electrode is clamped, at least in areas, in the interior space across a clamping area. 12. A method for manufacturing a micromechanical pressure sensor device, comprising the following steps: forming a diaphragm system that is anchored in a sensor substrate, and includes a first diaphragm and a second diaphragm situated spaced apart from one another and which are circumferentially connected to one another in an edge area and enclose a reference pressure in an interior space formed in between the first and second diaphragms; and forming a plate-shaped electrode central electrode that is suspended in the interior space and that is situated spaced apart from the first diaphragm and from the second diaphragm, and that forms a first capacitor with the first diaphragm and forms a second capacitor with the second diaphragm, the first diaphragm and the second diaphragm being formed in such a way that they are deformable toward one another when acted on by an external pressure, wherein the diaphragm system is situated in a cantilever manner. 13. A method for manufacturing a micromechanical pressure sensor device, comprising the following steps: forming a diaphragm system that is anchored in a sensor substrate, and includes a first diaphragm and a second diaphragm situated spaced apart from one another and which are circumferentially connected to one another in an edge area and enclose a reference pressure in an interior space formed in between the first and second diaphragms; and forming a plate-shaped electrode central electrode that is suspended in the interior space and that is situated spaced apart from the first diaphragm and from the second diaphragm, and that forms a first capacitor with the first and forms a second capacitor with the second diaphragm, the first diaphragm and the second diaphragm being formed in such a way that they are deformable toward one another when acted on by an external pressure, wherein the first diaphragm is formed from a first conductive layer that is deposited and structured above a base substrate, the central electrode being formed from a second conductive layer that is deposited and structured above the first conductive layer, and the second diaphragm being formed from third and fourth conductive layers that are deposited and structured above the second conductive layer. 14. The method as recited in claim 13 , wherein the interior space is formed by depositing and structuring a first sacrificial layer in the interior space between the first conductive layer and the second conductive layer, depositing and structuring a second sacrificial layer, and carrying out a sacrificial layer etching process for at least partially removing the first sacrificial layer and the second sacrificial layer after perforation of the third conductive layer in the interior space, after which the third conductive layer is closed by deposition of the fourth conductive layer. 15. A method for manufacturing a micromechanical pressure sensor device, comprising the following steps: forming a diaphragm system that is anchored in a sensor substrate, and includes a first diaphragm and a second diaphragm situated spaced apart from one another and which are circumferentially connected to one another in an edge area and enclose a reference pressure in an interior space formed in between the first and second diaphragms; and forming a plate-shaped electrode central electrode that is suspended in the interior space and that is situated spaced apart from the first diaphragm and from the second diaphragm, and that forms a first capacitor with the first and f

Assignees

Inventors

Classifications

  • G01L9/0048Primary

    Details about the mounting of the diaphragm to its support or about the diaphragm edges, e.g. notches, round shapes for stress relief · CPC title

  • Transducers for transforming electrical into mechanical energy or vice versa (dynamo-electric machines H02K99/00; electrostatic machines H02N1/00; piezoelectric devices H10N30/00) · CPC title

  • Arrangements of deformable or non-deformable structures, e.g. membrane and cavity for use in a transducer · CPC title

  • Non square semiconductive diaphragm · CPC title

  • G01L9/0073Primary

    using a semiconductive diaphragm · CPC title

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What does patent US11788912B2 cover?
A micromechanical pressure sensor device and a corresponding manufacturing method. The micromechanical pressure sensor device is equipped with a sensor substrate; a diaphragm system that is anchored in the sensor substrate and that includes a first diaphragm and a second diaphragm situated spaced apart therefrom, which are circumferentially connected to one another in an edge area and enclose a…
Who is the assignee on this patent?
Bosch Gmbh Robert
What technology area does this patent fall under?
Primary CPC classification G01L9/0048. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Oct 17 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).