CVD device pumping liner

Patent metadata

Field	Value
Publication number	US-11685994-B2
Application number	US-201916570274-A
Country	US
Kind code	B2
Filing date	Sep 13, 2019
Priority date	Sep 13, 2019
Publication date	Jun 27, 2023
Grant date	Jun 27, 2023

Abstract

Pumping liners for use in an apparatus for depositing a material on a work piece by chemical vapor deposition includes a plurality of unevenly spaced apertures are disclosed. Uneven spacing of the plurality of apertures produces a uniform flow of processing gases within a processing chamber with which the pumping liner is associated. Films of materials deposited onto a work piece by chemical vapor deposition techniques using disclosed pumping liners exhibit desirable properties such as uniform thickness and smooth and uniform surfaces.

First claim

The invention claimed is:

1. An apparatus for depositing a material on a work piece by chemical vapor deposition, the apparatus comprising:
a processing chamber, the processing chamber including a pedestal assembly, which in operation, supports a work piece; and
a pumping liner defining a circumferential body having a plurality of apertures including a first aperture, a second aperture and a third aperture, disposed around the circumferential body, through which gas within the processing chamber is exhausted from the processing chamber, each of the plurality of apertures consisting a first portion having a cylindrical shape and a circular cross section of a same diameter and a second portion having a frustoconical shape and a circular cross-section, the frustoconical shape of the second portion including a smaller diameter first end and a larger diameter second end, the first portion extending from the smaller diameter first end of the frustoconical shape of the second portion, the circumferential body including an inner circumferential surface, an outer circumferential surface, an upper surface and a lower surface, wherein each of the plurality of apertures are tilted relative to the upper surface, are tilted relative to the lower surface and extend through the body from the inner circumferential surface to the outer circumferential surface, the second aperture being intermediate the first aperture and the third aperture and directly adjacent to the first aperture and the third aperture, the first aperture and the second aperture defining a first aperture pair, a first distance between a centerline of the first aperture and a centerline of the second aperture of the first aperture pair measured along the outer circumferential surface separating the first aperture and the second aperture of the first aperture pair, the second aperture and the third aperture defining a second aperture pair, a second distance between a centerline of the second aperture and a centerline of the third aperture of the second aperture pair measured along the outer circumferential surface separating the second aperture and the third aperture of the second aperture pair; and
an exhaust port through which the gas which has passed through the first aperture, the second aperture and the third aperture of the pumping liner is exhausted from the processing chamber, wherein the first aperture pair is closer to the exhaust port than the second aperture pair and the first distance for the first aperture pair is less than the second distance for the second aperture pair.

2. The apparatus of claim 1 , wherein the pumping liner includes two circumferential portions of equal length L measured along the outer circumferential surface, one portion including a greater number of apertures compared to the other portion.

3. The apparatus of claim 1 , wherein a pitch between the first aperture and the second aperture of the first aperture pair is X degrees (°) and a pitch between the second aperture and the third aperture of the second aperture pair, directly adjacent to the first aperture pair, is X° plus 0.05° to 0.5°.

4. The apparatus of claim 3 , wherein an amount a pitch between directly adjacent apertures of a third aperture pair, directly adjacent to the second aperture pair, differs from the difference in the pitch between the apertures of the first aperture pair and the pitch between the apertures of the second aperture pair, is unequal to a difference between the pitch of the apertures of the first aperture pair and the pitch of the apertures of the second aperture pair.

5. The apparatus of claim 1 , wherein the first aperture, the second aperture and the third aperture are among a plurality of 35 to 65 apertures.

6. The apparatus of claim 1 , wherein the same diameter of the apertures is between 4 to 7 mm.

7. A pumping liner for use in a method of depositing a material on a work piece by chemical vapor deposition, the pumping liner comprising:
a circumferential body having a plurality of apertures disposed entirely around the circumferential body;
an inner circumferential surface;
an outer circumferential surface;
an upper surface;
a lower surface;
the plurality of apertures including a first aperture, a second aperture and a third aperture, the first aperture directly adjacent the second aperture and the third aperture directly adjacent the second aperture, each of the first aperture, the second aperture and the third aperture consists of a first portion having a cylindrical shape and a circular cross section and a second portion having a frustoconical shape and a circular cross-section, the frustoconical shape of the second portion including a smaller diameter first end and a larger diameter second end, the first portion extending from the smaller diameter first end of the frustoconical shape of the second portion, each of the first aperture, the second aperture and the third aperture tilted relative to the upper surface, each of the first aperture, the second aperture and the third aperture tilted relative to the lower surface and each of the first aperture, the second aperture and the third aperture extending through the body from the inner circumferential surface to the outer circumferential surface, the second aperture being intermediate the first aperture and the third aperture and directly adjacent to the first aperture and the third aperture, the first aperture and the second aperture defining a first aperture pair, a first distance between a centerline of the first aperture and a centerline of the second aperture of the first aperture pair measured along the outer circumferential surface separating the first aperture and the second aperture of the first aperture pair, the second aperture and the third aperture comprising a second aperture pair, a second distance between a centerline of the second aperture and a centerline of the third aperture of the second aperture pair measured along the outer circumferential surface separating the second aperture and the third aperture of the second aperture pair; and
an exhaust port through which gas which has passed through the first aperture, the second aperture and the third aperture of the pumping liner is exhausted, wherein the first aperture pair is closer to the exhaust port than the second aperture pair and the first distance for the first aperture pair is less than the second distance for the second aperture pair.

8. The pumping liner of claim 7 , wherein the pumping liner includes two circumferential portions of equal length L measured along the outer circumferential surface, one portion including a greater number of apertures compared to the other portion.

9. The pumping liner of claim 7 , further comprising a fourth aperture, the third aperture being intermediate the second aperture and the fourth aperture and directly adjacent to the second aperture and the fourth aperture, the third aperture and the fourth aperture comprising a third aperture pair, a third distance between a centerline of the third aperture and a centerline of the fourth aperture of the third aperture pair measured along the outer circumferential surface separating the third aperture and the fourth aperture of the third aperture pair, wherein the difference between the first distance and the second distance is equal to the difference between the second distance and the third distance.

10. The pumping liner of claim 7 , wherein the distance between directly adjacent apertures of two directly adjacent aperture pairs varies at a regular interval.

11. The pumping liner of claim 7 wherein a pitch between the first aperture and the second aperture of the first aperture pair is X degrees (°) and a pitch between the secon

Assignees

• Taiwan Semiconductor Mfg Co Ltd

Inventors

• Yang Sheng-Chun
• Lin Yi-Ming
• Lee Chih-Tsung
• Chiu Yun-Tzu
• Wan Chao-Hung

Classifications

• H10P72/0468

  comprising a chamber adapted to a particular process · CPC title

• C23C16/45565

  Shower nozzles · CPC title

• C23C16/50

  using electric discharges {(generation and control of plasma in discharge tubes for surface treatment H01J37/32, H01J37/34)} · CPC title

• C23C16/4412 Primary

  Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps · CPC title

• C23C16/4583

  the substrate being supported substantially horizontally · CPC title