Method and apparatus for cleaning medical instruments and for detecting residue thereon

US11759100B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11759100-B2
Application numberUS-202016830329-A
CountryUS
Kind codeB2
Filing dateMar 26, 2020
Priority dateMar 29, 2019
Publication dateSep 19, 2023
Grant dateSep 19, 2023

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A method for cleaning a medical instrument and for detecting residue thereon is provided in which method a non-sterile or conventionally sterilized medical instrument is exposed to pressure below 100 hPa, and, subsequently, exposed to at least one gas reactive to the residue.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method for cleaning a medical instrument and for detecting residue thereon, comprising: (a) obtaining a non-sterile or conventionally sterilized medical instrument; (b) loading said medical instrument into a deposition and/or analysis apparatus; (c) exposing said medical instrument to pressure below 100 hPa, (d) exposing said medical instrument to at least one gas reactive to the residue, wherein, during at least steps at (c) and/or (d), the residue is detected and/or quantified, by at least one sensor device, in at least a part of a gas flow evacuated from the deposition and/or analysis apparatus during steps (c) and (d) in an uninterrupted manner, wherein, in a condition that concentration of the residue detected and/or quantified at (c) and/or (d) exceeds a predetermined threshold, the medical instrument is reverted to a procedure of cleaning and/or sterilization by conventional methods, and wherein, in a condition that concentration of the residue detected and/or quantified at (d) pertains to a predetermined level, the medical instrument is subjected to disposal. 2. The method of claim 1 , wherein the medical instrument thus obtained is pre-applied, at least partly, with a chemically deposited coating. 3. The method of claim 1 , wherein a coating is pre-applied onto at least a part of said medical instrument by Atomic Layer Deposition (ALD). 4. The method of claim 1 , wherein the medical instrument is exposed, at (c) to a pressure below 10 hPa. 5. The method of claim 1 , wherein, at (d), said at least one gas contains a chemical substance reactive to the residue. 6. The method of claim 1 , wherein the medical instrument is a multi-part medical instrument. 7. The method of claim 1 , wherein, during at least steps at (c) and/or (d), the at least one sensor device is configured to detect and/or quantify an amount of at least one gaseous compound reactive to the residue and/or of the products of chemical reactions between the at least one gaseous compound and the residue, respectively. 8. The method of claim 1 , wherein steps (c) and (d) are performed sequentially or simultaneously. 9. The method of claim 1 , wherein the medical instrument is exposed, at (c) to a pressure below 1 hPa. 10. The method of claim 1 , wherein the medical instrument is exposed, at (c) to a pressure below 0.1 hPa. 11. The method of claim 1 , wherein the medical instrument is an endoscope device.

Assignees

Inventors

Classifications

  • Laboratory, medical or dentistry appliances, e.g. catheters or sharps · CPC title

  • A61L2/202Primary

    Ozone · CPC title

  • A61B1/121Primary

    provided with means for cleaning post-use · CPC title

  • A61B1/126Primary

    provided with means for cleaning in-use · CPC title

  • Cleaning by methods not provided for in a single other subclass or a single group in this subclass · CPC title

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Frequently asked questions

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What does patent US11759100B2 cover?
A method for cleaning a medical instrument and for detecting residue thereon is provided in which method a non-sterile or conventionally sterilized medical instrument is exposed to pressure below 100 hPa, and, subsequently, exposed to at least one gas reactive to the residue.
Who is the assignee on this patent?
Picosun Oy
What technology area does this patent fall under?
Primary CPC classification A61L2/202. Mapped technology areas include Human Necessities.
When was this patent published?
Publication date Tue Sep 19 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 4 related publications on this page (citations in our corpus or others sharing the same primary CPC).