Reactor for coating particles in stationary chamber with rotating paddles and gas injection

US11674223B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11674223-B2
Application numberUS-202016855871-A
CountryUS
Kind codeB2
Filing dateApr 22, 2020
Priority dateApr 24, 2019
Publication dateJun 13, 2023
Grant dateJun 13, 2023

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A reactor for coating particles includes a stationary vacuum chamber having a lower portion that forms a half-cylinder and an upper portion to hold a bed of particles to be coated, a vacuum port in the upper portion of the chamber, a paddle assembly, a motor to rotate a drive shaft of the paddle assembly, a chemical delivery system to deliver a first fluid, and a first gas injection assembly to receive the first fluid from the chemical delivery system and having apertures configured to inject a first reactant or precursor gas into the lower portion of the chamber and such that the first reactant or precursor gas flows substantially tangent to a curved inner surface of the half-cylinder.

First claim

Opening claim text (preview).

What is claimed is: 1. A reactor for coating particles, comprising: a stationary vacuum chamber to hold a bed of particles to be coated, the vacuum chamber having a lower portion that forms a half-cylinder and an upper portion; a vacuum port in the upper portion of the vacuum chamber; a motor; a paddle assembly including: a rotatable drive shaft extending through the vacuum chamber along an axial axis of the half-cylinder, a plurality of paddles extending radially from the drive shaft such that rotation of the drive shaft by the motor orbits the plurality of paddles about the drive shaft; and a first gas injection assembly configured to receive a first fluid from one or more fluid sources and comprising apertures extending through a wall of the lower portion of the stationary vacuum chamber and to an inner surface of the half-cylinder formed by the lower portion of the stationary vacuum chamber and configured to inject a first reactant or precursor gas into the lower portion of the vacuum chamber such that the first reactant or precursor gas flow injected into the vacuum chamber is substantially tangent to a curvature of the inner surface of the half-cylinder formed by the lower portion, wherein the apertures comprise a first plurality of apertures extending in a first row parallel to the axial axis, and wherein the first gas injection assembly is configured to inject the first reactant or precursor gas through the first plurality of apertures. 2. The reactor of claim 1 , wherein the first gas injection assembly is configured to inject the first reactant or precursor gas in a direction perpendicular to the axial axis. 3. The reactor of claim 1 , wherein the first plurality of apertures are positioned in a lower half of the lower portion of the vacuum chamber. 4. The reactor of claim 3 , wherein the first plurality of apertures are positioned in a lower quarter of the lower portion of the vacuum chamber. 5. The reactor of claim 1 , further comprising a second gas injection assembly configured to receive a second fluid from the one or more fluid sources and having apertures extending through the wall of the lower portion of the stationary vacuum chamber and to an inner surface of the half-cylinder formed by the lower portion of the stationary vacuum chamber and configured to inject a second reactant or precursor gas into the lower portion of the vacuum chamber such that the second reactant or precursor gas flow injected into the vacuum chamber is substantially tangent to a curvature of the inner surface of the half-cylinder formed by the lower portion. 6. The reactor of claim 5 , wherein the second gas injection assembly comprises second plurality of apertures extending in a second row parallel to the axial axis, and wherein the second gas injection assembly is configured to inject the second reactant or precursor gas through the second plurality of apertures. 7. The reactor of claim 1 , wherein the first gas injection assembly include a manifold and a plurality of channels extending from the manifold to the first plurality of apertures. 8. The reactor of claim 7 , wherein each channel opens in a ceiling of a corresponding aperture. 9. The reactor of claim 7 , comprising a restriction between the manifold and the plurality of channels. 10. The reactor of claim 1 , further comprising a controller configured to keep a flow rate of the reactant or precursor gas flow sufficiently slow that powder stays in the bed of particles. 11. A reactor for coating particles, comprising: a stationary vacuum chamber to hold a bed of particles to be coated, the vacuum chamber having a lower portion that forms a half-cylinder and an upper portion; a vacuum port in the upper portion of the vacuum chamber; a motor; a paddle assembly including: a rotatable drive shaft extending through the vacuum chamber along an axial axis of the half-cylinder, a plurality of paddles extending radially from the drive shaft such that rotation of the drive shaft by the motor orbits the plurality of paddles about the drive shaft; and a first gas injection assembly configured to receive a first liquid from one or more fluid sources, the first gas injection assembly including a vaporizer to convert the first liquid to a first reactant or precursor gas, a manifold to receive the first reactant or precursor gas from the vaporizer, and a plurality of channels leading from the manifold to a plurality of apertures, wherein the plurality of apertures extend through a wall of the lower portion of the stationary vacuum chamber to an inner surface of the half-cylinder formed by the lower portion of the stationary vacuum chamber, and wherein the plurality of apertures are configured to inject the first reactant or precursor gas such that the first reactant or precursor gas flow injected into the vacuum chamber is substantially tangent to a curvature of the inner surface of the half-cylinder formed by the lower portion of the vacuum chamber. 12. The reactor of claim 11 , wherein the vaporizer is immediately adjacent the manifold. 13. The reactor of claim 12 , wherein the vaporizer, manifold and plurality of channels are formed in a unitary body. 14. The reactor of claim 13 , wherein the vaporizer comprises a cavity, a heater to heat walls of the cavity, and a nozzle to aerosolize the first liquid as the first liquid passes into cavity. 15. The reactor of claim 14 , wherein the plurality of channels are fluidically connected directly to the cavity. 16. The reactor of claim 11 , comprising a passage connecting the one or more fluid sources to deliver an inert gas to the manifold. 17. The reactor of claim 16 , wherein the passage is fluidically connected directly to the manifold. 18. The reactor of claim 16 , wherein the passage is fluidically connected directly to an inlet that carries the first liquid.

Assignees

Inventors

Classifications

  • with paddles, blades or arms · CPC title

  • having stirring elements connected to the stirrer shaft each by a single radial rod, other than open frameworks · CPC title

  • Methods specially adapted for coating powder · CPC title

  • applied in non-semiconductor technology · CPC title

  • Processes · CPC title

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What does patent US11674223B2 cover?
A reactor for coating particles includes a stationary vacuum chamber having a lower portion that forms a half-cylinder and an upper portion to hold a bed of particles to be coated, a vacuum port in the upper portion of the chamber, a paddle assembly, a motor to rotate a drive shaft of the paddle assembly, a chemical delivery system to deliver a first fluid, and a first gas injection assembly to…
Who is the assignee on this patent?
Applied Materials Inc
What technology area does this patent fall under?
Primary CPC classification C23C16/4417. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jun 13 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 12 related publications on this page (citations in our corpus or others sharing the same primary CPC).