Method of manufacturing zinc oxide nanosheet structure, and electronic apparatus and touch sensor apparatus having the zinc oxide nanosheet structure
US-2016162104-A1 · Jun 9, 2016 · US
US11692258B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11692258-B2 |
| Application number | US-201917618879-A |
| Country | US |
| Kind code | B2 |
| Filing date | Sep 30, 2019 |
| Priority date | Apr 11, 2019 |
| Publication date | Jul 4, 2023 |
| Grant date | Jul 4, 2023 |
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Provided is a method for preparing a metal oxide or a metal hydroxide nano thin-film material by a molten salt method, which mainly comprises the following steps: heating a low-melting-point salt to a molten state, adding a substrate into the molten salt before or after melting for reaction; adding a metal source and continuing the reaction for a period of time; removing the substrate, cooling the substrate to a room temperature, cleaning and drying the substrate to obtain the metal oxide or metal hydroxide nano thin-film material; wherein, the mass ratio of the low-melting-point salt to the metal source is 100-1.5:1. The metal oxide and metal hydroxide nano-film materials with various nano-morphologies prepared by the method of the present application have morphologies that can be regulated and controlled by the types and proportions of the low-melting-point salts and metal sources.
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What is claimed is: 1. A method for preparing a metal oxide or a metal hydroxide nano thin-film material by a molten salt method, comprising the following steps: heating a low-melting-point salt to a molten state, adding a substrate into the molten salt before or after melting and reaction will occur for 5 s to 1 h; then adding a metal source, continuing to raise a temperature or keeping the temperature unchanged, and reaction will occur for a predetermined period of time; removing the substrate, cooling the substrate to a room temperature, cleaning and drying the substrate to obtain metal oxide or metal hydroxide nano thin-film material; wherein, a mass ratio of the low-melting-point salt to the metal source is 100-1.5:1; the substrate is FTO conductive glass, metal titanium foil, 304 stainless steel metal, metal copper foil, nickel foam, carbon felt cloth, carbon paper or carbon fiber cloth; the low-melting-point salt refers to a salt with a melting point lower than 400° C., comprising nitrate, chloride, sulfate, phosphate, acetate or carbonate; the metal source comprises nitrate, sulfate, chloride, phosphate, titanate, tungstate, acetate, molybdate or carbonate of any one of metal elements of copper, manganese, nickel, cobalt, zinc, iron, titanium, aluminum, vanadium, chromium, molybdenum, ruthenium, tungsten, zirconium, lanthanum and cerium; a range of raising the temperature is between a melting point and a decomposition temperature or a boiling point of the low-melting-point salt, and the predetermined period of time is 5s to 5h.
characterised by the coating material · CPC title
by thermal decomposition of compounds, e.g. of salts or hydroxides · CPC title
Controlling or regulating the coating processes (C23C2/14 takes precedence) · CPC title
Manufacture or treatment of nanostructures · CPC title
Oxides; Hydroxides · CPC title
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