Device for measuring plasma ion density and apparatus for diagnosing plasma using the same

US11735397B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11735397-B2
Application numberUS-202117222937-A
CountryUS
Kind codeB2
Filing dateApr 5, 2021
Priority dateFeb 19, 2021
Publication dateAug 22, 2023
Grant dateAug 22, 2023

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

Disclosed herein is a device for measuring a plasma ion density, which includes a transceiver antenna configured to apply and receive a microwave, of which a frequency is varied, to and from plasma, and a frequency analyzer configured to analyze a frequency of the microwave received from the transceiver antenna and measure a cut-off frequency, wherein the frequency of the microwave applied to the plasma is varied in the range of 100 kHz to 500 MHz.

First claim

Opening claim text (preview).

What is claimed is: 1. A device for measuring a plasma ion density, comprising: a transceiver antenna configured to apply and receive a microwave, of which a frequency is varied, to and from plasma; and a frequency analyzer configured to analyze one frequency of the microwave received from the transceiver antenna and measure a cut-off frequency of mass center momentum of a plurality of types of ions, wherein the frequency of the microwave applied to the plasma is varied in a range of 100 kHz to 500 MHz. 2. The device of claim 1 , further comprising a converter configured to convert the cut-off frequency, which is measured by the frequency analyzer, into the plasma ion density. 3. The device of claim 1 , wherein the transceiver antenna includes a probe-type antenna. 4. The device of claim 1 , wherein the transceiver antenna includes a loop-type antenna. 5. The device of claim 1 , wherein the transceiver antenna includes a planar ring-type antenna. 6. The device of claim 1 , wherein the transceiver antenna includes a planar cone-type antenna. 7. The device of claim 1 , wherein the transceiver antenna includes a planar bar-type antenna. 8. A method of diagnosing plasma, comprising: generating plasma in a vacuum chamber; applying and receiving a microwave, of which a frequency is varied in the vacuum chamber, to and from the plasma; analyzing the frequency of the microwave received from a transceiver antenna and measuring a cut-off frequency; converting the cut-off frequency, which is measured by a frequency analyzer, into a plasma ion density and a plasma electron density; and comparing the plasma ion density with the plasma electron density, which are converted by a converter.

Assignees

Inventors

Classifications

  • Antennas · CPC title

  • Circuits specially adapted for controlling the microwave discharge · CPC title

  • Monitoring and controlling tubes by information coming from the object and/or discharge · CPC title

  • Other variables, e.g. energy, mass, velocity, time, temperature · CPC title

  • H05H1/0081Primary

    by electric means · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US11735397B2 cover?
Disclosed herein is a device for measuring a plasma ion density, which includes a transceiver antenna configured to apply and receive a microwave, of which a frequency is varied, to and from plasma, and a frequency analyzer configured to analyze a frequency of the microwave received from the transceiver antenna and measure a cut-off frequency, wherein the frequency of the microwave applied to t…
Who is the assignee on this patent?
Korea Res Inst Standards & Sci
What technology area does this patent fall under?
Primary CPC classification H01J37/3222. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Aug 22 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).