Method, device and system for the treatment of biological cryogenic samples by plasma focused ion beams

Patent metadata

Field	Value
Publication number	US-11735404-B2
Application number	US-202017017580-A
Country	US
Kind code	B2
Filing date	Sep 10, 2020
Priority date	Dec 28, 2017
Publication date	Aug 22, 2023
Grant date	Aug 22, 2023

Abstract

The invention relates to a method, a device and a system for the treatment of biological frozen samples using plasma focused ion beams (FIB). The samples can then be used for mass spectrometry (MS), genomics, such as gene sequencing analysis or next generation sequencing (NGS) analysis, and proteomics. The present invention particularly relates to a method of treatment of at least one biological sample. This method is particularly used for high performance microscopy, proteomics analytics, sequencing, such as NGS etc. According to the present invention the method comprises the steps of providing at least one biological sample in frozen form. The milling treats at least one part of the sample by a plasma ion beam comprising at least one of an O + and/or a Xe + plasma.

First claim

The invention claimed is:

1. A method of analyzing a biological sample, comprising:
providing at least one biological sample in frozen form;
milling the sample using a plasma ion beam comprising at least an O + plasma to isolate at least a target in the sample from the rest of the sample, wherein the sample is milled at a mass removal rate of at least 100 μm 3 /second using the plasma ion beam, and wherein the target is cryogenically preserved for sensitive protein analysis; and
analyzing the isolated target with the sensitive protein analysis, wherein the sensitive protein analysis includes proteomic analysis and/or next-generation sequencing.

2. The method of claim 1 , wherein isolating at least a target from the sample by milling the sample using a plasma ion beam includes isolating the target by sputtering away at least an unwanted part adjacent to the target using the plasma ion beam.

3. The method of claim 2 , further comprising transferring the isolated target to a spectrometer for the proteomic analysis.

4. The method of claim 3 , wherein the spectrometer is an orbitrap fusion mass spectrometer.

5. The method of claim 2 , further comprising transferring the isolated target to a next-generation sequencing platform for the next generation sequencing.

6. The method of claim 2 , further comprises obtaining an accumulated sample including a plurality of targets from one or more biological samples, wherein analyzing the isolated target includes analyzing the accumulated sample.

7. The method of claim 6 , wherein the plurality of targets are isolated from multiple samples using the plasma ion beam.

8. The method of claim 1 , wherein an effective beam current of the plasma ion beam is at least 6 nA.

9. The method of claim 1 , further comprising analyzing the isolated target based on its spatial information.

10. A system for analyzing a biological sample, comprising:
a focused ion beam system including at least one plasma ion beam generator, the plasma ion beam generator is configured to generate at least one plasma ion beam comprising at least one of an O + plasma to isolate a target of the biological sample by sputtering away at least an unwanted part of the sample using the plasma ion beam at a mass removal rate of at least 100 μm 3 /second using the plasma ion beam, and wherein the target is cryogenically preserved for sensitive protein analysis; and
a mass spectrometer to perform proteomic analysis on the isolated target and/or a next-generating sequencing station to perform sequencing on the isolated target.

11. The system of claim 10 , wherein the plasma ion beam comprising at least 10% O + plasma ions.

12. The system of claim 10 , wherein an effective beam current of plasma ion beam is of at least 6 nA.

13. The system of claim 10 , wherein the mass spectrometer is an orbitrap fusion mass spectrometer.

Assignees

• Fei Co

Inventors

• De Marco Alex
• Gorelick Sergey
• Rue Chad
• Christian Joseph
• Mani Kenny
• Randolph Steven
• Langhorst Matthias

Classifications

• H01J49/0027 Primary

  Methods for using particle spectrometers · CPC title

• G01N1/32 Primary

  Polishing; Etching · CPC title

• H01J37/32009

  Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources (plasma generation in general H05H1/24) · CPC title

• H01J2237/0807

  Gas field ion sources [GFIS] · CPC title

• H01J2237/31745

  for preparing specimen to be viewed in microscopes or analyzed in microanalysers · CPC title