Linear lamp array for improved thermal uniformity and profile control

US11680338B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11680338-B2
Application numberUS-202016833352-A
CountryUS
Kind codeB2
Filing dateMar 27, 2020
Priority dateDec 19, 2019
Publication dateJun 20, 2023
Grant dateJun 20, 2023

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

Methods and apparatus for an upper reflector assembly for use in a process chamber are provided herein. In some embodiments, an upper reflector assembly for use in a process chamber includes a reflector mounting ring; and upper reflector plate coupled to the reflector mounting ring and having an upper surface and lower surface, wherein the lower surface includes a plurality of linear channels extending substantially parallel to each other across the lower surface, and wherein the upper reflector plate includes air cooling slots extending from the upper surface to the lower surface.

First claim

Opening claim text (preview).

The invention claimed is: 1. An upper reflector assembly for use in a process chamber, comprising: an upper reflector plate comprising: an upper surface; a lower surface; a plurality of linear channels extending substantially parallel to each other across the lower surface; and air cooling slots extending from the upper surface to the lower surface, the plurality of air cooling slots comprising a plurality of first slots and a plurality of second slots, the plurality of first slots having a smaller depth than the plurality of second slots, wherein the plurality of first slots extend at an angle less than 90 degrees with respect to the upper surface of the upper reflector plate. 2. The upper reflector assembly of claim 1 , wherein the plurality of second slots extend orthogonal to the upper surface. 3. The upper reflector assembly of claim 1 , wherein the upper surface includes a plurality of coolant channels. 4. The upper reflector assembly of claim 1 , wherein the plurality of linear channels have different cross-sectional shapes. 5. The upper reflector assembly of claim 1 , wherein the plurality of linear channels have at least one of a U-shaped cross section, a V-shaped cross section, an elliptical cross section, a parabolic cross section, or a rectangular cross section. 6. The upper reflector assembly of claim 1 , further comprising a reflector mounting ring coupled to the upper reflector plate and an inner housing coupled to the reflector mounting ring and a top plate coupled to the inner housing, wherein the top plate includes an air inlet configured to facilitate a flow of air through the inner housing and through the air cooling slots. 7. The upper reflector assembly of claim 6 , further comprising one or more flow turning vanes disposed between the top plate and the upper reflector plate to direct the flow of air from the air inlet to various zones of the upper reflector plate. 8. An upper reflector plate for use in a process chamber, comprising: an upper surface; a lower surface; a plurality of linear channels extending substantially parallel to each other across the lower surface, wherein each of the plurality of linear channels have one of a U-shaped cross section, a V-shaped cross section, an elliptical cross section, a parabolic cross section, or a rectangular cross section, wherein one or more of the plurality of linear channels have different cross sectional shapes from the remaining linear channels of the plurality of channels; a plurality of air cooling slots extending from the upper surface to the lower surface; and a plurality of coolant channels formed in the upper surface. 9. The upper reflector plate of claim 8 , wherein the air cooling slots include a plurality of first slots and a plurality of second slots, wherein the plurality of first slots have a smaller depth than the plurality of second slots. 10. The upper reflector plate of claim 9 , wherein the plurality of first slots extend at an angle of less than 90 degrees with respect to the upper surface. 11. The upper reflector plate of claim 8 , wherein the upper reflector plate includes an opening extending from the upper surface to the lower surface and covered with a transparent window. 12. The upper reflector plate of claim 8 , further comprising a gold plating disposed thereon. 13. An upper reflector assembly for use in a process chamber, comprising: an upper reflector plate comprising: an upper surface; a lower surface; a plurality of linear channels extending substantially parallel to each other across the lower surface; and air cooling slots extending from the upper surface to the lower surface, the plurality of air cooling slots comprising a plurality of first slots and a plurality of second slots, the plurality of first slots having a smaller depth than the plurality of second slots, wherein one or more of the plurality of linear channels have different cross sectional shapes from the remaining linear channels of the plurality of channels. 14. An upper reflector plate for use in a process chamber, comprising: an upper surface; a lower surface; a plurality of linear channels extending substantially parallel to each other across the lower surface, wherein each of the plurality of linear channels have one of a U-shaped cross section, a V-shaped cross section, an elliptical cross section, a parabolic cross section, or a rectangular cross section; a plurality of air cooling slots extending from the upper surface to the lower surface, wherein the air cooling slots include a plurality of first slots and a plurality of second slots, wherein the plurality of first slots have a smaller depth than the plurality of second slots, wherein the plurality of first slots extend at an angle of less than 90 degrees with respect to the upper surface; and a plurality of coolant channels formed in the upper surface.

Assignees

Inventors

Classifications

  • mainly by radiation · CPC title

  • Controlling or regulating the coating process {(C23C16/45557, C23C16/279 take precedence)} · CPC title

  • for mirrors · CPC title

  • C30B25/08Primary

    Reaction chambers; Selection of materials therefor · CPC title

  • with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US11680338B2 cover?
Methods and apparatus for an upper reflector assembly for use in a process chamber are provided herein. In some embodiments, an upper reflector assembly for use in a process chamber includes a reflector mounting ring; and upper reflector plate coupled to the reflector mounting ring and having an upper surface and lower surface, wherein the lower surface includes a plurality of linear channels e…
Who is the assignee on this patent?
Applied Materials Inc
What technology area does this patent fall under?
Primary CPC classification C30B25/08. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jun 20 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 4 related publications on this page (citations in our corpus or others sharing the same primary CPC).