Probe, method of manufacturing a probe and scanning probe microscopy system

US11698389B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11698389-B2
Application numberUS-201816760210-A
CountryUS
Kind codeB2
Filing dateOct 31, 2018
Priority dateNov 1, 2017
Publication dateJul 11, 2023
Grant dateJul 11, 2023

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

This document relates to a probe for use in a scanning probe microscopy device. The probe comprises a cantilever and a probe tip being located at a first end section of the cantilever. The cantilever is configured for bending in a Z-direction perpendicular to a surface of a substrate in use. The cantilever comprises a neck section and a paddle section, and the probe tip is located on the paddle section. The neck section has a width and height in cross section thereof, comprises a base part having a rectangular cross section. The cantilever at least across a length of the neck section comprises a ridge extending in a direction away from the base part. The base part and the ridge together define the width and height of the neck section, and have dimensions such that a vertical bending stiffness of the cantilever for bending in the Z-direction matches a lateral stiffness of the cantilever with respect to forces acting on the probe tip in a direction transverse to the Z-direction. The document further describes a manufacturing method.

First claim

Opening claim text (preview).

The invention claimed is: 1. A probe for use in a scanning probe microscopy device for measuring features on a surface of a substrate, the probe comprising: a cantilever having a longitudinal shape and including a first end section and a second end section on an opposite side from the first end section; and a probe tip located at the first end section of the cantilever, wherein the cantilever is configured for bending in a Z-direction perpendicular to the surface of the substrate in use, wherein the cantilever comprises a neck section and a paddle section, wherein the probe tip is located on the paddle section, and wherein the neck section has a width and a height in a cross section thereof, wherein the neck section comprises a base part having a rectangular cross section, wherein the cantilever at least across a length of the neck section comprises a ridge extending in a direction away from the base part, such that the base part and the ridge together define the width and the height of the neck section, and wherein the ridge and the base part have dimensions such that a vertical bending stiffness of the cantilever for bending in the Z-direction matches a lateral stiffness of the cantilever with respect to forces acting on the probe tip in a direction transverse to the Z-direction. 2. The probe according to claim 1 , wherein the ridge extends between the probe tip and the second end section of the cantilever. 3. The probe according to claim 1 , wherein the neck section, formed by the base part and the ridge, has a T-shaped cross-section. 4. The probe according to claim 1 , wherein a width to height aspect ratio of the neck section is defined as a ratio between a maximum width and a maximum height measured in a cross section transverse to a notional longitudinal axis through the neck section, and the width to height aspect ratio of the neck section is calculated as the maximum width divided by the maximum height, wherein the cantilever comprises at least one section having a width to height aspect ratio smaller than 10. 5. The probe according to claim 1 ; wherein the neck comprises at least one physical property taken from the group consisting of: the width of the neck section is within a range of 1 micrometer to 15 micrometer; a thickness of the base part; as measure transverse to the width, is within a range of 250 nanometer to 1250 nanometer; a length of the neck section is within a range of 2.5 to 30 micrometer; the height of the ridge is within a range of 2 to 14 micrometer; the width of the ridge is within a range of 0.5 to 5 micrometer; and a length of the ridge is within a range of 2.5 to 30 micrometer. 6. The probe according to claim 1 , wherein the height of the ridge is 1.5 micrometer; and wherein the neck comprises at least one physical dimension combination taken from the group of physical dimension combinations consisting of: the width of the neck section is 3 micrometer and the length of the neck section is 30 micrometer; the width of the neck section is 3 micrometer and the length of the neck section is 17.5 micrometer; the width of the neck section is 4 micrometer and the length of the neck section is 17.5 micrometer; the width of the neck section is 6 micrometer and the length of the neck section is 7.5 micrometer; the width of the neck section is 8 micrometer and the length of the neck section is 7.5 micrometer; and the width of the neck section is 14 micrometer and the length of the neck section is 2.5 micrometer. 7. The probe according to claim 1 , wherein the probe tip comprises a triangular cross section having a base width and an apex. 8. The probe according to claim 7 ; wherein the probe tip further comprises a high aspect ratio whisker extending from the apex. 9. The probe according to claim 8 , wherein the lateral stiffness of the cantilever is of a same order as a lateral stiffness of the whisker. 10. A method of manufacturing a probe for use in a scanning probe microscopy device for measuring high aspect ratio features on a surface of a substrate, the method comprising: providing the probe that comprises: a cantilever including a first end section and a second end section on an opposite side from the first end section; and a probe tip, wherein the probe tip is located at the first end section of the cantilever, wherein the cantilever is formed to have a longitudinal shape for enabling bending in a Z-direction perpendicular to the surface of the substrate in use, wherein the providing the probe comprises: forming the cantilever to comprise a neck section and a paddle section, and forming the probe tip to be located on the paddle section, wherein the neck section is formed to have a width and height in cross section thereof, and wherein the width and height of the neck section are dimensioned such that a vertical bending stiffness of the cantilever for bending in the Z-direction matches a lateral stiffness of the cantilever with respect to forces acting on the probe tip in a direction transverse to the Z-direction. 11. The method according to claim 10 , wherein the forming of the cantilever comprises at least one or all of the group consisting of: adjusting a cross sectional shape of the cantilever, forming the cantilever to have a neck section comprising a ridge extending transverse to a base part of the neck section, and forming the cantilever to have a neck section comprising at least a base part and adjusting a thickness of the base part. 12. The method according to claim 11 , wherein the forming of the cantilever comprises forming the cantilever to have a neck section comprising a ridge extending transverse to a base part of the neck section, and wherein the neck section is formed to have a T-shaped cross section. 13. The method according to claim 10 ; wherein the probe tip is formed to comprise a whisker element; and wherein the method further comprises forming the cantilever to comprise the lateral stiffness to be of a same order as a lateral stiffness of the whisker element. 14. The method according to claim 13 ; wherein the width and height of the neck section are dimensioned such that a vertical bending stiffness of the cantilever for bending in the Z-direction matches the lateral stiffness of the cantilever with respect to forces acting on the probe tip in a direction transverse to the Z-direction to be at least one of the group consisting of: within a factor 10 from each other; within a factor 5 from each other; within a factor 2 from each other; within a range of 25% from each other; and within a range of 5% from each other. 15. The method according to claim 10 ; wherein the neck section is formed comprising a base part having a rectangular cross section; and wherein the cantilever is formed to comprise a ridge at least across a length of the neck section; wherein the ridge extends in a direction away from the base part; such that the base part and the ridge together define the width and height of the neck section; wherein the ridge and the base part have dimensions such that the vertical bending stiffness of the cantilever for bending in the Z-direction matches a lateral stiffness of the cantilever with respect to forces acting on the probe tip in a direction transverse to the Z-direction. 16. Scanning probe microscopy system configured for measuring high aspect ratio features on a surface of a substrate, the system comprising a probe comprising: a cantilever having a longitudinal shape and including a first end section and a second end section on an opposite side from the first end section; and a probe

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What does patent US11698389B2 cover?
This document relates to a probe for use in a scanning probe microscopy device. The probe comprises a cantilever and a probe tip being located at a first end section of the cantilever. The cantilever is configured for bending in a Z-direction perpendicular to a surface of a substrate in use. The cantilever comprises a neck section and a paddle section, and the probe tip is located on the paddle…
Who is the assignee on this patent?
TNO
What technology area does this patent fall under?
Primary CPC classification G01Q70/10. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Jul 11 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).