Method of manufacturing fine pattern and method of manufacturing display device using the same

Patent metadata

Field	Value
Publication number	US-11718082-B2
Application number	US-201816757430-A
Country	US
Kind code	B2
Filing date	Oct 17, 2018
Priority date	Oct 20, 2017
Publication date	Aug 8, 2023
Grant date	Aug 8, 2023

Abstract

A method of manufacturing a fine pattern using the following steps of:
(1) coating a resist composition containing a novolak resin having an alkali dissolution rate of 100 to 3,000 Å on a substrate to form a resist composition layer; (2) subjecting said resist composition layer to exposure; (3) developing said resist composition layer to form a resist pattern; (4) subjecting said resist pattern to flood exposure; (5) coating a fine pattern forming composition on the surface of said resist pattern to form a fine pattern forming composition layer; (6) heating said resist pattern and said fine pattern forming composition layer to cure the regions of said fine pattern forming composition layer in the vicinity of said resist pattern and to form an insolubilized layer; and (7) removing uncured regions of said fine pattern forming composition layer.

First claim

The invention claimed is:

1. A method of manufacturing a fine pattern comprising the following steps of:
(1) a step of coating a resist composition comprising a novolak resin having an alkali dissolution rate of 100 to 3,000 A on a substrate to form a resist composition layer;
(2) a step of subjecting said resist composition layer to exposure;
(3) a step of developing said resist composition layer to form a resist pattern;
(4) a step of subjecting said resist pattern to flood exposure;
(5) a step of coating a fine pattern forming composition on the surface of said resist pattern to form a fine pattern forming composition layer;
(6) a step of heating said resist pattern and said fine pattern forming composition layer to cure the regions of said fine pattern forming composition layer in the vicinity of said resist pattern and to form an insolubilized layer; and
(7) a step of removing uncured regions of said fine pattern forming composition layer and
wherein the exposure in the step (2) is performed using a projector lens having a numerical aperture of 0.08-0.15 and
wherein a resist pattern is formed and has a cross section shape of a hole or a line is observed, L 1 is the pattern width at a 10 percent portion (D 1 ) of the depth and L 2 is the pattern width at a 90 percent portion (D 2 ) of the depth and has a Taper index (L 2 /L 1 ) of the fine pattern is 1.05-18.

2. The method according to claim 1 , wherein the exposure in the step (2) is performed using an exposure apparatus having a resolution limit of 1.5-5.0 μm.

3. The method according to claim 1 , wherein the exposure amount in the step (2) is 15-80 mJ/cm 2 .

4. The method according to claim 1 , wherein the exposure in step (2) is preformed by a light irradiated at a wavelength of 300-450 nm.

5. The method according to claim 1 , wherein the mass average molecular weight of said novolak resin is 1,500-25,000.

6. The method according to claim 1 , further comprising step (3-1) which is a step of heating said resist pattern.

7. The method according to claim 1 , wherein said fine pattern forming composition comprises a cross-linking agent, a polymer, and a solvent.

8. The method according to claim 1 , wherein the viscosity of said fine pattern forming composition measured by a capillary viscometer at 25° C. is 1-120 cP.

9. The method according to claim 1 , wherein the shrink amount of said fine pattern is 0.05-1.00 μm.

10. The method according to claim 1 , wherein the temperature of the heating in the step (6) is 50-140° C.

11. The method according to claim 1 , wherein the uncured regions are removed by contacting said fine pattern forming composition layer and water, a liquid mixture of water and a water-soluble organic solvent, or an alkali aqueous solution in the step (7).

12. The method according to claim 1 , wherein the cross section shape of said resist pattern is a taper shape.

13. A method of manufacturing a display device comprising using a fine pattern made by the method according to claim 1 .

Assignees

• Merck Patent Gmbh

Inventors

• Ikeda Hirokazu
• Nonaka Toshiaki
• Toyama Yoshisuke
• Suzuki Takahide

Classifications

• H10P76/204 Primary

  of organic photoresist masks · CPC title

• B32B38/0036 Primary

  Heat treatment (for heating or cooling of layers during lamination B32B37/06, B32B37/08) · CPC title

• B32B5/145

  Variation across the thickness of the layer · CPC title

• G03F7/18

  Coating curved surfaces · CPC title

• G03F7/24

  Curved surfaces {(G03F7/70 takes precedence)} · CPC title