Metal-semiconductor hybrid structures, syntheses thereof, and uses thereof
US-11458461-B2 · Oct 4, 2022 · US
US11717809B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11717809-B2 |
| Application number | US-202217899535-A |
| Country | US |
| Kind code | B2 |
| Filing date | Aug 30, 2022 |
| Priority date | Aug 24, 2020 |
| Publication date | Aug 8, 2023 |
| Grant date | Aug 8, 2023 |
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Aspects of the present disclosure generally relate to semiconductor nanoparticles, metal-semiconductor hybrid structures, processes for producing semiconductor nanoparticles, processes for producing metal-semiconductor hybrid structures, and processes for producing conversion products. In an aspect is provided a process for producing a metal-semiconductor hybrid structure that includes introducing a first precursor comprising a metal from Group 11-Group 14 to an amine and an anion precursor to form a semiconductor nanoparticle comprising the Group 11-Group 14 metal; introducing a second precursor comprising a metal from Group 7-Group 11 to the semiconductor nanoparticle to form a metal-semiconductor mixture; and introducing the metal-semiconductor mixture to separation conditions to produce the metal-semiconductor hybrid structure. In another aspect is provided a metal-semiconductor hybrid structure that includes a first component comprising a metal from Group 11-Group 14 and an element from Group 15-Group 16; and a second component comprising a metal from Group 7-Group 11.
Opening claim text (preview).
What is claimed is: 1. A metal-semiconductor hybrid structure, comprising: a first component comprising a metal from Group 11-Group 14 and an element from Group 15-Group 16, the first component having an average size of about 3 nm to about 20 nm as determined by transmission electron microscopy; and a second component comprising a metal from Group 7-Group 11, the second component having an average size of about 0.5 nm to about 3 nm as determined by transmission electron microscopy, wherein the Group 11-Group 14 metal of the first component and the Group 7-Group 11 metal of the second component are the same or different, wherein the metal-semiconductor hybrid structure has a molar ratio of the Group 7-Group 11 metal to the Group 11-Group 14 metal from about 1:20 to about 1:5. 2. The metal-semiconductor hybrid structure of claim 1 , wherein the Group 11-Group 14 metal of the first component and the Group 7-Group 11 metal of the second component are different. 3. The metal-semiconductor hybrid structure of claim 1 , wherein: the Group 11-Group 14 metal comprises Cd, Zn, Cu, Pb, Ag, Hg, In, or combinations thereof; the Group 7-Group 11 metal comprises Ru, Rh, Pd, Ag, Os, Ir, Pt, Au, Co, Ni, Fe, or combinations thereof; or combinations thereof. 4. The metal-semiconductor hybrid structure of claim 1 , wherein the Group 7-Group 11 metal of the second component comprises Co, Ni, Fe, or combinations thereof. 5. The metal-semiconductor hybrid structure of claim 1 , wherein: the Group 11-Group 14 metal of the first precursor component Cd; the Group 7-Group 11 metal of the second component comprises Au, Pd, or Pt; or or combinations thereof. 6. The metal-semiconductor hybrid structure of claim 1 , wherein: the average size of the first component is from about 4 nm to about 15 nm; the average size of the second component is from about 0.5 nm to about 1.5 nm; the metal-semiconductor hybrid structure has a nanocluster density from about 0.05 nm −3 to about 0.60 nm −3 ; or combinations thereof. 7. A process for converting a reactant to a product, comprising: introducing a reactant with a metal-semiconductor hybrid structure, the metal-semiconductor hybrid structure comprising: a first component comprising a metal from Group 11-Group 14 and an element from Group 15-Group 16, the first component having an average size of about 3 nm to about 20 nm as determined by transmission electron microscopy; and a second component comprising a metal from Group 7-Group 11, the second component having an average size of about 0.5 nm to about 3 nm as determined by transmission electron microscopy, wherein the Group 11-Group 14 metal of the first component and the Group 7-Group 11 metal of the second component are the same or different. 8. The process of claim 7 , wherein: the Group 11-Group 14 metal of the first component comprises Cd; the Group 7-Group 11 metal of the second component comprises Au, Pd, or Pt; or combinations thereof.
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