Method for manufacturing an electronic component

Patent metadata

Field	Value
Publication number	US-11728073-B2
Application number	US-202117454545-A
Country	US
Kind code	B2
Filing date	Nov 11, 2021
Priority date	Dec 21, 2020
Publication date	Aug 15, 2023
Grant date	Aug 15, 2023

Abstract

A method for manufacturing an electronic component includes providing a substrate and a functional layer supported by the substrate; forming a structured protection layer on a side of the substrate to which the functional layer is attached, wherein the structured protection layer has a recess so that a portion of the functional layer is exposed; applying a dispersion comprising a solvent and electrically conductive components to the exposed portion of the functional layer so that the recess is at least partially filled with the dispersion; drying the dispersion in order to create an electrically conductive layer; and removing the structured protection layer.

First claim

What is claimed is:

1. A method for manufacturing an electronic component, the method comprises:
providing a substrate and a functional layer supported by the substrate, wherein the functional layer comprises a contact arrangement and a ventilation opening;
forming a structured protection layer on a side of the substrate, to which the functional layer is attached to, wherein the structured protection layer has one or more recesses so that one or more portions of the functional layer are exposed;
applying a dispersion comprising a solvent and electrically conductive components to at least one of the exposed portions of the functional layer so that at least one of the recesses is at least partially filled with the dispersion;
drying the dispersion in order to create an electrically conductive layer;
removing the structured protection layer;
applying a sacrificial layer to the functional layer before forming the structured protection layer;
wherein the step of forming the structured protection layer comprises:
forming the structured protection layer on the sacrificial layer, wherein, in each of the recesses of the structured protection layer, one portion of the sacrificial layer is exposed; and
removing the exposed portions of the sacrificial layer after the structured protection layer is formed on the sacrificial layer, wherein the exposed portions are removed only over a portion of the contact arrangement and over the ventilation opening.

2. The method according to claim 1 , wherein the functional layer extends over a cavity of the substrate, wherein the structured protection layer is applied to a side of the functional layer, which is facing away from the substrate.

3. The method according to claim 1 , wherein the sacrificial layer is applied by a chemical vapor deposition process.

4. The method according to claim 1 , wherein the sacrificial layer comprises carbon.

5. The method according to claim 1 , wherein the structured protection layer is formed by a photolithographic process, wherein the structured protection layer comprises a photoresist.

6. The method according to claim 1 , wherein the portions of the sacrificial layer, which are exposed in the recesses, are removed by a first etching process.

7. The method according to claim 1 , wherein the dispersion is applied by an ink jet printing process.

8. The method according to claim 1 , wherein the dispersion is applied by a spray coating process.

9. The method according to claim 1 , wherein the contact arrangement is formed such that the electrically conductive layer is connected to the contact arrangement so that an electrical resistance of the electrically conductive layer or an electrical capacity between the electrically conductive layer and a reference electrode connected to the contact arrangement can be sensed using the contact arrangement.

10. The method according to claim 1 , wherein the electronic component is a chemo-resistive gas sensor, wherein the electrically conductive layer is configured for sensing one or more gases in a mixture of gases, wherein an electrical resistance of the electrically conductive layer or an electrical capacity between the electrically conductive layer and a reference electrode depends on the mixture of gases.

11. The method according to claim 1 , wherein the functional layer comprises a heating element configured for heating the electrically conductive layer.

12. The method according to claim 1 , wherein the step of applying the dispersion to the at least one of the exposed portions of the functional layer is done such that the dispersion reaches an outer edge of the at least one of the recesses.

13. The method according to claim 12 , wherein applying the dispersion to the at least one of the exposed portions of the functional layer is done such that the dispersion extends over the outer edge of the at least one of the recesses.

14. The method according to claim 13 , wherein the structured protection layer and a portion of the dispersion, which extends over the outer edge of the at least one of the recesses are removed by a second etching process.

15. The method according to claim 1 , wherein unremoved portions of the sacrificial layer are present in a final version of the electrical component.

Assignees

• Infineon Technologies Ag

Inventors

• Meyer Markus
• Adatti Estevez Jorge Eduardo
• Roth Alexandra Marina

Classifications

• H01C17/003 Primary

  using lithography, e.g. photolithography (lithographic compositions and processing in general G03F) · CPC title

• C23C16/26

  Deposition of carbon only · CPC title

• C23C16/56

  After-treatment · CPC title

• H01C17/06506

  Precursor compositions therefor, e.g. pastes, inks, glass frits or green body · CPC title

• G01N27/12 Primary

  of a solid body in dependence upon absorption of a fluid; of a solid body in dependence upon reaction with a fluid {, for detecting components in the fluid} · CPC title