Surface treatment apparatus and surface treatment method

US11764084B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11764084-B2
Application numberUS-202016951718-A
CountryUS
Kind codeB2
Filing dateNov 18, 2020
Priority dateNov 22, 2019
Publication dateSep 19, 2023
Grant dateSep 19, 2023

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Disclosed is a substrate treatment apparatus. The apparatus includes a support unit that supports and rotates a substrate and a spray unit equipped with one or more nozzles to spray a dual fluid that is a mixture of a cleaning agent and carbon dioxide onto the substrate.

First claim

Opening claim text (preview).

What is claimed is: 1. A substrate treatment apparatus comprising: a support unit configured to support a substrate and rotate the substrate supported thereon; a spray unit including a plurality of nozzles for spraying a dual fluid composed of a cleaning agent and carbon dioxide onto the substrate; a rotation speed measuring member configured to measure a rotation speed of a substrate rotating portion of the support unit; and a controller configured to adaptively control the number of nozzles to be used among the plurality of nozzles on the basis of the rotation speed measured by the rotation speed measuring member. 2. The apparatus according to claim 1 , wherein the spray unit comprises: a cleaning agent supply member connected to the plurality of nozzles and configured to supply the cleaning agent to the plurality of nozzles; and a carbon dioxide supply member connected to the plurality of nozzles and configured to supply the carbon dioxide to the plurality of nozzles. 3. The apparatus according to claim 1 , wherein the controller is configured to set, in response to when the rotation speed measured by the rotation speed measuring member is lower than a target rotation speed, the number of nozzles to be used to be two or greater. 4. The apparatus according to claim 1 , wherein the controller is configured to set, in response to when the rotation speed measured by the rotation speed measuring member is equal to or higher than a target rotation speed, the number of nozzles to be used to be one. 5. The apparatus according to claim 1 , further comprising: a flow meter installed in the spray unit and configured to measure a flow velocity of the dual fluid; and a controller configured to control a pressure of the carbon dioxide to be mixed with the cleaning agent on the basis of the flow velocity measured by the flow meter. 6. The apparatus according to claim 5 , wherein the controller is configured to cause, in response to the flow velocity measured by the flow meter is lower than a target flow velocity, the pressure of the carbon dioxide to be mixed with the cleaning agent to increase. 7. The apparatus according to claim 5 , wherein the controller is configured to provide, in response to when the flow velocity measured by the flow meter is equal to or higher than a target flow velocity, a notification indicating that the flow velocity is in a normal state. 8. The apparatus according to claim 1 , wherein a temperature of the cleaning agent is in a range of 1° C. to 10° C. 9. The apparatus according to claim 1 , wherein the cleaning agent is ozone water.

Assignees

Inventors

Classifications

  • Process monitoring, e.g. flow or thickness monitoring · CPC title

  • using mainly spraying means, e.g. nozzles · CPC title

  • using mainly spraying means, e.g. nozzles · CPC title

  • characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating carrousel · CPC title

  • Temperature monitoring · CPC title

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Frequently asked questions

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What does patent US11764084B2 cover?
Disclosed is a substrate treatment apparatus. The apparatus includes a support unit that supports and rotates a substrate and a spray unit equipped with one or more nozzles to spray a dual fluid that is a mixture of a cleaning agent and carbon dioxide onto the substrate.
Who is the assignee on this patent?
Semes Co Ltd
What technology area does this patent fall under?
Primary CPC classification H10P72/0424. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Sep 19 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).