Strain gauge with improved stability and stress reduction

US11747225B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11747225-B2
Application numberUS-201917043898-A
CountryUS
Kind codeB2
Filing dateApr 1, 2019
Priority dateApr 5, 2018
Publication dateSep 5, 2023
Grant dateSep 5, 2023

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A strain gauge includes a flexible substrate, and a resistor formed of material containing at least one from among chromium and nickel, on or above the substrate. The resistor includes a first layer that is a lowermost layer; and a second layer that is a surface layer laminated on or above the first layer. The second layer is a layer having a higher density than the first layer. The first layer has a first surface provided on a side where the flexible resin substrate is situated, the functional layer being laminated on the first surface. The first layer has a second surface on which the second layer is laminated.

First claim

Opening claim text (preview).

The invention claimed is: 1. A strain gauge comprising: a flexible resin substrate; a functional layer formed of a metal, an alloy, or a metal compound, on one surface of the substrate; and a resistor formed as a film containing Cr, CrN, and Cr 2 N, on one surface of the functional layer, wherein the resistor includes a first layer that is a lowermost layer; and a second layer that is a surface layer laminated on or above the first layer, wherein the second layer is a layer having a higher density than the first layer, and wherein the first layer has a first surface provided on a side where the flexible resin substrate is situated, the functional layer being laminated on the first surface, and a second surface on which the second layer is laminated. 2. The strain gauge according to claim 1 , further comprising one or more other layers between the first layer and the second layer, wherein the density gradually increases from the first layer to the second layer. 3. The strain gauge according to claim 1 , wherein one or more lower layers beneath the second layer each have a columnar structure. 4. The strain gauge according to claim 3 , wherein a film thickness of the second layer is half or less than half a total thickness of the layers each having the columnar structure. 5. The strain gauge according to claim 1 , wherein a main component of the resistor is alpha-chromium. 6. The strain gauge according to claim 5 , wherein the resistor includes alpha-chromium at 80% by weight or more. 7. The strain gauge according to claim 1 , wherein the functional layer includes a function of promoting crystal growth of the resistor. 8. The strain gauge according to claim 1 , further comprising an insulating resin layer with which the resistor is coated.

Assignees

Inventors

Classifications

  • G01L1/2287Primary

    constructional details of the strain gauges (adjustable resistors H01C10/00) · CPC title

  • for measuring the deformation in a solid, e.g. by resistance strain gauge · CPC title

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Frequently asked questions

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What does patent US11747225B2 cover?
A strain gauge includes a flexible substrate, and a resistor formed of material containing at least one from among chromium and nickel, on or above the substrate. The resistor includes a first layer that is a lowermost layer; and a second layer that is a surface layer laminated on or above the first layer. The second layer is a layer having a higher density than the first layer. The first layer…
Who is the assignee on this patent?
Minebea Mitsumi Inc
What technology area does this patent fall under?
Primary CPC classification G01L1/2287. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Sep 05 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 12 related publications on this page (citations in our corpus or others sharing the same primary CPC).