Optical waveguide device and method of manufacturing optical waveguide device

Patent metadata

Field	Value
Publication number	US-11693291-B2
Application number	US-202117169983-A
Country	US
Kind code	B2
Filing date	Feb 8, 2021
Priority date	Apr 21, 2020
Publication date	Jul 4, 2023
Grant date	Jul 4, 2023

Abstract

An optical waveguide device has a substrate, an intermediate layer, a thin-film LN layer containing an X-cut lithium niobate, and a buffer layer stacked on the substrate, and an optical waveguide having a ridge shape formed in the thin-film LN layer. The optical waveguide device includes a plurality of electrodes provided, respectively, at a first side and a second side of the optical waveguide. The electrodes are disposed so that respective bottom surfaces thereof are at positions lower than a position of a surface of the buffer layer.

First claim

What is claimed is:

1. An optical waveguide device, comprising:
a substrate;
a buffer layer stacked on the substrate and containing SiO 2 ;
an optical waveguide of a rectangular core type containing an X-cut lithium niobate, the optical waveguide having a top, bottom, right and left surfaces all of which are in contact with the SiO 2 of the buffer layer; and
a plurality of electrodes provided, respectively, at a first side and a second side of the optical waveguide, wherein
the electrodes are disposed so that respective bottom surfaces thereof are at positions lower than a position of a surface of the buffer layer.

Assignees

• Fujitsu Optical Components Ltd

Inventors

• Makino Shuntaro
• Kubota Yoshinobu
• Ohmori Yasuhiro
• Doi Masaharu
• Takeuchi Shintaro

Classifications

• G02F1/225 Primary

  in an optical waveguide structure · CPC title

• G02F1/0316 Primary

  Electrodes · CPC title

• G02B6/0065

  Manufacturing aspects; Material aspects · CPC title

• G02F2201/07

  buffer layer · CPC title

• G02F1/035

  in an optical waveguide structure · CPC title